Patents by Inventor Toshirou Itani

Toshirou Itani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Immersion fluid for immersion lithography
    Publication number: 20080050681
    Abstract: Aimed at improving balance between refractive index and absorbance of an immersion fluid used for light exposure based on the immersion method, the immersion fluid is configured as containing a deuterated dialkyl sulfoxide.
    Type: Application
    Filed: August 24, 2007
    Publication date: February 28, 2008
    Applicant: NEC ELECTRONICS CORPORATION
    Inventor: Toshirou Itani
  • Chemically amplified resist
    Patent number: 6511781
    Abstract: A chemically amplified positive resist includes at least both a polyhydroxystyrene resin having a protective base which varies in polarity by an acid catalyst and a photoacid generator, wherein the chemically amplified positive resist is admixed with at least a styrene derivative.
    Type: Grant
    Filed: October 22, 1998
    Date of Patent: January 28, 2003
    Assignee: NEC Corporation
    Inventor: Toshirou Itani
  • CHEMICALLY AMPLIFIED RESIST
    Publication number: 20010046640
    Abstract: A chemically amplified positive resist includes at least both a polyhydroxystyrene resin having a protective base which varies in polarity by an acid catalyst and a photoacid generator, wherein the chemically amplified positive resist is admixed with at least a styrene derivative.
    Type: Application
    Filed: October 22, 1998
    Publication date: November 29, 2001
    Inventor: TOSHIROU ITANI