Patents by Inventor Toshirou Nariai

Toshirou Nariai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7815872
    Abstract: A reactor for generating moisture, with which hydrogen and oxygen fed into the reactor contact with a platinum coating catalyst layer to activate reactivity so that hydrogen and oxygen react under conditions of non-combustion, wherein the reactor includes a cooler comprising a heat dissipation body substrate in which a heater insertion hole is made in the center to fix to the outer surface of the reactor structural component on the outlet side and a cooler on the outlet side made up of a plural number of heat dissipation bodies installed vertically in parallel on the part excluding the area where the afore-mentioned heater insertion hole of the heat dissipation body substrate exists, and a part of the heater to heat the reactor is inserted in the heater insertion hole so as to fix to the outer surface of the reactor structural component on the outlet side.
    Type: Grant
    Filed: July 4, 2005
    Date of Patent: October 19, 2010
    Assignee: Fujikin Incorporated
    Inventors: Toshirou Nariai, Kouji Kawada, Keiji Hirao, Yukio Minami, Akihiro Morimoto, Nobukazu Ikeda
  • Patent number: 7553459
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Grant
    Filed: July 26, 2006
    Date of Patent: June 30, 2009
    Assignees: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
  • Publication number: 20080241022
    Abstract: A reactor for generating moisture, with which hydrogen and oxygen fed into the reactor contact with a platinum coating catalyst layer to activate reactivity so that hydrogen and oxygen react under conditions of non-combustion, wherein the reactor includes a cooler comprising a heat dissipation body substrate in which a heater insertion hole is made in the center to fix to the outer surface of the reactor structural component on the outlet side and a cooler on the outlet side made up of a plural number of heat dissipation bodies installed vertically in parallel on the part excluding the area where the afore-mentioned heater insertion hole of the heat dissipation body substrate exists, and a part of the heater to heat the reactor is inserted in the heater insertion hole so as to fix to the outer surface of the reactor structural component on the outlet side.
    Type: Application
    Filed: July 4, 2005
    Publication date: October 2, 2008
    Applicant: FUJIKIN INCORPORATED
    Inventors: Toshirou Nariai, Kouji Kawada, Keiji Hirao, Yukio Minami, Akihiro Morimoto, Nobukazu Ikeda
  • Patent number: 7368092
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Grant
    Filed: December 1, 2003
    Date of Patent: May 6, 2008
    Assignees: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
  • Publication number: 20070231225
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Application
    Filed: June 8, 2007
    Publication date: October 4, 2007
    Applicants: FUJIKIN INCORPORATED, Tadahiro OHMI
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
  • Patent number: 7258845
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Grant
    Filed: February 2, 2001
    Date of Patent: August 21, 2007
    Assignee: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
  • Publication number: 20060292047
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Application
    Filed: July 26, 2006
    Publication date: December 28, 2006
    Applicant: FUJIKIN INCORPORATED
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
  • Publication number: 20040137744
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Application
    Filed: December 1, 2003
    Publication date: July 15, 2004
    Applicants: Fujikin Incorporated, Tadahiro OHMI
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
  • Publication number: 20020122758
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Application
    Filed: February 2, 2001
    Publication date: September 5, 2002
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura