Abstract: A substrate storage facility comprises a multilevel shelf, on which a plurality of cassettes with airtight covers accommodating a plurality of substrates can be placed; a substrate transport portion, moveably positioned on the front-face side of the multilevel shelf, which opens and closes the airtight covers of the cassettes with airtight covers placed on the multilevel shelf, and which transports the substrates between cassettes with airtight covers; and, a cassette transport portion, moveably positioned on the rear-face side of the multilevel shelf, which carries cassettes with airtight covers into and out of all the cassette placement positions of the multilevel shelf. By means of this substrate storage facility, interchange processing of substrates accommodated in cassettes, as well as carrying in and out of cassettes when appropriate, can be performed.

Abstract: The wafer storing cabinet has a storing cabinet main body 10 which is provided therein with storage cassettes 11, accommodation shelves 12A and 12B, and a wafer transfer section 20, and has an in/out storing cabinet 17, inert gas is supplied into the storing cabinet main body 10, in the wafer transfer section 20, wafers taken out from the transfer cassettes 15 and 16 which are transferred into the storing cabinet main body 10 are accommodated in the storage cassette 11, wafer taken out from the storage cassette 11 are accommodated in the transfer cassettes 15 and 16, the storage cassette 11 has a door which can secure a hermetic function, and the door is always closed except when a wafer is transferred into the storage cassette 11 and when a wafer is transferred out from the storage cassette 11.