Patents by Inventor Toshiteru Nonaka

Toshiteru Nonaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6939620
    Abstract: For a three-layer flexible board, there is provided a copper alloy foil that requires no roughening processing, that has good adhesion with an adhesive containing an epoxy resin, that can be laminated to form a copper-clad laminate, that has a low surface roughness, and that has high conductivity and strength. The copper alloy of the foil contains at least one of 0.01-2.0 weight percent Cr and 0.01-1.0 weight percent Zr or contains 1.0-4.8 weight percent Ni and 0.2-1.4 weight percent Si. Good adhesion of the copper alloy foil to a resin substrate with an adhesive containing an epoxy resin is obtained by setting the thickness of the anticorrosive coating to less than 3 nm; the surface roughness of the copper alloy foil is below 2 ?m expressed as ten-point average surface roughness (Rz); and, without roughening processing, the 180° C. peel strength, after adhesion of the copper alloy foil to the board film by means of an adhesive containing an epoxy resin, is greater than 8.0 N/cm.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: September 6, 2005
    Assignee: Nikko Metal Manufacturing Co., Ltd.
    Inventors: Hifumi Nagai, Toshiteru Nonaka
  • Publication number: 20040076832
    Abstract: For a three-layer flexible board, there is provided a copper alloy foil that requires no roughening processing, that has good adhesion with an adhesive containing an epoxy resin, that can be laminated to form a copper-clad laminate, that has a low surface roughness, and that has high conductivity and strength. The copper alloy of the foil contains at least one of 0.01-2.0 weight percent Cr and 0.01-1.0 weight percent Zr or contains 1.0-4-8 weight percent Ni and 0.2-1.4 weight percent Si. Good adhesion of the copper alloy foil to a resin substrate with an adhesive containing an epoxy resin is obtained by setting the thickness of the anticorrosive coating to less than 3 nm; the surface roughness of the copper alloy foil is below 2 &mgr;m expressed as ten-point average surface roughness (Rz); and, without roughening processing, the 180° C. peel strength, after adhesion of the copper alloy foil to the board film by means of an adhesive containing an epoxy resin, is greater than 8.0 N/cm.
    Type: Application
    Filed: October 10, 2003
    Publication date: April 22, 2004
    Inventors: Hifumi Nagai, Toshiteru Nonaka
  • Publication number: 20030121697
    Abstract: For a three-layer flexible board, there is provided a copper alloy foil that requires no roughening processing, that has good adhesion with an adhesive containing an epoxy resin, that can be laminated to form a copper-clad laminate, that has a low surface roughness, and that has high conductivity and strength. The copper alloy of the foil contains at least one of 0.01-2.0 weight percent Cr and 0.01-1.0 weight percent Zr or contains 1.0-4-8 weight percent Ni and 0.2-1.4 weight percent Si. Good adhesion of the copper alloy foil to a resin substrate with an adhesive containing an epoxy resin is obtained by setting the thickness of the anticorrosive coating to less than 3 nm; the surface roughness of the copper alloy foil is below 2 &mgr;m expressed as ten-point average surface roughness (Rz); and, without roughening processing, the 180° C. peel strength, after adhesion of the copper alloy foil to the board film by means of an adhesive containing an epoxy resin, is greater than 8.0 N/cm.
    Type: Application
    Filed: July 3, 2002
    Publication date: July 3, 2003
    Inventors: Hifumi Nagai, Toshiteru Nonaka
  • Publication number: 20030096082
    Abstract: For a two-layer printed wiring board including a polyimide substrate produced with varnish containing polyamic acid as the raw material for the polyimide and a copper alloy foil laminated with the polyimide substrate, there is provided, as the copper alloy foil, a copper alloy foil having good wettability with the varnish and a low surface roughness that enables direct bonding with polyimide without roughening plating processing of the copper alloy foil. The copper alloy of the foil contains at least one of 0.01-2.0 weight percent Cr and 0.01-1.0 weight percent Zr or contains 1.0-4.8 weight percent Ni and 0.2-1.4 weight percent Si. Good wettability with the varnish is obtained by setting the thickness of anticorrosive coating on the copper alloy foil to less than 5 nm; the surface roughness is less than 2 &mgr;m expressed as ten-point average surface roughness (Rz); and, without roughening and plating processing, the 180° C.
    Type: Application
    Filed: July 11, 2002
    Publication date: May 22, 2003
    Inventors: Hifumi Nagai, Toshiteru Nonaka