Abstract: Contaminant is prevented from migrating from a gripping hand and contaminating a substrate case after cleaning the substrate case. The apparatus cleans, in a state with no substrate, a substrate case C which holds a substrate, provided with a booth 10 which forms a clean space, provided with cleaning tanks 40, 50 which hold and clean the parts of the substrate case C in a separated status in the booth 10, provided with a conveyance mechanism 60 which grips part of the substrate case C by a gripping hand 70 and conveys them to and from the cleaning tanks 40, 50, making the gripping hand 70 stand by at a standby position Q in the booth 10 during cleaning of the substrate case C, and provided with a cleaning means 80 for cleaning the gripping hand 70 during cleaning of the parts. The cleaning means 80 is provided with a spray nozzle 81 which sprays a gas toward the gripping hand 70 and an exhaust fan 82 which exhausts the gas from the inside of the booth 10.

Abstract: Contaminant which sticks to an outer pod which is exposed to the outside air is prevented from contaminating an inner pod and the two can be cleaned so the cleaning precision can be improved. A substrate case C which is provided with an inner pod N which holds a substrate at the inside and an outer pod M which holds the inner pod N at the inside is cleaned in a state with no substrate. A booth 10 which forms a clean space is provided. Inside the booth 1, a first cleaning tank 40 which cleans the parts of the outer base Mb and outer shell Ms of the outer pod M in a separated state and a second cleaning tank 50 which holds and cleans the parts of the inner base Nb and inner shell Ns of the inner pod N in a separated state are provided. A conveyance mechanism is provided with conveys these parts to the corresponding first cleaning tank 40 and second cleaning tank 50.

Abstract: Movement from a carrying table to a support table can be prevented from becoming complicated and made simpler and positioning on the support table can be easily performed.

Abstract: Parts of a substrate case can be separated and cleaned inside a tank body while making the cleaning solution evenly reach it. A substrate case C which is provided with a base Mb and shell Ms and holds a substrate inside is cleaned in a state with no substrate.

Abstract: Parts of a substrate case can be separated and cleaned inside a tank body while making the cleaning solution evenly reach it. A substrate case C which is provided with a base Mb and shell Ms and holds a substrate inside is cleaned in a state with no substrate.

Abstract: Movement from a carrying table to a support table can be prevented from becoming complicated and made simpler and positioning on the support table can be easily performed.

Abstract: Contaminant is prevented from migracing from a gripping hand and contaminating a substrate ease after cleaning the substrate case. The apparatus cleans, in a state with no substrate, a substrate case C which holds a substrate, provided with a hooch 10 which forms a clean space, provided with cleaning tanks 40, 50 which hold and clean the parts of the substrate case C in a separated status in this booth 10, provided with a conveyance mechanism 60 which grips part of the substrate case C by a gripping hand 70 and conveys them to and from the cleaning tanks 48, 50, making the gripping hand 60 stand by at a standby position Q in the booth 10 during cleaning of the substrate case C, and provided with a cleaning means 80 for cleaning the gripping hand 70 daring cleaning of the parts. The cleaning means 80 is provided with a spray nozzle 81 which sprays a gas toward the gripping hand 70 and an exhaust fan 82 which exhausts the gas from the inside of the booth 10.

Abstract: Contaminant which sticks to an outer pod which is exposed to the outside air is prevented from contaminating an inner pod and the two can be cleaned so the cleaning precision can be improved. A substrate case C which is provided with an inner pod N which holds a substrate at the inside and an outer pod M which holds the inner pod N at the inside is cleaned in a state with no substrate. A booth 10 which forms a clean space is provided. Inside the booth 1, a first cleaning tank 40 which cleans the parts of the outer base Mb and outer shell Ms of the outer pod M in a separated state and a second cleaning tank 50 which holds and cleans the parts of the inner base Nb and inner shell Ns of the inner pod N in a separated state are provided. A conveyance mechanism is provided with conveys these parts to the corresponding first cleaning tank 40 and second cleaning tank 50.