Abstract: A display device is provided that comprising circuitry configured to transmit, to a reproduction device, an extended display identification data (EDID) that includes the display information representing a performance of the display device. The circuitry further receives HDR video data from the reproduction device including HDR information that includes brightness characteristic information in frame data when the display information includes information representing a display performance of the HDR video, contains the EDID containing information of a 4k resolution or higher, displays an image of the received HDR video data in accordance with brightness designated by the HDR information, and adjusts a brightness of the image of the received HDR video data to a brightness capability for the display of the image.

Abstract: Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc. The sputtering target is a sputtering target that contains metallic Co, metallic Pt, and an oxide, wherein the sputtering target contains no metallic Cr except inevitable impurities, the oxide is B2O3 and the sputtering target comprises 10 to 50 vol % of the oxide.

Abstract: Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc. The sputtering target is a sputtering target that contains metallic Co, metallic Pt, and an oxide, wherein the sputtering target contains no metallic Cr except inevitable impurities, the oxide has B2O3, and the sputtering target comprises 10 to 50 vol % of the oxide.

Abstract: A sputtering target for magnetic recording media capable of producing a magnetic thin film in which the magnetic crystal grains are micronized and the distance between the centers of the grains is reduced while good magnetic properties are maintained. The target including metallic Pt and an oxide, with the balance being metallic Co and inevitable impurities, wherein the Co is contained in a range of 70 at % to 90 at % and the Pt is contained in a range of 10 at % to 30 at % relative to a total of metallic components in the sputtering target for magnetic recording media, the oxide is contained in a range of 26 vol % to 40 vol % relative to a total volume of the sputtering target for magnetic recording media, and the oxide is composed of B2O3 and one or more high-melting-point oxides having a melting point of 1470° C. or higher and 2800° C. or lower.

Abstract: Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc and a process for production thereof. The sputtering target is a sputtering target comprising metallic Co, metallic Pt, and an oxide, wherein the sputtering target does not contain metallic Cr, and the oxide is WO3 and wherein the sputtering target comprises 25 to 50 at % of metallic Co relative to a total of metallic Co and metallic Pt.

Abstract: A sputtering target for magnetic recording media capable of producing a magnetic thin film in which the magnetic crystal grains are micronized and the distance between the centers of the grains is reduced while good magnetic properties are maintained. The target including metallic Pt and an oxide, with the balance being metallic Co and inevitable impurities, wherein the Co is contained in a range of 70 at % to 90 at % and the Pt is contained in a range of 10 at % to 30 at % relative to a total of metallic components in the sputtering target for magnetic recording media, the oxide is contained in a range of 26 vol % to 40 vol % relative to a total volume of the sputtering target for magnetic recording media, and the oxide is composed of B2O3 and one or more high-melting-point oxides having a melting point of 1470° C. or higher and 2800° C. or lower.

Abstract: Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc. The sputtering target is a sputtering target that contains metallic Co, metallic Pt, and an oxide, wherein the sputtering target contains no metallic Cr except inevitable impurities, the oxide has B2O3 and the sputtering target comprises 10 to 50 vol % of the oxide.

Abstract: Provided is a sputtering target with which it is possible to form a magnetic thin film having a high coercive force Hc and a process for production thereof. The sputtering target is a sputtering target comprising metallic Co, metallic Pt, and an oxide, wherein the sputtering target does not contain metallic Cr, and the oxide is WO3 and wherein the sputtering target comprises 25 to 50 at % of metallic Co relative to a total of metallic Co and metallic Pt.

Abstract: A sintering method with uniaxial pressing includes: a powder filling step of disposing a spent target in an inner space of a frame jig having the inner space piercing in a uniaxial direction, and filling the inner space with a raw material powder for a target to cover an erosion part side of the spent target with the raw material powder for a target, a cushioning-material disposition step of disposing a deformable cushioning material so that the raw material powder for a target with which the inner space has been filled in the powder filling step is sandwiched between the spent target and the deformable cushioning material; and a sintering step of pressing the raw material powder for a target with which the inner space has been filled and the spent target in the uniaxial direction through the cushioning material and sintering them.

Abstract: A method for manufacturing an electric contact material in which a surface layer portion of an alloy containing 1 to 15 mass % of Cu, 0.01 to 0.7 mass % of Ni, and the remainder of Ag and unavoidable impurities is supplied with an amount of oxygen exceeding the amount of oxygen required for internal oxidation of Cu to form an oxygen concentrated layer.

Abstract: Provided is a coke drum analysis apparatus and method, in which a thickness of coke adhering to an inner surface of a sidewall portion of a coke drum is calculated based on change in a temperature of an outer surface of the sidewall portion and a water level ascent velocity of quenching water, and change in a temperature of the inner surface of the sidewall portion is calculated based on the water level ascent velocity and the calculated thickness of the coke.

Abstract: A sintering method with uniaxial pressing includes: a powder filling step of disposing a spent target in an inner space of a frame jig having the inner space piercing in a uniaxial direction, and filling the inner space with a raw material powder for a target to cover an erosion part side of the spent target with the raw material powder for a target, a cushioning-material disposition step of disposing a deformable cushioning material so that the raw material powder for a target with which the inner space has been filled in the powder filling step is sandwiched between the spent target and the deformable cushioning material; and a sintering step of pressing the raw material powder for a target with which the inner space has been filled and the spent target in the uniaxial direction through the cushioning material and sintering them.

Abstract: A target consisting essentially of a CoCrPt-based metal or a CoCrPtRu-based metal, and one or more metal oxides selected from the group consisting of SiO2, Cr2O3, CoO, TiO2 and Ta2O5, is heated in an upper crucible of a two-level crucible that includes the upper crucible with a through hole formed in a bottom surface, and a lower crucible disposed below the through hole. The target is heated at a temperature of from 1400 to 1790° C. if the target does not contain both TiO2 and Ta2O5. The target is heated at a temperature of from 1400 to 1630° C. if the target contains TiO2 but does not contain Ta2O5. The target is heated at a temperature of from 1400 to 1460° C. if the target contains Ta2O5. The metal thereby melted is caused to flow into the lower crucible, so that the metal is separated from the metal oxide.

Abstract: In the method for recovering a metal from a target that contains a metal and a metal oxide, the target contains a sintered body of the metal oxide after being heated under a condition of melting the metal without melting or decomposing the metal oxide. The target is heated in an upper crucible of a two-level crucible that includes the upper crucible with a through hole-formed in a bottom surface thereof, and a lower crucible disposed below the through hole, the size of the through hole being set such that it does not allow the sintered body of the metal oxide contained in the target to pass therethrough, and the melted metal is caused to flow into the lower crucible, so that the metal is separated from the metal oxide.

Abstract: A sintering method with uniaxial pressing includes: a powder filling step of disposing a spent target in an inner space of a frame jig having the inner space piercing in a uniaxial direction, and filling the inner space with a raw material powder for a target to cover an erosion part side of the spent target with the raw material powder for a target, a cushioning-material disposition step of disposing a deformable cushioning material so that the raw material powder for a target with which the inner space has been filled in the powder filling step is sandwiched between the spent target and the deformable cushioning material; and a sintering step of pressing the raw material powder for a target with which the inner space has been filled and the spent target in the uniaxial direction through the cushioning material and sintering them.

Abstract: A target consisting essentially of a CoCrPt-based metal or a CoCrPtRu-based metal, and one or more metal oxides selected from the group consisting of SiO2, Cr2O3, CoO, TiO2 and Ta2O5, is heated in an upper crucible of a two-level crucible that includes the upper crucible with a through hole formed in a bottom surface, and a lower crucible disposed below the through hole. The target is heated at a temperature of from 1400 to 1790° C. if the target does not contain both TiO2 and Ta2O5. The target is heated at a temperature of from 1400 to 1630° C. if the target contains TiO2 but does not contain Ta2O5. The target is heated at a temperature of from 1400 to 1460° C. if the target contains Ta2O5. The metal thereby melted is caused to flow into the lower crucible, so that the metal is separated from the metal oxide.

Abstract: In the method for recovering a metal from a target that contains a metal and a metal oxide, the target contains a sintered body of the metal oxide after being heated under a condition of melting the metal without melting or decomposing the metal oxide. The target is heated in an upper crucible of a two-level crucible that includes the upper crucible with a through hole-formed in a bottom surface thereof, and a lower crucible disposed below the through hole, the size of the through hole being set such that it does not allow the sintered body of the metal oxide contained in the target to pass therethrough, and the melted metal is caused to flow into the lower crucible, so that the metal is separated from the metal oxide.

Abstract: An object of the present invention is to provide a commutator or brush material for a small electric DC motor which enables a lengthened operating life of a spindle motor for a DVD controlled using a pulse current. A commutator material for a small electric DC motor in accordance with the present invention is characterized by being composed of 6.0 to 10.0 wt % of Cu, 1.0 to 5.0 wt % of ZnO, and a balance of Ag and in that Cu metal particles and ZnO particles are dispersed in an AgCu matrix. A brush material for a small electric DC motor in accordance with the present invention is characterized by being composed of 0.1 to 5.0 wt % of MgO and a balance of Ag and in that MgO particles are dispersed in an Ag matrix, or is characterized by being composed of 5.0 to 15.0 wt % of Ni and a balance of Pt and in that Ni is dissolved in a Pt matrix.

Abstract: A reinforcing material for urethane foam effectively protects a molded urethane foam body and suppresses fricatives with a metal spring, having high productivity and excellent handleability and being applicable to a molded urethane foam body with highly uneven shape at low cost. It is a reinforcing material for urethane foam wherein a nonwoven fabric A having single fiber linear density of 1.0 to 3.0 dtex and a nonwoven fabric B having single fiber linear density of 0.5 to 2.5 dtex are laminated by needlepunching process by inserting needles from a direction of the nonwoven fabric A with a needle density of 35 to 70 needles/cm2.

Abstract: A method for manufacturing an electric contact material is provided which can prevent it from being adhesively melted even when being exposed to high temperatures resulting from an arc induced by an electric current being turned on or off. Also an electric contact material which is manufactured by the method and a thermal fuse are provided. A surface layer portion of an alloy containing 1 to 15 mass % of Cu, 0.01 to 0.7 mass % of Ni, and the remainder of Ag and unavoidable impurities is supplied with an amount of oxygen exceeding the amount of oxygen required for internal oxidation of Cu to form an oxygen concentrated layer. This alloy can serve as an electric contact material. This electric contact material is formed into a movable electrode, which is in turn employed for a thermal fuse.