Abstract: Provided is a novel dark-current-circuit interruption structure that can stably maintain the state of engagement of an engaging portion of a conductive component holder with an engaged portion of a case, while reducing the size of the case, and an electrical junction box including the same. A conductive component is formed by a plate metal fitting, a conductive component holder 48 includes elastic projecting pieces and engaging portions that are provided on each of a pair of side walls that are opposingly positioned with a gap between the plate metal fitting and each of the side walls, and the case includes engaged portions with which the engaging portions are to be engaged. When attaching the conductive component holder to the case, the engaging portions and the engaged portions are configured to come into contact with each other to cause the elastic projecting pieces 68 and 76 to elastically deform.

Abstract: Provided is a novel dark-current-circuit interruption structure that can stably maintain the state of engagement of an engaging portion of a conductive component holder with an engaged portion of a case, while reducing the size of the case, and an electrical junction box including the same. A conductive component is formed by a plate metal fitting, a conductive component holder 48 includes elastic projecting pieces and engaging portions that are provided on each of a pair of side walls that are opposingly positioned with a gap between the plate metal fitting and each of the side walls, and the case includes engaged portions with which the engaging portions are to be engaged. When attaching the conductive component holder to the case, the engaging portions and the engaged portions are configured to come into contact with each other to cause the elastic projecting pieces 68 and 76 to elastically deform.

Abstract: Exposure areas are wholly overlapped by moving a gradient refractive index lens array in a direction perpendicular to a scanning direction, or by providing a plurality of gradient refractive index lens arrays, an optical filter having a density distribution of lightness and darkness to compensate light transmission nonuniformity of the gradient refractive index lens array is arranged, or an opening control plate for limitedly using only of a uniform portion is provided. Two or more means may be simultaneously provided among the aforementioned mean. Moreover, any one of a microscopic transmission shutter array, a microscopic reflection shutter array, and a microscopic light emitter array is used instead of a mask, or an illuminating device and the mask.

Abstract: Exposure areas are wholly overlapped by moving a gradient refractive index lens array in a direction perpendicular to a scanning direction, or by providing a plurality of gradient refractive index lens arrays, an optical filter having a density distribution of lightness and darkness to compensate light transmission nonuniformity of the gradient refractive index lens array is arranged, or an opening control plate for limitedly using only of a uniform portion is provided. Two or more means may be simultaneously provided among the aforementioned mean. Moreover, any one of a microscopic transmission shutter array, a microscopic reflection shutter array, and a microscopic light emitter array is used instead of a mask, or an illuminating device and the mask.

Abstract: Exposure areas are wholly overlapped by moving a gradient refractive index lens array in a direction perpendicular to a scanning direction, or by providing a plurality of gradient refractive index lens arrays, an optical filter having a density distribution of lightness and darkness to compensate light transmission nonuniformity of the gradient refractive index lens array is arranged, or an opening control plate for limitedly using only of a uniform portion is provided. Two or more means may be simultaneously provided among the aforementioned mean. Moreover, any one of a microscopic transmission shutter array, a microscopic reflection shutter array, and a microscopic light emitter array is used instead of a mask, or an illuminating device and the mask.

Abstract: An apparatus and a method for exposing a photosensitive material deposited on the inner surface of a tube such as a circular or polygonal tube to light to form a predetermined exposed pattern are provided. The apparatus includes: a guide rod that is inserted into the inner space of an exposure object and emits an exposure light beam toward the inner side of the exposure object; and a stage for changing the relative positions of the exposure object and the guide rod and/or the relative angle between the exposure object and the guide rod. After the irradiation spot of the exposure light beam is brought into focus and/or is adjusted to an exposure starting point, the exposure light beam is projected onto a predetermined position on the exposure object to form a predetermined exposed pattern of a photosensitive material deposited on the inner surface of the exposure object.

Abstract: According to this invention, illumination light for illuminating a mask on which a micropattern is drawn is inclined at an angle corresponding to a numerical aperture of an optical projection lens located below the mask with respect to an optical axis. The illumination light is obliquely incident on the mask to expose the micropattern on an object located below the optical projection lens.