Abstract: Multiple light sources are configured to emit light to be used for range-image capturing. An electronic component is associated with operations of the light sources. A shield member is configured to block spatial propagation of noise with respect to the electronic component. An optical member has multiple lenses allowing passage of the light. The shield member is formed with multiple openings. The openings are arranged so as to allow at least a portion of light emitted from each of the light sources to pass toward an associated one of the lenses.

Abstract: A connector is mounted on a board on which a circuitry is mounted. The connector includes a terminal and a connector housing. The terminal is electrically connected to the circuitry. The connector housing supports the terminal. The terminal has a first portion that extends in a direction intersecting the board, and is in elastic contact with an inner wall of a via hole formed in the board. The connector housing has a protrusion that extends in a direction intersecting the board and is fitted into a fitting hole formed in the board.

Abstract: A fluid container includes a first metallic member, a second metallic member, an adherence part, a first interface, and a second interface. The first metallic member contains chromium. The second metallic member contains chromium. The adherence part is made of an oxide containing chromium as a primary component. The adherence part adheres the first and second metallic members to each other. The first interface is provided as an interface between the first metallic member and the adherence part. The second interface is provided as an interface between the second metallic member and the adherence part. The first interface includes a first slant portion. The first slant portion slants with respect to an in-plane direction of the first metallic member.

Abstract: A chromium alloy container has an internal space. The chromium alloy container includes a first alloy member constituted by an alloy containing chromium, a second alloy member constituted by an alloy containing chromium, and an adhering portion adhering the first alloy member and the second alloy member to each other. The adhering portion is constituted by an oxide containing chromium as a main component. The adhering portion has a void therein.

Abstract: A chromium alloy container has an internal space. The chromium alloy container includes a first alloy member constituted by an alloy containing chromium, a second alloy member constituted by an alloy containing chromium, and an adhering portion adhering the first alloy member and the second alloy member to each other. The adhering portion is constituted by an oxide containing chromium as a main component, and metal particles at least partially embedded in the oxide.

Abstract: The present fluid container includes a first metallic member, a second metallic member, an adherence par, a first interface, and a second interface. Each of the first and second metallic members contains chromium. The adherence part is made of an oxide containing chromium as a primary component. The adherence part adheres the first metallic member and the second metallic member to each other. The first interface is provided as an interface between the first metallic member and the adherence part. The second interface is provided as an interface between the second metallic member and the adherence part. The first interface includes a first wavy portion. The first wavy portion repeatedly winds in a thickness direction. The first wavy portion extends along an outer peripheral edge of the first metallic member.

Abstract: A chromium alloy container has an internal space. The reducing gas container includes a first metal member, a second metal member, and a sealing portion sealing a gap between the first metal member and the second metal member. The sealing portion includes a first bonding portion integrated with the first and second metal members, and a second bonding portion sandwiched between the first and second metal members and disposed on an internal space side of the first bonding portion. The first bonding portion is constituted by a metal material. The second bonding portion is constituted by a crystalline metal oxide.

Abstract: A chromium alloy container includes a first alloy member constituted by an alloy containing chromium, a second alloy member constituted by an alloy containing chromium, and an adhering portion adhering the first alloy member and the second alloy member to each other. The adhering portion is constituted by an oxide containing chromium as a main component.

Abstract: A chromium alloy container has an internal space. The chromium alloy container includes a first alloy member constituted by an alloy containing chromium, a second alloy member constituted by an alloy containing chromium, and an interposing portion interposed between the first alloy member and the second alloy member. The interposing portion includes an oxide adhesion layer constituted by an oxide containing chromium as a main component, and a metal connection portion embedded in the oxide adhesion layer and connecting the first alloy member and the second alloy member to each other.

Abstract: The present fluid container includes a first metallic member, a second metallic member, and an adherence part. Each of the first and second metallic members contains chromium. The adherence part is made of an oxide containing chromium as a primary component. The adherence part adheres the first metallic member and the second metallic member to each other. The adherence part includes a base portion and a protruding portion. The protruding portion protrudes from the base portion in a thickness direction.

Abstract: [Object] To provide a plasma processing apparatus capable of expanding an formation region of plasma generated on an upper electrode side to increase the processing speed and a control method therefor. [Solving Means] A plasma processing apparatus according to an embodiment of the present invention includes a vacuum chamber, a substrate-supporting stage, a counter electrode, and a resonant circuit. The substrate-supporting stage is disposed inside the vacuum chamber and is connected to a first high-frequency power supply circuit that supplies a high-frequency power at a first frequency. The counter electrode is disposed in opposite to the stage and is connected to a second high-frequency power supply circuit that supplies a high-frequency power at a second frequency. The resonant circuit allows high-frequency current at the second frequency from the counter electrode to pass therethrough.

Abstract: A silicon dry etching method of the invention, includes: preparing a silicon substrate; forming a mask pattern having an opening on the silicon substrate; forming a deposition layer on the silicon substrate in accordance with the mask pattern while introducing a first gas; carrying out a dry etching process with respect to the silicon substrate in accordance with the mask pattern while introducing a second gas, and thereby forming a recess pattern on a surface of the silicon substrate; and carrying out an ashing process with respect to the silicon substrate while introducing a third gas.

Abstract: A plasma processing device includes an inductively coupled plasma antenna including an input end and an output end, a series circuit including an additional inductor and a variable capacitor connected in series, and a controller that varies a capacitance of the variable capacitor. The input terminal is connected via an antenna matching device to an antenna power supply. The output terminal is connected to the additional inductor. The additional inductor is connected via the variable capacitor to ground.

Abstract: In a three-terminal multilayer ceramic capacitor, each of first through fourth external electrodes includes a base electrode layer including a conductive metal and a glass component, an organic layer including an organosilicon compound covering the base electrode layer, and a plating layer on the organic layer. On a surface of the organic layer in a portion facing the plating layer, an atomic concentration ratio of Si to Cu is greater than or equal to about 1.5% and less than or equal to about 5.5%, or greater than or equal to about 0.8% and less than or equal to about 2.8%, and a surface roughness is greater than or equal to about 0.334 and less than or equal to about 0.371, or greater than or equal to about 0.352 and less than or equal to about 0.395.

Abstract: A computer system manages service management information for managing a correspondence relation between a magnitude of maturity representing a degree of promotion of digital transformation in a business operation and a service useful for the promotion of the digital transformation in the business operation, acquires, from a business system operated by a first business operator, operating data including information on an operation of the business system, estimates the maturity of the business system of the first business operator based on the operating data, identifies a service with reference to the service management information based on the maturity, the service being recommended to be introduced to the first business operator, and presents information on the identified service.

Abstract: A multilayer ceramic capacitor includes a first end-surface electrode covering portions of first and second main surfaces and first and second side surfaces, a second end-surface electrode covering portions of the first and second main surfaces and first and second side surfaces, a first side-surface electrode covering portions of the first and second main surfaces, and a second side-surface electrode covering portions of the first main surface and the second main surface, the first and second internal electrodes being connected to the first and second end-surface electrodes. The first and second end-surface electrodes each include a first base electrode layer and first and second plating electrode layers, and the first and second side-surface electrodes each include a second base electrode layer and third, fourth, fifth, and sixth plating electrode layers.

Abstract: Multiple light sources are configured to emit light including a non-visible wavelength range. A housing defines at least a portion of a space in which the light sources are housed. The housing includes a translucent portion that allows passage of the light including the non-visible wavelength range while blocking passage of light of a visible wavelength range.

Abstract: Multiple light sources are configured to emit light to be used for range-image capturing. An electronic component is associated with operations of the light sources. A shield member is configured to block spatial propagation of noise with respect to the electronic component. An optical member has multiple lenses allowing passage of the light. The shield member is formed with multiple openings. The openings are arranged so as to allow at least a portion of light emitted from each of the light sources to pass toward an associated one of the lenses.

Abstract: An electrochemical cell includes a metal substrate having a principal surface and a plurality of connecting holes formed in the principal surface, and a cell body disposed on the principal surface. The cell body has a gas diffusion layer disposed on the principal surface, the gas diffusion layer being electrically conductive, and a first electrode layer disposed on the gas diffusion layer; a second electrode layer. The gas diffusion layer includes a first portion sandwiched between the principal surface and the first electrode layer. The first portion has a gas flow path having a length equal to 20% or more of a total thickness of the first portion in a thickness direction thereof in a cross-section of the first portion along the thickness direction.

Abstract: An electrochemical cell includes: a metal substrate having a principal surface and a plurality of connecting holes formed in the principal surface; and a cell body disposed on the principal surface. The cell body has: a gas diffusion layer disposed on the principal surface, the gas diffusion layer being electrically conductive; a first electrode layer disposed on the gas diffusion layer; a second electrode layer; and an electrolyte layer disposed between the first electrode layer and the second electrode layer. In a plan view of the principal surface, at least a portion of an outer edge of the gas diffusion layer has a wave shape in which a peak portion and a valley portion are alternately continuous with each other.