Abstract: A control apparatus receives designation of a target position (Pt) in a storage plane (F); and, in response to the target position (Pt) being designated, the control apparatus can execute a passage formation mode for forming a passage (R). In the passage formation mode, a passage area (AR) for ensuring a passage (R) is set, and all target articles (C) placed in the passage area (AR) are moved to a location outside of the passage area (AR) in the storage plane (F) by a conveying apparatus.

Abstract: In an MMC-based power conversion device, a control device generates, for each leg circuit, a first voltage command value not based on circulating current circulating between a plurality of leg circuits and a second voltage command value based on the circulating current. A plurality of individual controllers are provided respectively corresponding to a plurality of converter cells and generate a gate control signal for controlling turning on and off of a switching element of the corresponding converter cell, based on the first voltage command value and the second voltage command value. When generating the gate control signal using pulse width modulation, each individual controller modulates a carrier signal in accordance with the second voltage command value such that the pulse width of the gate control signal changes in accordance with the second voltage command value.

Abstract: An alloy member includes a base member that includes a recess in a surface of the base member and is constituted by an alloy material containing chromium, an anchor portion is disposed in the recess and contains an oxide containing manganese and a covering layer is connected to the anchor portion and contains a low-equilibrium oxygen pressure element whose equilibrium oxygen pressure is lower than that of chromium.

Abstract: A plasma processing apparatus according to the invention includes a chamber, an inner electrode, an outer electrode, a plasma generating power source, and a gas introduction part. The plasma generating power source applies alternating-current power to the outer electrode. The outer electrode includes a first electrode, a second electrode, and a third electrode. The plasma generating power source includes a first high-frequency power source, a second high-frequency power source, and a power splitter. The first high-frequency power source applies alternating-current power having a first frequency ?1 to the first electrode and the second electrode. The second high-frequency power source applies alternating-current power having a second frequency ?2 to the third electrode. A relationship of ?1>?2 is satisfied. The power splitter is configured to split the alternating-current power into the first electrode and the second electrode with a predetermined split ratio.

Abstract: In a three-terminal multilayer ceramic capacitor, each of first through fourth external electrodes includes a base electrode layer including a conductive metal and a glass component, an organic layer including an organosilicon compound covering the base electrode layer, and a plating layer on the organic layer. On a surface of the organic layer in a portion facing the plating layer, an atomic concentration ratio of Si to Cu is greater than or equal to about 1.5% and less than or equal to about 5.5%, or greater than or equal to about 0.8% and less than or equal to about 2.8%, and a surface roughness is greater than or equal to about 0.334 and less than or equal to about 0.371, or greater than or equal to about 0.352 and less than or equal to about 0.395.

Abstract: A method for processing a subject with plasma includes repeatedly outputting first pulses from a pulse generator to a first high-frequency power supply, intermittently outputting first high-frequency power from the first high-frequency power supply to a first electrode based on the first pulses to generate the plasma, detecting start of plasma generation caused by a present first pulse with a detector, calculating a delay period, being from rise of the present first pulse until the detector detects start of plasma generation, repeatedly outputting second pulses from the pulse generator to a second high-frequency power supply based on time at which the delay period has elapsed from rise of a first pulse output after the delay period is calculated, and outputting second high-frequency power from the second high-frequency power supply to a second electrode based on the second pulses to draw ions from the plasma to the subject.

Abstract: An alloy member includes a base member that includes a recess in a surface of the base member and is constituted by an alloy material containing chromium, an anchor portion is disposed in the recess and contains an oxide containing manganese and a covering layer is connected to the anchor portion and contains a low-equilibrium oxygen pressure element whose equilibrium oxygen pressure is lower than that of chromium.

Abstract: An alloy member includes a base member that includes a recess in a surface of the base member and is constituted by an alloy material containing chromium, an anchor portion is disposed in the recess and contains an oxide containing manganese and a covering layer is connected to the anchor portion and contains a low-equilibrium oxygen pressure element whose equilibrium oxygen pressure is lower than that of chromium.

Abstract: A high-frequency power circuit includes a first antenna circuit and a second antenna circuit that are connected in parallel to a matching box connected to a high-frequency power supply. The first antenna circuit include a first antenna, a first distribution capacitor, and a first variable capacitor. The second antenna circuit includes a second antenna, a second distribution capacitor, and a second variable capacitor. A controller sets a capacitance of the first variable capacitor based on a detection result of a phase difference between current and voltage in a series-connected portion of the first antenna and the first variable capacitor during plasma production to reduce this phase difference and sets a capacitance of the second variable capacitor based on a detection result of a phase difference between current and voltage in a series-connected portion of the second antenna and the second variable capacitor during plasma production to reduce this phase difference.

Abstract: A plasma processing device includes an inductively coupled plasma antenna including an input end and an output end, a series circuit including an additional inductor and a variable capacitor connected in series, and a controller that varies a capacitance of the variable capacitor. The input terminal is connected via an antenna matching device to an antenna power supply. The output terminal is connected to the additional inductor. The additional inductor is connected via the variable capacitor to ground.

Abstract: An alloy member includes a base member that includes a plurality of recesses in a surface and is constituted by an alloy material containing chromium, a plurality of embedded portions that are respectively disposed in the plurality of recesses, and a coating layer that covers the base member and is connected to the plurality of embedded portions. An average value of actual lengths of line segments of the plurality of embedded portions is longer than an average value of straight lengths of straight lines of the plurality of embedded portions in a cross-section of the base member along a thickness direction of the base member. The average value of the actual lengths is 1.10 times or more the average value of the lengths of the straight lines.

Abstract: A high-frequency power circuit includes a first antenna circuit and a second antenna circuit that are connected in parallel to a matching box connected to a high-frequency power supply. The first antenna circuit include a first antenna, a first distribution capacitor, and a first variable capacitor. The second antenna circuit includes a second antenna, a second distribution capacitor, and a second variable capacitor. A controller sets a capacitance of the first variable capacitor based on a detection result of a phase difference between current and voltage in a series-connected portion of the first antenna and the first variable capacitor during plasma production to reduce this phase difference and sets a capacitance of the second variable capacitor based on a detection result of a phase difference between current and voltage in a series-connected portion of the second antenna and the second variable capacitor during plasma production to reduce this phase difference.

Abstract: It is provided a recommendation system for selecting a product to be proposed to a client, the recommendation system comprising: an arithmetic device configured to execute predetermined processing; and a storage device accessible to the arithmetic device; having a selection module configured to estimate a product to be recommended to a client, the selection module being configured to: calculate a change ratio at which, out of pieces of collected field information, a specific piece of field information changes; extract a business organization high in the change ratio of the specific piece of field information as a target client; and estimate, from similarity in the change of the field information of the client, a product to be recommended to the target client.

Abstract: An etching method of the invention includes: a resist pattern-forming step of forming a resist layer on a target object, the resist layer being formed of a resin, the resist layer having a resist pattern; an etching step of etching the target object via the resist layer having the resist pattern; and a resist protective film-forming step of forming a resist protective film on the resist layer. The etching step is repetitively carried out multiple times. After the etching steps are repetitively carried out multiple times, the resist protective film-forming step is carried out.

Abstract: In a cell stack, each of the plurality of the electrochemical cells includes an alloy member, a first electrode layer, a second electrode layer, and an electrolyte layer. The alloy member includes a base member constituted by an alloy material containing chromium, a coating film that covers at least a part of a surface of the base member, and a separation inhibiting portion that inhibits the coating film from separating from the base member. The number of the separation inhibiting portions included in the alloy member of the central electrochemical cell is larger than the number of the separation inhibiting portions included in the alloy member of the end electrochemical cell.

Abstract: A silicon dry etching method of the invention, includes: preparing a silicon substrate; forming a mask pattern having an opening on the silicon substrate; forming a deposition layer on the silicon substrate in accordance with the mask pattern while introducing a first gas; carrying out a dry etching process with respect to the silicon substrate in accordance with the mask pattern while introducing a second gas, and thereby forming a recess pattern on a surface of the silicon substrate; and carrying out an ashing process with respect to the silicon substrate while introducing a third gas.

Abstract: An alloy member includes a base member constituted by an alloy material containing chromium, a chromium oxide layer for covering at least a portion of a surface of the base member, a pore that is formed in an interface region of the base member that is located 30 ?m or less from an interface between the chromium oxide layer and the base member, and an extending portion extending from the pore into the base member. The pore is configured to inhibit the separation of the chromium oxide layer from the base member The extending portion contains an oxide of an element whose equilibrium oxygen pressure is lower than that of a major element of the base member.

Abstract: A worker assignment system reflects the development of the assignment of workers and has a calculation unit which calculates a deficient capability number, which is a number of capabilities lacking in the organization at a given time in the future, from first data including information indicating a number of capabilities required for tasks previously performed by the organization and a number of capabilities of workers of the organization. An identification unit identifies a task and a worker suitable for acquiring capabilities of a maximum deficient capability number calculated by the calculation unit based on second data including information indicating a relationship between the capabilities required for the task to be performed by the organization and the capabilities of the workers of the organization. An assignment unit assigns remaining workers of the organization to remaining tasks to be performed and a result of the assignment is output.

Abstract: A solid alkaline fuel cell has a cathode that is supplied with an oxidant which contains oxygen, an anode that is supplied with a fuel which contains hydrogen atoms, and an inorganic solid electrolyte that is disposed between the anode and the cathode and that exhibits a hydroxide ion conductivity. The inorganic solid electrolyte enables the permeation of water of greater than or equal to 80 ?g/min·cm2 and less than or equal to 5400 ?g/min·cm2 per unit surface area of a cathode-side surface.

Abstract: In a cell stack, each of the plurality of the electrochemical cells includes an alloy member, a first electrode layer, a second electrode layer, and an electrolyte layer. The alloy member includes a base member constituted by an alloy material containing chromium, a coating film that covers at least a part of a surface of the base member, and a separation inhibiting portion that inhibits the coating film from separating from the base member. The number of the separation inhibiting portions included in the alloy member of the central electrochemical cell is larger than the number of the separation inhibiting portions included in the alloy member of the end electrochemical cell.