Abstract: In an ophthalmic imaging system an image imaged by an imaging section for a right eye is formed as an imaging image on a display, and then displayed through a right-eye optical unit and a reflection member. An image imaged by an imaging section for a left eye is formed as an imaging image on a display, and then displayed through an optical unit and the reflection member. This thereby enables the object to be visually inspected as a three-dimensional image by the observer viewing the right-eye imaging image and the left-eye imaging image, which differ from each other according to the parallax therebetween, by viewing the respective images through right and left eyes.

Abstract: In an ophthalmic imaging system an image imaged by an imaging section for a right eye is formed as an imaging image on a display, and then displayed through a right-eye optical unit and a reflection member. An image imaged by an imaging section for a left eye is formed as an imaging image on a display, and then displayed through an optical unit and the reflection member. This thereby enables the object to be visually inspected as a three-dimensional image by the observer viewing the right-eye imaging image and the left-eye imaging image, which differ from each other according to the parallax therebetween, by viewing the respective images through right and left eyes.

Abstract: Apparatus and methods are disclosed for increasing the illuminance at a mask used for proximity-type microlithography and for achieving increases in throughput. A mask defining a pattern is illuminated by an illumination optical system. The pattern is transferred to a workpiece separated from the mask by a prescribed standoff. The mask and workpiece can be relatively moved in a scan direction. With respect to the illumination optical system, the workpiece-side numerical aperture in a first direction on the plane of the mask is different from the workpiece-side numerical aperture in a second direction, perpendicular to the first direction, on the plane of the mask. A reflective-type relay optical system can be included that comprises first and second spherical mirrors that do not produce chromatic aberrations.

Abstract: The present invention provides a projection exposure apparatus comprising: a reticle stage; an illumination optical system for illuminating a reticle on the reticle stage; a stage on which a substrate is supported; and a projection optical system having a predetermined numerical aperture to project a pattern formed on the reticle and illuminated by the illumination optical system onto the substrate, and in which a longitudinal spherial aberration thereof regarding the focusing of the pattern formed on the reticle onto the substrate are excessively corrected.