Abstract: A power conversion device according to an embodiment includes: a voltage regulator circuit configured to regulate power from a power source to a desired voltage; an inverter configured to convert the power output from the voltage regulator circuit into an alternate current power; a resonant circuit having inductance and capacitance; a high frequency transformer configured to convert the alternate current power of the inverter; a rectifier configured to convert the alternate current power output from the high frequency transformer into a direct current power; a temperature detector configured to detect a temperature of the resonant circuit; and a controller configured to detect an anomalous resonant frequency when the temperature is equal to or higher than a predetermined temperature threshold to control an anomalous state.

Abstract: An ECR plasma source of the invention is constructed of: a plasma generating chamber (10) having a generally rectangular section in a plane normal to a plasma flow; magnetic coils (20, 21) wound in generally rectangular shapes in a plane normal to the plasma flow; and a direct introduction type or branching and binding introduction type waveguide (30) or microwave cavity resonator. Microwaves are transmitted into the plasma generating chamber (10) from a plurality of openings (34) which are formed in such side faces in the waveguide (30) or the microwave cavity resonator as correspond to in-phase microwave portions. Moreover, an ECR plasma device comprises the aforementioned ECR plasma source and a sample moving mechanism for moving a large-sized sample.

Abstract: An ECR plasma source of the invention is constructed of: a plasma generating chamber (10) having a generally rectangular section in a plane normal to a plasma flow; magnetic coils (20, 21) wound in generally rectangular shapes in a plane normal to the plasma flow; and a direct introduction type or branching and binding introduction type waveguide (30) or microwave cavity resonator. Microwaves are transmitted into the plasma generating chamber (10) from a plurality of openings (34) which are formed in such side faces in the waveguide (30) or the microwave cavity resonator as correspond to in-phase microwave portions. Moreover, an ECR plasma device comprises the aforementioned ECR plasma source and a sample moving mechanism for moving a large-sized sample.

Abstract: In a target assembly for use in a magnetron-type sputtering device, a target member of a predetermined material comprises first and second targets which has a planar and a sloping surface, respectively. The planar surface has a circular periphery and is parallel to at least one object held by a holder. The sloping surface has an inner periphery concentrically of the circular periphery and an outer periphery which is nearer to the holder than the inner periphery. The first and the second targets may mechanically be united together or separated from each other and are magnetically individually driven by the use of a magnet member, such as an electromagnet and a permanent magnet, to produce a first and a second partial magnetic field in the vicinity of the first and the second targets, respectively. An electric source member is connected to the first and the second targets to produce an electric field intersecting the first and the second partial magnetic fields.