Abstract: A damper operation control device of a working vehicle, includes: a boom pivotably supported on a vehicle body; a bucket pivotably supported on a tip end of the boom; a lift cylinder which drives the boom; an accumulator connected to the lift cylinder through a branched oil passage; a switching valve connected to the branched oil passage between the lift cylinder and the accumulator, the switching valve switching between a connected state and a disconnected state between the lift cylinder and the accumulator; and a controller which performs switch control of the switching valve, wherein the controller includes: a state detecting unit which detects whether the bucket is in a loaded state; and a switching valve control unit which switches the switching valve to the connected state when the state detecting unit detects that the bucket is in the loaded state.

Abstract: An engine control device of the wheel loader includes a travelling state detecting unit for detecting a travelling state of the wheel loader, a mode switching determining unit, an acceleration speed detecting unit and a switching time controlling unit. The acceleration speed detecting unit detects the acceleration speed of the wheel loader when the mode switching determining unit determines that it is required to switch between the engine output modes from a low output mode to a high output mode based on a detection result of the travelling state detecting unit. The switching time control unit controls the switching time from start to end of mode switching to be: a first time when the acceleration speed detected by the acceleration speed detecting unit is either 0 or negative; and a second time greater than the first time when the detected acceleration speed is positive.

Abstract: A travel damper control device includes a proximity detecting part and a valve switching part. The proximity detecting part is configured to detect that the bell crank is in proximity to the cross tube. The valve switching part is configured to switch the open/close valve into a closed position when the proximity detecting part detects that the bell crank is in proximity to the cross tube.

Abstract: A damper operation control device of a working vehicle, includes: a boom pivotably supported on a vehicle body; a bucket pivotably supported on a tip end of the boom; a lift cylinder which drives the boom; an accumulator connected to the lift cylinder through a branched oil passage; a switching valve connected to the branched oil passage between the lift cylinder and the accumulator, the switching valve switching between a connected state and a disconnected state between the lift cylinder and the accumulator; and a controller which performs switch control of the switching valve, wherein the controller includes: a state detecting unit which detects whether the bucket is in a loaded state; and a switching valve control unit which switches the switching valve to the connected state when the state detecting unit detects that the bucket is in the loaded state.

Abstract: A travel damper control device includes a proximity detecting part and a valve switching part. The proximity detecting part is configured to detect that the bell crank is in proximity to the cross tube. The valve switching part is configured to switch the open/close valve into a closed position when the proximity detecting part detects that the bell crank is in proximity to the cross tube.

Abstract: An engine control device of the wheel loader includes a travelling state detecting unit for detecting a travelling state of the wheel loader, a mode switching determining unit, an acceleration speed detecting unit and a switching time controlling unit. The acceleration speed detecting unit detects the acceleration speed of the wheel loader when the mode switching determining unit determines that it is required to switch between the engine output modes from a tow output mode to a high output mode based on a detection result of the travelling state detecting unit. The switching time control unit controls the switching time from start to end of mode switching to he: a first time when the acceleration speed detected by the acceleration speed detecting unit is either 0 or negative; and a second time greater than the first time when the detected acceleration speed is positive.

Abstract: The present invention provides a rubber composition which has closed cells and comprises (A) at least one rubber component selected from natural rubber and diene-based synthetic rubbers, (B) silica in an amount of 10 to 150 parts by mass based on 100 parts by mass of the rubber component, (C) an organic fiber in an amount of 0.02 to 20 parts by mass based on 100 parts by mass of the rubber component and (D) a silane coupling agent represented by following general formula (I): in an amount of 1 to 30% by mass based on the amount by mass of silica of Component (B), exhibits excellent workability in processing the rubber and can provide a tire exhibiting excellent performance of braking and driving on road surfaces having ice and snow (excellent performance on ice) and excellent abrasion resistance; and a pneumatic tire which is obtained by using the rubber composition for a tread and exhibits the performance described above.

Abstract: Provide are a rubber composition which enhances a low fuel consumption and a reinforcing property with a filler and maintains an abrasion resistance and a DRY performance and which has an excellent on-ice performance and an excellent WET performance and a pneumatic tire prepared by using the above rubber composition for a tread. The above rubber composition is characterized by comprising (A) a rubber component containing an end-modified conjugated diene base polymer, (B) an inorganic compound powder represented by the following Formula (I) and (C) a filler: M.xSiO2.yH2O ??(I) (wherein M is at least one oxide or hydroxide of metal selected from Al, Mg, Ti and Ca, and both of x and y are an integer of 0 to 10).

Abstract: Provide are a rubber composition which enhances a reinforcing property with a filler and maintains a DRY performance and which has an excellent on-ice performance and a pneumatic tire prepared by using the above rubber composition for a tread. The rubber composition is characterized by having independent air bubbles and comprising (A) a rubber component comprising a natural rubber and an end-modified conjugated diene base polymer, (B) a fine particle-containing organic fiber and (C) a filler.

Abstract: A sputtering apparatus to form a film on a substrate includes an electrode arranged in a vacuum chamber and having a placing surface to place a target on it, a stationary portion provided on the peripheral portion of the placing surface, a shutter mechanism to shield in the vacuum chamber the target placed on the placing surface, and a moving mechanism which sets in the vacuum chamber the shutter mechanism at a predetermined position. Of the stationary portion and the movable portion of the shutter mechanism, one is provided with a recess and the other one is provided with a projection. When the moving mechanism sets the shutter mechanism at a position close to the stationary portion, the projection is inserted in the recess.

Abstract: A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.

Abstract: A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.

Abstract: Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).

Abstract: A radiation sensitive resin composition comprising an alkali-soluble resin such as a polyvinyl phenol or a phenol resin other than a polyvinyl phenol having a weight average molecular weight of 2,000 or higher, a cross-linking agent such as an amino resin having two or more active methylol groups in a molecule, a particulate rubbery material comprising a cross-linked polymer chemically modified with an epoxy compound, a liquid rubbery material having a number average molecular weight between 1,000 and 10,000 and a glass transition temperature of -20.degree. C. or lower, and a radiation polymerization initiator. The composition is best suited for use as a material for preparing an insulating layer interposed between two layers of conductive wiring that are arranged in an overlaying stack.

Abstract: A negative photoresist stripping liquid composition is provided which comprises from 30 to 75% by weight of dimethyl sulfoxide, from 20 to 65% by weight of 1,3-dimethyl-2-imidazolidinone, from 0.1 to 5% by weight of a tetraalkylammonium hydroxide and from 0.5 to 15% by weight of water. The composition has a superior stripping performance especially against photoresists that are alkali-developable and can form films of at least 20 .mu.m in thickness, and has no problem of freezing even when stored outdoors in the winter. The composition is useful for the stripping of negative photoresists for bump formation and for fabricating circuit substrates.

Abstract: A rubber composition comprises one or more rubbers selected from the group consisting of natural rubber, polyisoprene rubber, styrene-butadiene copolymer rubber, polybutadiene rubber, acrylonitrile-butadiene copolymer rubber, isoprene-isobutylene copolymer rubber and ethylene-propylene-diene terpolymer rubber, and a reinforcing agent and a fluorine-based additive having a perfluoroalkyl group containing copolymer.

Abstract: A radiation sensitive resin composition comprising:(A) an alkali-soluble copolymer comprising:(a) 10 to 50% by weight of a first unit consisting of a radical polymerizable compound having a carboxylic group,(b) 20 to 60% by weight of a second unit consisting of a radical polymerizable compound having a cycloalkyl group, the unit containing no carboxyl group, and(c) 5 to 40% by weight of a third unit consisting of a radical polymerizable compound other than the radical polymerizable compounds in (a) and (b) above;(B) a polymerizable compound having at least one ethylenically unsaturated double bond; and(C) a radiation sensitive radical initiator. Also is disclosed a material for forming bumps containing the radiation sensitive resin composition. The radiation sensitive resin composition has sufficient developability with an alkali developer and sufficient resolution when the composition is in the form of a 20 .mu.m or more thick film.

Abstract: A positive photoresist composition including (A) 100 parts by weight of an alkali-soluble novolak resin, and based thereon; (B) 5 to 50 parts by weight of an alkali-soluble acrylic resin containing, as s, 10 to 80% by weight of a unit of a radical-polymerizable compound having an alcoholic hydroxyl group and 3 to 50% by weight of at least one of a unit of a radical-polymerizable compound having a carboxyl group and a unit of a radical-polymerizable compound having a phenolic hydroxyl group; (C) 5 to 100 parts by weight of a quinonediazide group-containing compound; and (D) a solvent, is provided. This composition has a good adhesion to substrates at the time of development and a good plating solution resistance and moreover can be well wetted with plating solutions, can be well developed with alkali developing solutions and can be well stripped from substrates at the resist unexposed areas, and is suited for the formation of thick films suitable as bump forming materials.

Abstract: Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).

Abstract: A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer is an alkali developer after the irradiation: wherein R1 represents a hydrogen atom or a methyl group and R2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.