Abstract: A polymer, a luminescent material, and the likes are provided, wherein a film can be formed by a wet film-forming method, the film formed has a high stability, and is capable of being laminated with other layers by a wet film-forming method or another method, which are less decrease in charge transportation efficiency or luminescent efficiency, and attain an excellent driving stability. The polymer has a thermally dissociable and soluble group.

Abstract: A polymer, a luminescent material, and the likes are provided, wherein a film can be formed by a wet film-forming method, the film formed has a high stability, and is capable of being laminated with other layers by a wet film-forming method or another method, which are less decrease in charge transportation efficiency or luminescent efficiency, and attain an excellent driving stability. The polymer has a thermally dissociable and soluble group.

Abstract: A subject for the invention is to provide compounds where a film formation can be made by a wet film formation method, a heating temperature at the film formation is low, the film formed therefrom has high stability, and the other layers can be laminated thereon by a wet film formation method or another method. The compounds are usable as a material for electronic device which decreases little in charge transport efficiency or luminescent efficiency and which have excellent driving stability. The invention resides in a compound and a polymer which are characterized by having a elimination group of a specific structure and in an organic compound characterized by having a elimination group having a low elimination temperature.

Abstract: A polymer, a luminescent material, and the likes are provided, wherein a film can be formed by a wet film-forming method, the film formed has a high stability, and is capable of being laminated with other layers by a wet film-forming method or another method, which are less decrease in charge transportation efficiency or luminescent efficiency, and attain an excellent driving stability. The polymer has a thermally dissociable and soluble group.

Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.

Abstract: A photosensitive lithographic printing plate includes a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.

Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.

Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 ?J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450?0.1.

Abstract: The regenerative plate making and printing process, and plate making and printing apparatus of the present invention are applied to a printing system requiring a separate developing step independent of a printing step.

Abstract: The regenerative plate making and printing process, and plate making and printing apparatus of the present invention are applied to a printing system requiring a separate developing step independent of a printing step.

Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 &mgr;J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450≦0.1.

Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 &mgr;J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450<0.1.

Abstract: A photopolymerizable composition which is highly sensitive to light in the visible region and long-wavelength regions including the near infrared region, is not sensitive to light in the ultraviolet region, and has excellent handling efficiency under day light fluorescent lamps. The composition contains an ethylenically unsaturated compound, a dye which has a basic structure, a photopolymerization initiator, and a photopolymerizable lithographic printing plate which has a support and a layer of the photopolymerizable composition on its surface.

Abstract: The regenerative plate making and printing process, and plate making and printing apparatus of the present invention are applied to a printing system requiring a separate developing step independent of a printing step.

Abstract: A photosensitive composition comprising (a) an ethylenically unsaturated double bond-containing compound, (b) a sensitizing dye and (c) a photopolymerization initiator, wherein the sensitizing dye is a phthalocyanine compound showing the maximum absorption within a range of from 750 to 1,200 nm.

Abstract: A photopolymerizable composition which is highly sensitive to light not only in the visible region but in long-wavelength regions including the near infrared region, is not sensitive to light in the ultraviolet region, and has excellent handling efficiency under day light fluorescent lamps, and a photopolymerizable lithographic printing plate, are presented.

Abstract: A method for forming a positive image, which comprises exposing an image-forming material comprising a substrate and a positive photosensitive composition layer containing a novolak resin and a photo-thermal conversion material which absorbs light from an image exposure light source and converts it to heat and not containing a thermally decomposable material which decomposes by the action of heat generated by the photo-thermal conversion material upon absorption of light from the image exposure light source, formed on the substrate, followed by development with an alkali developer containing an amphoteric surfactant to form a positive image.

Abstract: A method for forming a positive image, which comprises exposing an image-forming material comprising a substrate and a positive photosensitive composition layer containing a novolak resin and a photo-thermal conversion material which absorbs light from an image exposure light source and converts it to heat and not containing a thermally decomposable material which decomposes by the action of heat generated by the photo-thermal conversion material upon absorption of light from the image exposure light source, formed on the substrate, followed by development with an alkali developer containing an amphoteric surfactant to form a positive image.

Abstract: A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 &mgr;J/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450<0.1.

Abstract: A photosensitive composition comprising (a) an ethylenically unsaturated double bond-containing compound, (b) a sensitizing dye and (c) a photopolymerization initiator, wherein the sensitizing dye is a phthalocyanine compound showing the maximum absorption within a range of from 750 to 1,200 nm.