Patents by Inventor Toshiyuki Wakayama

Toshiyuki Wakayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160015654
    Abstract: An adhesive composition for medical use of the present invention includes an acrylic copolymer, a medicament having a carboxyl group, and a base, the acrylic copolymer is prepared by copolymerization of a monomer mixture containing 0.1 to 2 mass % of an ethylenically unsaturated carboxylic acid monomer as a monomer A, 58 to 99.9 mass % of an alkyl(meth)acrylate ester having an alkyl group of 4 to 12 carbon atoms as a monomer B, 30 mass % or less of an alkyl(meth)acrylate ester having 1 to 3 carbon atoms as a monomer C, and 30 mass % or less of a monomer having an ethylenically unsaturated group other than those of the monomers A to C (the total of monomers A to D is taken as 100 mass %) as a monomer D, and the content of sulfuric acid in the acrylic copolymer is 700 ppm by mass or less.
    Type: Application
    Filed: September 29, 2015
    Publication date: January 21, 2016
    Applicant: TOAGOSEI CO., LTD.
    Inventors: Shuhei YAMAGUCHI, Toshiyuki WAKAYAMA
  • Publication number: 20130095166
    Abstract: An adhesive composition for medical use of the present invention includes an acrylic copolymer, a medicament having a carboxyl group, and a base, the acrylic copolymer is prepared by copolymerization of a monomer mixture containing 0.1 to 2 mass % of an ethylenically unsaturated carboxylic acid monomer as a monomer A, 58 to 99.9 mass % of an alkyl(meth)acrylate ester having an alkyl group of 4 to 12 carbon atoms as a monomer B, 30 mass % or less of an alkyl(meth)acrylate ester having 1 to 3 carbon atoms as a monomer C, and 30 mass % or less of a monomer having an ethylenically unsaturated group other than those of the monomers A to C (the total of monomers A to D is taken as 100 mass %) as a monomer D, and the content of sulfuric acid in the acrylic copolymer is 700 ppm by mass or less.
    Type: Application
    Filed: April 8, 2011
    Publication date: April 18, 2013
    Applicant: TOAGOSEI CO., LTD.
    Inventors: Shuhei Yamaguchi, Toshiyuki Wakayama
  • Patent number: 8247601
    Abstract: A process for producing 2-acrylamide-2-methyl propane sulfonic acid (ATBS) which comprises reacting acrylonitrile, fuming sulfuric acid, and isobutylene. During the reaction, the concentration of 2-methyl-2-propenyl-1-sulfonic acid (IBSA) and/or that of 2-methylidene-1,3-propylenedisulfonic acid (IBDSA) in the reaction system are determined. When the IBSA concentration exceeds 12,000 mass ppm and/or the IBDSA concentration exceeds 6,000 mass ppm, then the concentration of sulfur trioxide in the reaction system is reduced. Thus, ATBS having an IBSA content of 100 mass ppm or lower and an IBDSA content of 100 mass ppm or lower is produced.
    Type: Grant
    Filed: December 2, 2008
    Date of Patent: August 21, 2012
    Assignee: Toagosei Co., Ltd.
    Inventor: Toshiyuki Wakayama
  • Publication number: 20100274048
    Abstract: A process for producing 2-acrylamide-2-methyl propane sulfonic acid (ATBS) which comprises reacting acrylonitrile, fuming sulfuric acid, and isobutylene. During the reaction, the concentration of 2-methyl-2-propenyl-1-sulfonic acid (IBSA) and/or that of 2-methylidene-1,3-propylenedisulfonic acid (IBDSA) in the reaction system are determined. When the IBSA concentration exceeds 12,000 mass ppm and/or the IBDSA concentration exceeds 6,000 mass ppm, then the concentration of sulfur trioxide in the reaction system is reduced. Thus, ATBS having an IBSA content of 100 mass ppm or lower and an IBDSA content of 100 mass ppm or lower is produced.
    Type: Application
    Filed: December 2, 2008
    Publication date: October 28, 2010
    Applicant: TOAGOSEI CO. LTD.
    Inventor: Toshiyuki Wakayama