Patents by Inventor Tosiya Asano

Tosiya Asano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11809089
    Abstract: A feedback control device that takes information regarding a control deviation between a measured value and a desired value of a controlled object as input, and outputs a manipulated variable for the controlled object, includes: a first control unit that takes information regarding the control deviation as input, and outputs a manipulated variable for the controlled object; a second control unit that takes information regarding the control deviation as input, and that includes a learning control unit in which a parameter for outputting a manipulated variable for the controlled object is determined by machine learning; and an adder that adds a first manipulated variable output from the first control unit and a second manipulated variable output from the second control unit. A manipulated variable from the adder is output to the controlled object, and the second control unit includes a limiter that limits the second manipulated variable.
    Type: Grant
    Filed: August 16, 2022
    Date of Patent: November 7, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tosiya Asano, Kota Nakano
  • Patent number: 11651118
    Abstract: There is provided a simulation method of predicting a behavior of a curable composition in a process of bringing a plurality of droplets of the curable composition arranged on one of a first member and a second member into contact with an other of the first member and the second member and forming a film of the curable composition on the first member. The method includes generating a link by connecting two adjacent representative points of the plurality of droplets, generating a cell as a closed region formed by a plurality of links, and determining, based on the presence/absence of merging of droplets corresponding to each link forming the cell, whether a bubble is formed in the cell.
    Type: Grant
    Filed: June 9, 2020
    Date of Patent: May 16, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tosiya Asano, Junichi Seki, Yuichiro Oguchi
  • Publication number: 20230112689
    Abstract: An imprint apparatus that performs an imprint process of forming a pattern of an imprint material on a substrate using a mold, the apparatus including a control unit configured to control a mold driving unit and a substrate driving unit, and the imprint process including curing the imprint material, and releasing the mold from the cured imprint material, wherein the control unit includes a compensator configured to feedback-control driving of at least one of the mold driving unit and the substrate driving unit such that a positional relationship between the mold and the substrate in the releasing is maintained at a positional relationship between the mold and the substrate in the curing, and makes a gain of the compensator in the releasing smaller than a gain of the compensator in a step of the imprint process other than the releasing.
    Type: Application
    Filed: October 11, 2022
    Publication date: April 13, 2023
    Inventors: Masahiro Tamura, Tosiya Asano, Atsushi Kimura
  • Publication number: 20220390856
    Abstract: A feedback control device that takes information regarding a control deviation between a measured value and a desired value of a controlled object as input, and outputs a manipulated variable for the controlled object, includes: a first control unit that takes information regarding the control deviation as input, and outputs a manipulated variable for the controlled object; a second control unit that takes information regarding the control deviation as input, and that includes a learning control unit in which a parameter for outputting a manipulated variable for the controlled object is determined by machine learning; and an adder that adds a first manipulated variable output from the first control unit and a second manipulated variable output from the second control unit. A manipulated variable from the adder is output to the controlled object, and the second control unit includes a limiter that limits the second manipulated variable.
    Type: Application
    Filed: August 16, 2022
    Publication date: December 8, 2022
    Inventors: Tosiya Asano, Kota Nakano
  • Patent number: 11460781
    Abstract: A feedback control device that takes information regarding a control deviation between a measured value and a desired value of a controlled object as input, and outputs a manipulated variable for the controlled object, includes: a first control unit that takes information regarding the control deviation as input, and outputs a manipulated variable for the controlled object; a second control unit that takes information regarding the control deviation as input, and that includes a learning control unit in which a parameter for outputting a manipulated variable for the controlled object is determined by machine learning; and an adder that adds a first manipulated variable output from the first control unit and a second manipulated variable output from the second control unit. A manipulated variable from the adder is output to the controlled object, and the second control unit includes a limiter that limits the second manipulated variable.
    Type: Grant
    Filed: April 3, 2020
    Date of Patent: October 4, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tosiya Asano, Kota Nakano
  • Patent number: 11314165
    Abstract: The present invention provides a forming apparatus that forms a composition on a substrate using a mold including a contact region to be brought into contact with the composition, comprising: a deformation unit configured to deform the contact region; and a controller configured to perform, for each of a first shot region and a second shot region on the substrate, a process of bringing the contact region and the composition on the substrate into contact with each other while controlling the deformation of the contact region, wherein an area where the mold faces the substrate during the process is different between the first and second shot regions, and wherein the controller is configured to change, between the first and second shot regions, a process condition for bringing the contact region and the composition into contact with each other.
    Type: Grant
    Filed: October 3, 2019
    Date of Patent: April 26, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Setsuo Yoshida, Tosiya Asano
  • Publication number: 20210350047
    Abstract: A simulation method of predicting a behavior of a curable composition in a process of bringing a plurality of droplets of the curable composition arranged on a first member and a second member into contact with each other and forming a film of the curable composition on the first member is disclosed. The method includes defining a computational grid formed by a plurality of computational elements so that a plurality of droplets of the curable composition fall within one computational element, and obtaining the behavior of the curable composition in each computational element in accordance with a model corresponding to a state of the curable composition in each computational element.
    Type: Application
    Filed: July 22, 2021
    Publication date: November 11, 2021
    Inventors: Tosiya Asano, Junichi Seki, Yuichiro Oguchi
  • Publication number: 20200394349
    Abstract: The present invention provides a simulation method of predicting a behavior of a curable composition in a process of bringing a plurality of droplets of the curable composition arranged on a first member into contact with a second member and forming a film of the curable composition in a space between the first member and the second member, wherein for each of the plurality of droplets of the curable composition, a distance from a representative point of the droplet to a point on a contour of the droplet is obtained so as to match the area of the inner region of the contour to an area of the droplet obtained from a volume of the droplet and a distance between the first member and the second member in accordance with a change of the distance between the first member and the second member.
    Type: Application
    Filed: June 5, 2020
    Publication date: December 17, 2020
    Inventors: Tosiya Asano, Junichi Seki, Yuichiro Oguchi
  • Publication number: 20200394346
    Abstract: There is provided a simulation method of predicting a behavior of a curable composition in a process of bringing a plurality of droplets of the curable composition arranged on one of a first member and a second member into contact with an other of the first member and the second member and forming a film of the curable composition on the first member. The method includes generating a link by connecting two adjacent representative points of the plurality of droplets, generating a cell as a closed region formed by a plurality of links, and determining, based on the presence/absence of merging of droplets corresponding to each link forming the cell, whether a bubble is formed in the cell.
    Type: Application
    Filed: June 9, 2020
    Publication date: December 17, 2020
    Inventors: Tosiya Asano, Junichi Seki, Yuichiro Oguchi
  • Publication number: 20200233316
    Abstract: A feedback control device that takes information regarding a control deviation between a measured value and a desired value of a controlled object as input, and outputs a manipulated variable for the controlled object, includes: a first control unit that takes information regarding the control deviation as input, and outputs a manipulated variable for the controlled object; a second control unit that takes information regarding the control deviation as input, and that includes a learning control unit in which a parameter for outputting a manipulated variable for the controlled object is determined by machine learning; and an adder that adds a first manipulated variable output from the first control unit and a second manipulated variable output from the second control unit. A manipulated variable from the adder is output to the controlled object, and the second control unit includes a limiter that limits the second manipulated variable.
    Type: Application
    Filed: April 3, 2020
    Publication date: July 23, 2020
    Inventors: Tosiya Asano, Kota Nakano
  • Patent number: 10634994
    Abstract: An imprint apparatus forms a pattern on an imprint region of a substrate by bringing a mold into contact with an imprint material on the imprint region and curing the imprint material. The apparatus includes a controller for controlling an alignment operation of adjusting relative position between the mold and the imprint region in a state that the mold is in contact with the imprint material. The alignment operation includes a translation operation of performing relative translation between the imprint region and the mold, and a rotation operation of performing relative rotation between the imprint region and the mold. The rotation operation includes a first operation and a second operation, and a relative rotation direction between the imprint region and the mold in the second operation is opposite to a relative rotation direction between the imprint region and the mold in the first operation.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: April 28, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Tosiya Asano
  • Publication number: 20200110333
    Abstract: The present invention provides a forming apparatus that forms a composition on a substrate using a mold including a contact region to be brought into contact with the composition, comprising: a deformation unit configured to deform the contact region; and a controller configured to perform, for each of a first shot region and a second shot region on the substrate, a process of bringing the contact region and the composition on the substrate into contact with each other while controlling the deformation of the contact region, wherein an area where the mold faces the substrate during the process is different between the first and second shot regions, and wherein the controller is configured to change, between the first and second shot regions, a process condition for bringing the contact region and the composition into contact with each other.
    Type: Application
    Filed: October 3, 2019
    Publication date: April 9, 2020
    Inventors: Setsuo Yoshida, Tosiya Asano
  • Publication number: 20200086534
    Abstract: The present invention provides an imprint method of forming a pattern of an imprint material on a substrate by using a mold, the method including obtaining, before bringing the mold and the imprint material into contact with each other, a correction parameter for correcting deformation of a pattern of the mold caused by bringing the mold and the imprint material on the substrate into contact with each other, and reducing the deformation of the pattern of the mold by moving at least one of the mold and the substrate by a moving unit configured to relatively move the mold and the substrate in a direction parallel to a surface of the substrate in accordance with the correction parameter in a state in which the mold and the imprint material on the substrate are in contact with each other.
    Type: Application
    Filed: September 13, 2019
    Publication date: March 19, 2020
    Inventors: Tetsuji Okada, Tosiya Asano, Yosuke Murakami
  • Patent number: 10495989
    Abstract: The present invention provides an imprint apparatus which forms a pattern in an imprint material on a shot region of a substrate by using a mold, the apparatus comprising a stage that can move while holding the substrate, and a control unit configured to control relative positions of the mold and the shot region so as to reduce a shift in the relative positions caused by tilting the stage when bringing the mold and the imprint material into contact with each other, based on a contacting force of bringing the mold and the imprint material into contact with each other, and a distance from a reference position of the substrate to the shot region.
    Type: Grant
    Filed: February 9, 2016
    Date of Patent: December 3, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tosiya Asano, Takahiro Yoshida
  • Patent number: 10241424
    Abstract: An imprint apparatus includes: a stage configured to hold the substrate; a detector configured to detect a relative position between a shot region and the mold in a direction parallel to a surface of the substrate; and a controller configured to obtain, in an imprint process on a shot region different from a target shot region, information relating to a relative position, between the other shot region and the mold, used for aligning the other shot region after bringing the mold and the imprint material into contact with each other, and, when performing the imprint process on the target shot region, adjust a relative position between the target shot region and the mold in the direction by using a detection result on the target shot region and the obtained information.
    Type: Grant
    Filed: October 16, 2014
    Date of Patent: March 26, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tosiya Asano, Keiji Emoto
  • Publication number: 20180319075
    Abstract: An imprint apparatus performs an imprint process of forming a pattern on a substrate by bringing a mold into contact with an imprint material on the substrate and curing the imprint material. The apparatus includes a detector configured to detect an arrangement relationship between the substrate and the mold, and an adjuster configured to adjust the arrangement relationship based on an output from the detector. The adjuster adjusts the arrangement relationship in a state in which a vibration is applied to an imprint material between the substrate and the mold, and then further adjusts the arrangement relationship in a state in which the vibration is not applied to the imprint material between the substrate and the mold.
    Type: Application
    Filed: May 3, 2018
    Publication date: November 8, 2018
    Inventor: Tosiya Asano
  • Patent number: 10011056
    Abstract: The present invention provides an imprint apparatus including an amplifier configured to amplify a signal of displacement between a mold and a substrate, and a control unit configured to perform alignment between the mold and the substrate based on the amplified signal, wherein the control unit performs the alignment through a first operation of moving the substrate with respect to the mold in a first direction and a second operation of moving the substrate with respect to the mold in a second direction that is opposite to the first direction, and in the first operation, the control unit sets the gain of the amplifier to a first gain and changes the gain of the amplifier from the first gain to a second gain.
    Type: Grant
    Filed: July 10, 2015
    Date of Patent: July 3, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tetsuji Okada, Noriyasu Hasegawa, Tosiya Asano
  • Patent number: 9977346
    Abstract: The present invention provides a lithography apparatus which performs a process of forming a pattern on a substrate, the apparatus comprising a processing device configured to perform the process, an actuator configured to exert an action to the processing device, a detector configured to detect vibrations of a support for supporting the processing device, and a controller configured to control the actuator, wherein the controller is configured to perform an estimation of vibration transferred from the processing device to the detector, and control the actuator based on vibration obtained by the estimation and vibration detected by the detector.
    Type: Grant
    Filed: February 9, 2017
    Date of Patent: May 22, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tetsuji Okada, Tosiya Asano, Naoki Maruyama
  • Publication number: 20170269484
    Abstract: An imprint apparatus forms a pattern on an imprint region of a substrate by bringing a mold into contact with an imprint material on the imprint region and curing the imprint material. The apparatus includes a controller for controlling an alignment operation of adjusting relative position between the mold and the imprint region in a state that the mold is in contact with the imprint material. The alignment operation includes a translation operation of performing relative translation between the imprint region and the mold, and a rotation operation of performing relative rotation between the imprint region and the mold. The rotation operation includes a first operation and a second operation, and a relative rotation direction between the imprint region and the mold in the second operation is opposite to a relative rotation direction between the imprint region and the mold in the first operation.
    Type: Application
    Filed: March 13, 2017
    Publication date: September 21, 2017
    Inventor: Tosiya Asano
  • Publication number: 20170246657
    Abstract: An imprinting apparatus can form a pattern of an imprint material supplied to a substrate with a mold. The imprinting apparatus includes a substrate holding unit configured to hold the substrate, a mold holding unit configured to hold the mold, and a control unit configured to control the mold holding unit that changes an inclination of the mold while the mold is kept in contact with the imprint material based on a position in a surface direction of the substrate where the mold contacts the imprint material, in such a way as to reduce a relative inclination between the mold and the substrate that may occur if the substrate holding unit inclines when the mold is brought into contact with the imprint material.
    Type: Application
    Filed: February 17, 2017
    Publication date: August 31, 2017
    Inventors: Wataru Tamura, Noriyasu Hasegawa, Tosiya Asano, Setsuo Yoshida