Patents by Inventor Toung K. Leong, deceased

Toung K. Leong, deceased has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Materials and methods for etching silicides, polycrystalline silicon and polycides
    Patent number: 5112435
    Abstract: Gas chemistry and a related RIE mode process is described for etching silicides of the refractory metals titanium, tantalum, tungsten and aluminum and for etching composites of these silicides on polycrystalline silicon layers. BCl.sub.3 is added to the HCl/Cl.sub.2 gas chemistry used for the polysilicon etch along with additives selected from fluorinated gases and oxygen to satisfy the multiple requirement of the two-step silicide-polysilicon etch process, including the silicide-to-polysilicon etch ratio requirement.
    Type: Grant
    Filed: November 29, 1989
    Date of Patent: May 12, 1992
    Assignee: Applied Materials, Inc.
    Inventors: David N. Wang, Mei Cheng, Toung K. Leong, deceased