Patents by Inventor Toyohumi Asano

Toyohumi Asano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7824746
    Abstract: A liquid crystal sealing material comprising (a) a radiation curable resin represented by the general formula (1) below, (b) a photopolymerization initiator and (c) a filler having an average particle diameter of not more than 3 ?m. (In the formula (1), R1 represents a hydrogen atom or a methyl group; R2 may be the same or different and represents a hydrogen atom, a halogen atom, a hydroxyl group, a monovalent linear, branched or cyclic alkyl group having 1-10 carbon atoms or an alkoxy group having 1-10 carbon atoms; m represents an integer of 1-4; R3 represents a hydrogen atom or a methyl group; R4 represents a linear, branched or cyclic alkyl group having 1-10 carbon atoms; 1 represents a range of positive numbers from 1 to 5; and the repeating unit number n represents a range of positive numbers from 0 to 20.
    Type: Grant
    Filed: October 12, 2005
    Date of Patent: November 2, 2010
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Masahiro Imaizumi, Yasumasa Akatuka, Naoyuki Ochi, Eiichi Nishihara, Masaru Kudou, Toyohumi Asano, Naoki Toneda, Masahiro Hirano
  • Publication number: 20090275255
    Abstract: [Problems] To provide a liquid crystal sealing material having an extremely low possibility of contaminating liquid crystals and a high bond strength. [Means For Solving Problems] A liquid crystal sealing material comprising: (a) a resin obtained by (meth)acryloylating an epoxy resin (A) represented by formula (1); (b) a photopolymerization initiator; and (c) an inorganic filler having a mean particle diameter of 3 ?m or less, wherein a ratio of a p,p? isomer in a bisphenol F monomer unit constituting the epoxy resin (A) accounts for 40% or more, (wherein a repeating unit number z is in a range of 0 to 2).
    Type: Application
    Filed: December 20, 2005
    Publication date: November 5, 2009
    Inventors: Masahiro Imaizumi, Masaru Kudou, Makoto Ohla, Naoyuki Ochi, Eiichi Nishihara, Toyohumi Asano, Masahiro Hirano
  • Patent number: 7521099
    Abstract: To provide a photopolymerization initiator having an extremely low possibility of contaminating liquid crystals, and a liquid crystal sealing material using such a photopolymerization initiator. A liquid crystal sealing material comprising (a) a reactive photopolymerization initiator represented by the general formula (1) and (b) a photocurable resin: (wherein R1 represents a divalent straight chain, branched or cyclic lower alkylene group having 1 to 10 carbon atoms or an arylene group; R2 represents a divalent straight chain, branched or cyclic lower alkylene group having 1 to 10 carbon atoms or an arylene group; Ar represents an arylene group; R3 represents a hydrogen atom or a methyl group; X and Y respectively represent O or S; and Z is a hydroxyl group or a morpholino group).
    Type: Grant
    Filed: August 31, 2005
    Date of Patent: April 21, 2009
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Naoyuki Ochi, Toyohumi Asano, Masahiro Imaizumi, Masaru Kudou, Eiichi Nishihara, Masahiro Hirano, Kouta Yoshii, Sumio Itimura, Makiko Kogo
  • Publication number: 20080305707
    Abstract: [Problems] To provide a radiation curable resin having an extremely low possibility of contaminating liquid crystals, and a liquid crystal sealing material using such a photopolymerization initiator. [Means for Solving Problems] A liquid crystal sealing material characterized by comprising (a) a radiation curable resin represented by the general formula (1) below, (b) a photopolymerization initiator and (c) a filler having an average particle diameter of not more than 3 ?m.
    Type: Application
    Filed: October 12, 2005
    Publication date: December 11, 2008
    Applicant: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Masahiro Imaizumi, Yasumasa Akatuka, Naoyuki Ochi, Eiichi Nishihara, Masaru Kudou, Toyohumi Asano, Naoki Toneda, Masahiro Hirano
  • Publication number: 20070258033
    Abstract: [PROBLEMS] To provide a photopolymerization initiator having an extremely low possibility of contaminating liquid crystals, and a liquid crystal sealing material using such a photopolymerization initiator. [MEANS FOR SOLVING PROBLEMS] A liquid crystal sealing material comprising (a) a reactive photopolymerization initiator represented by the general formula (1) and (b) a photocurable resin: (wherein R1 represents a divalent straight chain, branched or cyclic lower alkylene group having 1 to 10 carbon atoms or an arylene group; R2 represents a divalent straight chain, branched or cyclic lower alkylene group having 1 to 10 carbon atoms or an arylene group; Ar represents an arylene group; R3 represents a hydrogen atom or a methyl group; X and Y respectively represent O or S; and Z is a hydroxyl group or a morpholino group).
    Type: Application
    Filed: August 31, 2005
    Publication date: November 8, 2007
    Inventors: Naoyuki Ochi, Toyohumi Asano, Masahiro Imaizumi, Masaru Kudou, Eiichi Nishihara, Masahiro Hirano, Kouta Yoshii, Sumio Itimura, Makiko Kogo
  • Publication number: 20060004140
    Abstract: The objective of the present invention is to develop a sealing material for liquid crystals which hardly contaminates liquid crystals, shows excellent coating workability and bonding property when applied to a substrate, and has a long working time (pot life), a low-temperature curing property and an excellent adhesion strength. The sealing material for liquid crystals is characterized by comprising: (A) as a curing resin a mixture of (a) an epoxy group-containing curing resin and (b) a (meth)acryloyl group-containing curing resin, or (c) a curing resin containing an epoxy group and a (meth)acryloyl group; (B) a radical-forming photopolymerization initiator; (C) an isophthalic acid dihydrazide having an average particle diameter of 3 ?m or smaller; and (D) a filler having an average particle diameter of 3 ?m or smaller.
    Type: Application
    Filed: November 5, 2003
    Publication date: January 5, 2006
    Inventors: Toyohumi Asano, Toshiya Sato, Masaru Kudou, Naoyuki Ochi, Masahiro Hirano