Patents by Inventor Toyoji Oshima

Toyoji Oshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9957349
    Abstract: A resin composition for transparent substrates comprises an epoxy resin (A) and a curing agent (B), wherein the curing agent (B) comprises a cyclohexane tricarboxylic anhydride.
    Type: Grant
    Filed: December 13, 2013
    Date of Patent: May 1, 2018
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toyoji Oshima, Shu Yoshida, Takeru Horino, Rintaro Takahashi
  • Publication number: 20150337075
    Abstract: A resin composition for transparent substrates comprises an epoxy resin (A) and a curing agent (B), wherein the curing agent (B) comprises a cyclohexane tricarboxylic anhydride.
    Type: Application
    Filed: December 13, 2013
    Publication date: November 26, 2015
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Toyoji OSHIMA, Shu YOSHIDA, Takeru HORINO, Rintaro TAKAHASHI
  • Patent number: 9040647
    Abstract: Provided are: a method for controlling the decoloration reaction rate and color density of a fast light-modulating material to levels suitable for practical use; and a fast light-modulating material having a decoloration reaction rate and a color density which are suitable for practical use. A polymer obtained by polymerizing a paracyclophane-bridged hexaarylbisimidazole compound having a radical-polymerizable group, and a copolymer obtained by copolymerizing the compound with a (meth)acrylic acid compound or a sensitizer having a radical-polymerizable group can achieve controlled decoloration reaction rates, photosensitivity and color tones.
    Type: Grant
    Filed: November 30, 2010
    Date of Patent: May 26, 2015
    Assignees: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Jiro Abe, Atsuhiro Tokita, Takeru Horino, Toyoji Oshima, Atsushi Kimoto
  • Patent number: 8748629
    Abstract: The present invention is a photochromic material formed of a biimidazole compound represented by general formula (1-1): (where, R4 and R5 respectively and independently represent a halogen atom or alkyl group, R1 to R3 and R6 to R8 respectively and independently represent a hydrogen atom, halogen atom, alkyl group, fluoroalkyl group, hydroxyl group, alkoxyl group, amino group, alkylamino group, carbonyl group, alkylcarbonyl group, nitro group, cyano group or aryl group, Ar1 to Ar4 respectively and independently represent a substituted or unsubstituted aryl group, R4 may form a condensed, substituted or unsubstituted aryl ring with R3, and R5 may form a condensed, substituted or unsubstituted aryl ring with R6).
    Type: Grant
    Filed: July 8, 2011
    Date of Patent: June 10, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takeru Horino, Atsuhiro Tokita, Toyoji Oshima
  • Publication number: 20130102775
    Abstract: The present invention is a photochromic material formed of a biimidazole compound represented by general formula (1-1): (where, R4 and R5 respectively and independently represent a halogen atom or alkyl group, R1 to R3 and R6 to R8 respectively and independently represent a hydrogen atom, halogen atom, alkyl group, fluoroalkyl group, hydroxyl group, alkoxyl group, amino group, alkylamino group, carbonyl group, alkylcarbonyl group, nitro group, cyano group or aryl group, Ar1 to Ar4 respectively and independently represent a substituted or unsubstituted aryl group, R4 may form a condensed, substituted or unsubstituted aryl ring with R3, and R5 may form a condensed, substituted or unsubstituted aryl ring with R6).
    Type: Application
    Filed: July 8, 2011
    Publication date: April 25, 2013
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Takeru Horino, Atsuhiro Tokita, Toyoji Oshima
  • Publication number: 20120245317
    Abstract: Provided are: a method for controlling the decoloration reaction rate and color density of a fast light-modulating material to levels suitable for practical use; and a fast light-modulating material having a decoloration reaction rate and a color density which are suitable for practical use. A polymer obtained by polymerizing a paracyclophane-bridged hexaarylbisimidazole compound having a radical-polymerizable group, and a copolymer obtained by copolymerizing the compound with a (meth)acrylic acid compound or a sensitizer having a radical-polymerizable group can achieve controlled decoloration reaction rates, photosensitivity and color tones.
    Type: Application
    Filed: November 30, 2010
    Publication date: September 27, 2012
    Applicants: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Jiro Abe, Atsuhiro Tokita, Takeru Horino, Toyoji Oshima, Atsush Kimoto
  • Patent number: 4448844
    Abstract: A heat resistant resin produced by reacting (A) a polyamideimide resin with (B) an alcohol component and (C) an acid component with heating is soluble in a cresol type solvent and gives coatings excellent in heat resistance, thermal shock resistance, wear resistance, resistance to hydrolysis, etc., suitable for enamelled wire.
    Type: Grant
    Filed: July 28, 1983
    Date of Patent: May 15, 1984
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Yuichi Osada, Shozo Kasai, Yasunori Okada, Isao Uchigasaki, Toyoji Oshima, Yoshiyuki Mukoyama, Hiroshi Nishizawa
  • Patent number: 4431758
    Abstract: A heat resistant resin produced by reacting (A) a polyamideimide resin with (B) an alcohol component and (C) an acid component with heating is soluble in a cresol type solvent and gives coatings excellent in heat resistance, thermal shock resistance, wear resistance, resistance to hydrolysis, etc., suitable for enamelled wire.
    Type: Grant
    Filed: March 31, 1982
    Date of Patent: February 14, 1984
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Yuichi Osada, Shozo Kasai, Yasunori Okada, Isao Uchigasaki, Toyoji Oshima, Yoshiyuki Mukoyama, Hiroshi Nishizawa