Patents by Inventor Toyoki Kunitake

Toyoki Kunitake has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11547968
    Abstract: The present invention provides: a gas separation method which is capable of desirably separating a slight amount of a component from a mixed gas under mild conditions such that the pressure difference between both sides of a gas separation membrane is 1 atmosphere or less; and a gas separation membrane which is suitable for use in this gas separation method. According to the present invention, in a gas separation method wherein a specific gas (A) in a mixed gas, which contains the specific gas (A) at a concentration of 1,000 ppm by mass or less, is selectively permeated with use of a gas separation membrane, an extremely thin gas separation membrane that has a film thickness of 1 ?m or less is used, so that the gas (A) is desirably separated under mild conditions such that the pressure difference between both sides of the gas separation membrane is 1 atmosphere or less.
    Type: Grant
    Filed: August 3, 2018
    Date of Patent: January 10, 2023
    Assignees: TOKYO OHKA KOGYO CO., LTD., NANOMEMBRANE TECHNOLOGIES, INC.
    Inventors: Takuya Noguchi, Takahiro Senzaki, Toshiyuki Ogata, Toyoki Kunitake, Shigenori Fujikawa, Miho Ariyoshi
  • Publication number: 20150375176
    Abstract: A membrane filter including a thin film having a nanometer order thickness as a base, which is easy to increase in size, and which has sufficient strength. The membrane filter is formed by laminating a thin film having a thickness of 1 to 1,000 nm with a support film which is a porous film having a thickness of 1 to 1,000 ?m, which is made of a photosensitive composition or a cured product of the photosensitive composition, and has a plurality of hole portions penetrating in the thickness direction.
    Type: Application
    Filed: June 24, 2015
    Publication date: December 31, 2015
    Inventors: Takuya Noguchi, Toshiyuki Ogata, Toyoki Kunitake, Shigenori Fujikawa
  • Patent number: 8470496
    Abstract: A novel ion conductive material is provided. The ion conductive material composed of an amorphous material is employed.
    Type: Grant
    Filed: February 20, 2007
    Date of Patent: June 25, 2013
    Assignee: Riken
    Inventors: Toyoki Kunitake, Yoshitaka Aoki, Emi Muto
  • Patent number: 8398754
    Abstract: A proton conducting membrane comprising, as a main component, a ceramic structure in which an oxygen atom of a metal oxide is bonded through the oxygen atom with at least one group derived an oxygen acid selected from —B(O)3—, —S(?O)2(O)2—, —P(?O)(O)3—, —C(?O)(O)2—, and —N(O)3—, wherein the metal oxide and said at least one group derived from the oxygen acid share the oxygen atom, the proton conducting membrane being made by a sol-gel reaction of the oxygen acid or its precursor and a precursor of the metal oxide in order to obtain a sol-gel reaction product, followed by heating of the sol-gel reaction product at a temperature in a range of 100° C. to 600° C., the oxygen acid or its precursor being selected from a boric acid, a sulfuric acid, a phosphoric acid, a carbonic acid, a nitric acid, and precursors thereof. Thus, a novel proton conducting membrane is provided.
    Type: Grant
    Filed: September 25, 2008
    Date of Patent: March 19, 2013
    Assignee: Riken
    Inventors: Toyoki Kunitake, Yuanzhi Li, Yoshitaka Aoki, Emi Muto
  • Patent number: 8101013
    Abstract: A film-forming material that is capable of forming, at a low temperature, a film having a high degree of etching resistance and a high etching selectivity ratio relative to an organic film, as well as a method of forming a pattern that uses the film-forming material. The film-forming material includes a metal compound (W) capable of generating a hydroxyl group upon hydrolysis, and a solvent (S) in which the metal compound is dissolved, wherein the solvent (S) includes a solvent (S1) with a boiling point of at least 155° C. that contains no functional groups that react with the metal compound (W). The method of forming a pattern includes the steps of: coating a pattern, which has been formed on top of an organic film of a laminate that includes a substrate and the organic film, using the above film-forming material, and then conducting etching of the organic film using the pattern as a mask.
    Type: Grant
    Filed: August 24, 2006
    Date of Patent: January 24, 2012
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Shogo MatsuMaru, Hideo Hada, Shingenori Fujikawa, Toyoki Kunitake
  • Patent number: 8025923
    Abstract: A method of manufacturing a structure, including forming a composite film composed of a coating film and an organic or inorganic film on top of a substrate by forming the coating film on the surface of a template provided on top of the substrate; forming the organic or inorganic film on the surface of the coating film, and removing a portion of the organic or inorganic film and a portion of the coating film; forming a second coating film on the surface of the composite film; forming an organic coating film on the substrate that covers the second coating film; removing a portion of the second coating film; and forming a structure composed of a metal or metal oxide later on the substrate by removing all residues left on the substrate except for the coating film and the second coating film.
    Type: Grant
    Filed: September 2, 2008
    Date of Patent: September 27, 2011
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Shigenori Fujikawa, Toyoki Kunitake, Hiromi Takaemoto, Mari Koizumi, Hideo Hada, Sanae Furuya
  • Patent number: 7993706
    Abstract: A method of forming a nano-structure can form a fine pattern easily, and the nano-structure obtained by the method is provided. A method of forming a nano-structure comprising forming a thin film by a liquid phase adsorption on surface of a template formed on a substrate, and removing a portion of the thin film, and removing the template is used.
    Type: Grant
    Filed: June 8, 2005
    Date of Patent: August 9, 2011
    Assignee: Riken
    Inventors: Shigenori Fujikawa, Toyoki Kunitake, Hideo Hada, Toshiyuki Ogata
  • Patent number: 7932013
    Abstract: There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask. The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.
    Type: Grant
    Filed: June 16, 2006
    Date of Patent: April 26, 2011
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Shogo Matsumaru, Toshiyuki Ogata, Kiyoshi Ishikawa, Hideo Hada, Shigenori Fujikawa, Toyoki Kunitake
  • Publication number: 20100330353
    Abstract: An organic-inorganic hybrid thin film including: an organic compound (A) having at least one functional group and; an inorganic compound (B) having a metal atom, as a core, to which each of at least one functional group and at least one hydrolysable group is bound directly or via a connecting group, the organic-inorganic hybrid thin film being structured such that a covalent bond is formed between the functional group in the organic compound (A) and the functional group in the inorganic compound (B), and a metal oxide is formed from the inorganic compound (B) through a hydrolytic reaction on the hydrolysable group in the inorganic compound (B).
    Type: Application
    Filed: June 23, 2008
    Publication date: December 30, 2010
    Inventors: Toyoki Kunitake, Hiroomi Watanabe
  • Publication number: 20100284880
    Abstract: A proton conducting membrane comprising, as a main component, a ceramic structure in which an oxygen atom of a metal oxide is bonded through the oxygen atom with at least one group derived an oxygen acid selected from —B(O)3—, —S(?O)2(O)2—, —P(?O)(O)3—, —C(?O)(O)2—, and —N(O)3—, wherein the metal oxide and said at least one group derived from the oxygen acid share the oxygen atom, the proton conducting membrane being made by a sol-gel reaction of the oxygen acid or its precursor and a precursor of the metal oxide in order to obtain a sol-gel reaction product, followed by heating of the sol-gel reaction product at a temperature in a range of 100° C. to 600° C., the oxygen acid or its precursor being selected from a boric acid, a sulfuric acid, a phosphoric acid, a carbonic acid, a nitric acid, and precursors thereof. Thus, a novel proton conducting membrane is provided.
    Type: Application
    Filed: September 25, 2008
    Publication date: November 11, 2010
    Applicant: RIKEN
    Inventors: Toyoki Kunitake, Yuanzhi Li, Yoshitaka Aoki, Emi Muto
  • Patent number: 7781028
    Abstract: Amorphous metal oxide thin film is produced by removing through oxygen plasma treatment the organic component from an organics/metal oxide composite thin film having thoroughly dispersed therein such organic component at molecular scale. This ensures production of amorphous metal oxide thin film with low density and excellent thickness precision.
    Type: Grant
    Filed: July 19, 2007
    Date of Patent: August 24, 2010
    Assignee: Riken
    Inventors: Toyoki Kunitake, Izumi Ichinose, Shigenori Fujikawa, Jianguo Huang
  • Patent number: 7723430
    Abstract: Provided is a thin film having self-supporting properties and having excellent strength, durability and flexibility and a method for manufacturing the thin film. A thin film having an interpenetrating net-work layer and having a film thickness of 500 nm or less, the interpenetrating net-work layer being constituted of at least a metal oxide and an organic polymer.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: May 25, 2010
    Assignee: Riken
    Inventors: Toyoki Kunitake, Richard Vendamme
  • Patent number: 7708800
    Abstract: There is disclosed a method for producing a supported metal nanoparticle, which has the steps of adsorbing a metal ion-containing compound to a support of an organic material and reducing the adsorbed metal ion to form a metal nanoparticle on the support. In the producing method, by using a various organic material as a matrix, the metal nanoparticle can be easily formed in situ with excellent accuracy from the metal ion-containing compound.
    Type: Grant
    Filed: May 28, 2004
    Date of Patent: May 4, 2010
    Assignee: Riken
    Inventors: Junhui He, Toyoki Kunitake
  • Patent number: 7704549
    Abstract: Exchangeable metal ions are removed from an amorphous composite metal oxide and different metal ions are introduced to manufacture a nanomaterial of composite metal oxide. Based on this method, it is possible to reliably form composite metal oxide nanomaterials over a wide range of compositions.
    Type: Grant
    Filed: December 26, 2006
    Date of Patent: April 27, 2010
    Assignee: Riken
    Inventors: Toyoki Kunitake, Izumi Ichinose, Rie Takaki, Junhui He
  • Publication number: 20100075193
    Abstract: A proton conductive membrane having high proton conductivity is provided. A proton conductive membrane comprising a metal oxide structure having an orderly or random porous structure and, as contained by the porous structure, a proton acid salt having at least one hydrogen atom capable of being loosed as a proton.
    Type: Application
    Filed: June 7, 2006
    Publication date: March 25, 2010
    Applicant: RIKEN
    Inventors: Toyoki Kunitake, Haibin Li
  • Publication number: 20090286936
    Abstract: Disclosed is a composition for formation of a mold, which is used in a method for producing a nanostructure by removing a portion of a thin film formed on the surface of a mold, and removing the mold, the composition including an organic compound, which has a hydrophilic group and has a molecular weight of 500 or more.
    Type: Application
    Filed: April 20, 2006
    Publication date: November 19, 2009
    Applicants: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Toshiyuki Ogata, Hideo Hada, Shigenori Fujikawa, Toyoki Kunitake
  • Patent number: 7592039
    Abstract: There are provided a method capable of mass-producing a nanotube material easily with low costs, and a nanotube material. The method of the present invention for producing a nanotube material has at least forming a metal oxide thin film or an organic/metal oxide composite thin film on an inner wall of a porous substrate and removing the porous substrate. The nanotube material of the invention has a structure provided from a body comprising a metal oxide thin film or an organic/metal oxide composite thin film formed on an inner wall of the porous substrate, from which a portion corresponding to the porous substrate is removed.
    Type: Grant
    Filed: March 17, 2004
    Date of Patent: September 22, 2009
    Assignee: Riken
    Inventors: Jian-guo Huang, Toyoki Kunitake
  • Patent number: 7572400
    Abstract: A production method for a nanomaterial comprising the steps of: forming a template on a solid substrate using a metal oxide nanomaterial forming composition including an organic compound with a phenolic hydroxyl group and a molecular weight of at least 500, forming a metal oxide layer on the template, and removing the template to generate a metal oxide nanostructure.
    Type: Grant
    Filed: May 6, 2004
    Date of Patent: August 11, 2009
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Shigenori Fujikawa, Toyoki Kunitake
  • Publication number: 20090134119
    Abstract: A film-forming material that is capable of forming, at a low temperature, a film having a high degree of etching resistance and a high etching selectivity ratio relative to an organic film, as well as a method of forming a pattern that uses the film-forming material. The film-forming material includes a metal compound (W) capable of generating a hydroxyl group upon hydrolysis, and a solvent (S) in which the metal compound is dissolved, wherein the solvent (S) includes a solvent (S1) with a boiling point of at least 155° C. that contains no functional groups that react with the metal compound (W). The method of forming a pattern includes the steps of: coating a pattern, which has been formed on top of an organic film of a laminate that includes a substrate and the organic film, using the above film-forming material, and then conducting etching of the organic film using the pattern as a mask.
    Type: Application
    Filed: August 24, 2006
    Publication date: May 28, 2009
    Applicants: TOKYO OHKA KOGYO CO., LTD., RIKEN
    Inventors: Shogo Matsumaru, Hideo Hada, Fujikawa Shigenori, Toyoki Kunitake
  • Publication number: 20090098353
    Abstract: Provided is a thin film having self-supporting properties and having excellent strength, durability and flexibility and a method for manufacturing the thin film. A thin film having an interpenetrating net-work layer and having a film thickness of 500 nm or less, the interpenetrating net-work layer being constituted of at least a metal oxide and an organic polymer.
    Type: Application
    Filed: December 13, 2006
    Publication date: April 16, 2009
    Inventors: Toyoki Kunitake, Richard Vendamme