Abstract: There are provided a pattern exposure method, a conductive film producing method, and a conductive film, wherein a photosensitive material is subjected to a proximity exposure through a photomask disposed with a proximity gap of 70 to 200 ?m, and thereby is exposed in the mask pattern periodically in the conveying direction to obtain a conductive film. The conductive film has a plurality of conductive portions of first and second conductive thin metal wires and a plurality of opening portions. A side of each thin metal wire has a protrusion extending toward the opening portion from a virtual line representing a designed width of the thin metal wire, and the protruding amount of the protrusion is 1/25 to ? of the designed width.

Abstract: A conductive film producing method according to the present invention contains a conductive metal portion forming step of forming a conductive metal portion containing a conductive substance and a binder on a support, and a vapor contact step of bringing the conductive metal portion into contact with a superheated vapor. This method may further contain a smoothing treatment step of smoothing the conductive metal portion, such that the smoothed conductive metal portion is brought into contact with the superheated vapor in the vapor contact step.

Abstract: There are provided a pattern exposure method, a conductive film producing method, and a conductive film, wherein a photosensitive material is subjected to a proximity exposure through a photomask disposed with a proximity gap of 70 to 200 ?m, and thereby is exposed in the mask pattern periodically in the conveying direction to obtain a conductive film. The conductive film has a plurality of conductive portions of first and second conductive thin metal wires and a plurality of opening portions. A side of each thin metal wire has a protrusion extending toward the opening portion from a virtual line representing a designed width of the thin metal wire, and the protruding amount of the protrusion is 1/25 to 1/6 of the designed width.

Abstract: A conductive film producing method according to the present invention contains a conductive metal portion forming step of forming a conductive metal portion containing a conductive substance and a binder on a support, and a vapor contact step of bringing the conductive metal portion into contact with a superheated vapor. This method may further contain a smoothing treatment step of smoothing the conductive metal portion, such that the smoothed conductive metal portion is brought into contact with the superheated vapor in the vapor contact step.

Abstract: An in-liquid turn bar disposed in a developing tank is set to discharge developer from plural slit-shaped discharge openings of a first cylindrical member such that a discharge rate of the developer per 1 m of the photosensitive material turning member is from 50 to 200 l/min (litter/minute). Regulating plates protruding from a surface of the first cylindrical member are provided at both transverse ends of the first cylindrical member. The amount of the developer discharged from both transverse ends of a photosensitive web is controlled by the regulating plates, thereby adjusting a gap between the first cylindrical member and the photosensitive web. Accordingly, the gap between the photosensitive web and the in-liquid turn bar is substantially uniform in a transverse direction, and thus the photosensitive web is turned without contact with the in-liquid turn bar.

Abstract: There are provided a pattern exposure method, a conductive film producing method, and a conductive film, wherein a photosensitive material is subjected to a proximity exposure through a photomask disposed with a proximity gap of 70 to 200 ?m, and thereby is exposed in the mask pattern periodically in the conveying direction to obtain a conductive film. The conductive film has a plurality of conductive portions of first and second conductive thin metal wires and a plurality of opening portions. A side of each thin metal wire has a protrusion extending toward the opening portion from a virtual line representing a designed width of the thin metal wire, and the protruding amount of the protrusion is 1/25 to 1/6 of the designed width.

Abstract: An in-liquid turn bar disposed in a developing tank includes a first cylindrical member disposed outside and a second cylindrical member disposed inside. In the first cylindrical member, plural slit-shaped discharge openings for discharging the developer along a longitudinal direction are formed. In the second cylindrical member, plural nozzle holes for ejecting the developer are formed. A pipe-shaped introduction portion for introducing the developer is provided at one end of the second cylindrical member, and the plural nozzle holes are formed gradually larger as they go from the other longitudinal end to the one end. Regulating plates for regulating the amount of the developer discharged from both transverse ends of the photosensitive web are provided at both transverse ends of the first cylindrical member.

Abstract: An in-liquid turn bar disposed in a developing tank includes a first cylindrical member disposed outside and a second cylindrical member disposed inside. In the first cylindrical member, plural slit-shaped discharge openings for discharging the developer along a longitudinal direction are formed. In the second cylindrical member, plural nozzle holes for ejecting the developer are formed. A pipe-shaped introduction portion for introducing the developer is provided at one end of the second cylindrical member, and the plural nozzle holes are formed gradually larger as they go from the other longitudinal end to the one end. Regulating plates for regulating the amount of the developer discharged from both transverse ends of the photosensitive web are provided at both transverse ends of the first cylindrical member.

Abstract: An in-liquid turn bar disposed in a developing tank is set to discharge developer from plural slit-shaped discharge openings of a first cylindrical member such that a discharge rate of the developer per 1 m of the photosensitive material turning member is from 50 to 200 l/min (litter/minute). Regulating plates protruding from a surface of the first cylindrical member are provided at both transverse ends of the first cylindrical member. The amount of the developer discharged from both transverse ends of a photosensitive web is controlled by the regulating plates, thereby adjusting a gap between the first cylindrical member and the photosensitive web. Accordingly, the gap between the photosensitive web and the in-liquid turn bar is substantially uniform in a transverse direction, and thus the photosensitive web is turned without contact with the in-liquid turn bar.