Patents by Inventor Toyoshi Shimada

Toyoshi Shimada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10611714
    Abstract: In a production method of the present disclosure, a 1,1?-binaphthyl precursor derivative, an organic acid, and an iodinating or brominating agent are mixed. The 1,1?-binaphthyl precursor derivative has a 1,1?-binaphthyl skeleton and has an electron-donating group at the 2-position of the 1,1?-binaphthyl skeleton and at the 2?-position of the 1,1?-binaphthyl skeleton, and the electron-donating group contains an oxygen atom directly bonded to the skeleton. With the production method of the present disclosure, a 1,1?-binaphthyl derivative having a substituent introduced at the 8-position and/or 8?-position of the 1,1?-binaphthyl skeleton can be obtained. The 1,1?-binaphthyl derivative obtained by the production method of the present disclosure can be a compound further having a substituent introduced at at least one position selected from the 4-position, 4?-position, 5-position, 5?-position, 6-position, and 6?-position of the 1,1?-binaphthyl skeleton.
    Type: Grant
    Filed: February 3, 2017
    Date of Patent: April 7, 2020
    Assignee: KYOTO UNIVERSITY
    Inventors: Toyoshi Shimada, Kazuki Nakanishi
  • Patent number: 10227493
    Abstract: The method for producing a surface-modified base material according to the present invention includes a step of bringing a base material having a polar group present on a surface thereof into contact with a hydrosilane compound having a molecular structure A and having a Si—H group composed of a silicon atom of the molecular structure A and a hydrogen atom bonded to the silicon atom in the presence of a borane catalyst so as to allow a dehydrocondensation reaction to take place between the base material and the compound, thereby forming the base material surface-modified with the molecular structure A. This production method is capable of surface-modifying a base material at a lower temperature in a shorter time than conventional methods and allows a wide variety of options for the form, type, and application of the base material, the mode of the modification reaction, and the type of the molecular structure with which the base material is surface-modified.
    Type: Grant
    Filed: March 9, 2015
    Date of Patent: March 12, 2019
    Assignee: KYOTO UNIVERSITY
    Inventors: Kazuki Nakanishi, Nirmalya Moitra, Kazuyoshi Kanamori, Toyoshi Shimada
  • Publication number: 20190062246
    Abstract: In a production method of the present disclosure, a 1,1?-binaphthyl precursor derivative, an organic acid, and an iodinating or brominating agent are mixed. The 1,1?-binaphthyl precursor derivative has a 1,1?-binaphthyl skeleton and has an electron-donating group at the 2-position of the 1,1?-binaphthyl skeleton and at the 2?-position of the 1,1?-binaphthyl skeleton, and the electron-donating group contains an oxygen atom directly bonded to the skeleton. With the production method of the present disclosure, a 1,1?-binaphthyl derivative having a substituent introduced at the 8-position and/or 8?-position of the 1,1?-binaphthyl skeleton can be obtained. The 1,1?-binaphthyl derivative obtained by the production method of the present disclosure can be a compound further having a substituent introduced at at least one position selected from the 4-position, 4?-position, 5-position, 5?-position, 6-position, and 6?-position of the 1,1?-binaphthyl skeleton.
    Type: Application
    Filed: February 3, 2017
    Publication date: February 28, 2019
    Inventors: Toyoshi SHIMADA, Kazuki NAKANISHI
  • Publication number: 20170312657
    Abstract: There is provided a defoaming agent having excellent defoaming persistence. The defoaming agent includes; hydrophobic silica having a hydrophobicity (MX) of 50 to 85, and a rate of change (MY/MX) of a hydrophobicity (MY) after immersion for 1 hour in a methanol/ion-exchange aqueous solution (volume ratio of 80/20) of sodium hydroxide with a pH of 13 at 25° C. to the hydrophobicity (MX) of 0.8 to 1.0; and at least one kind of liquid selected from the group consisting of a hydrocarbon oil, a non-reactive silicone oil and a polyoxyalkylene compound.
    Type: Application
    Filed: November 19, 2015
    Publication date: November 2, 2017
    Applicants: SAN NOPCO LTD., KYOTO UNIVERSITY
    Inventors: Katsuomi Shimabayashi, Hidetaka Hario, Toyoshi Shimada, Kazuki Nakanishi
  • Publication number: 20170022223
    Abstract: The method for producing a surface-modified base material according to the present invention includes a step of bringing a base material having a polar group present on a surface thereof into contact with a hydrosilane compound having a molecular structure A and having a Si—H group composed of a silicon atom of the molecular structure A and a hydrogen atom bonded to the silicon atom in the presence of a borane catalyst so as to allow a dehydrocondensation reaction to take place between the base material and the compound, thereby forming the base material surface-modified with the molecular structure A. This production method is capable of surface-modifying a base material at a lower temperature in a shorter time than conventional methods and allows a wide variety of options for the form, type, and application of the base material, the mode of the modification reaction, and the type of the molecular structure with which the base material is surface-modified.
    Type: Application
    Filed: March 9, 2015
    Publication date: January 26, 2017
    Inventors: Kazuki NAKANISHI, Nirmalya MOITRA, Kazuyoshi KANAMORI, Toyoshi SHIMADA
  • Patent number: 9409929
    Abstract: A (meth)allylsilane compound chemically bonded to various alcohol derivatives including polyol derivatives such as saccharides, is raw material used to cause a substrate to express functionalities such as a defogging property and separation characteristics for column chromatography, can be easily prepared, is easily purified, and is stable and easy to handle, and a functional material in which those functionalities are expressed, while silyl group-containing groups are conveniently carried at a high density on the surface of the substrate, by using the (meth)allylsilane compound as a silane coupling agent for silane-coupling to the substrate. The (meth)allylsilane compound includes a (meth)allylsilyl group-containing alkyl group or a (meth)allylsilylalkyl group-containing aralkyl group that is bonded to an alcohol derivative.
    Type: Grant
    Filed: June 28, 2012
    Date of Patent: August 9, 2016
    Assignees: KYOEISHA CHEMICAL CO., LTD., DAICEL CORPORATION
    Inventor: Toyoshi Shimada
  • Patent number: 9228107
    Abstract: A (meth)allylsilane compound that a functional group of a (meth)allylsilyl group or a halogenosilyl group bonded to the (meth)allylsilyl group via a spacer group is bonded directly or through a divergent spacer group to a dehydrogenated residue of an amino group of an amino group-containing compound; a carbaminic acid ester group or an amide group derived from a dehydrogenated residue of the amino group; an aromatic compound; a polymerizable unsaturated groups; perfluoro group; a dehydrogenated residue of saccharide or a carbohydrate polyol (excluding when the divergent spacer group is an alkylene group, or an alkylene group and an arylene group); a dehydrogenated residue of an amino acid; a halogenosilyl group; or a substituted silyl group in which a halogen of the halogenosilyl group is substituted.
    Type: Grant
    Filed: June 28, 2012
    Date of Patent: January 5, 2016
    Assignees: KYOEISHA CHEMICAL CO., LTD., TOYOSHI SHIMADA
    Inventors: Toyoshi Shimada, Yoshinori Takamatsu
  • Patent number: 9006484
    Abstract: A polymer having bis(diphenylphosphino)binaphthyl groups that can be used as a catalyst for an addition reaction, especially an asymmetric 1,4-addition reaction, or a reduction reaction, especially an asymmetric reduction reaction, and that can be easily recovered and recycled. The polymer having the bis(diphenylphosphino)binaphthyl groups is one resulting from repetition of a racemic or optically active 2,2?-bis(diphenylphosphino)-1,1?-binaphthyl compound substituted at 5-position thereof with an unsaturated terminal of one (meth)acryloyl group of a compound having multiple (meth)acryloyl groups, that another 2,2?-bis(diphenylphosphino)-1,1?-binaphthyl compound of a next unit is substituted at 5?-position thereof with an unsaturated terminal of another (meth)acryloyl group of the compound having multiple (meth)acryloyl groups so as to have a molecular weight of 1500 to 10000. The reduction catalyst comprises this polymer and a transition metal.
    Type: Grant
    Filed: March 12, 2007
    Date of Patent: April 14, 2015
    Assignee: Kyoeisha Chemical Co., Ltd.
    Inventors: Toyoshi Shimada, Naomi Takenaka, Gakuto Goshima, Hiroyuki Hosoi
  • Publication number: 20140200311
    Abstract: A (meth)allylsilane compound that a functional group of a (meth)allylsilyl group or a halogenosilyl group bonded to the (meth)allylsilyl group via a spacer group is bonded directly or through a divergent spacer group to a dehydrogenated residue of an amino group of an amino group-containing compound; a carbaminic acid ester group or an amide group derived from a dehydrogenated residue of the amino group; an aromatic compound; a polymerizable unsaturated groups; perfluoro group; a dehydrogenated residue of saccharide or a carbohydrate polyol (excluding when the divergent spacer group is an alkylene group, or an alkylene group and an arylene group); a dehydrogenated residue of an amino acid; a halogenosilyl group; or a substituted silyl group in which a halogen of the halogenosilyl group is substituted.
    Type: Application
    Filed: June 28, 2012
    Publication date: July 17, 2014
    Applicant: KYOEISHA CHEMICAL CO., LTD.
    Inventors: Toyoshi Shimada, Yoshinori Takamatsu
  • Publication number: 20140142292
    Abstract: A (meth)allylsilane compound chemically bonded to various alcohol derivatives including polyol derivatives such as saccharides, is raw material used to cause a substrate to express functionalities such as a defogging property and separation characteristics for column chromatography, can be easily prepared, is easily purified, and is stable and easy to handle, and a functional material in which those functionalities are expressed, while silyl group-containing groups are conveniently carried at a high density on the surface of the substrate, by using the (meth)allylsilane compound as a silane coupling agent for silane-coupling to the substrate. The (meth)allylsilane compound includes a (meth)allylsilyl group-containing alkyl group or a (meth)allylsilylalkyl group-containing aralkyl group that is bonded to an alcohol derivative.
    Type: Application
    Filed: June 28, 2012
    Publication date: May 22, 2014
    Applicants: DAICEL CORPORATION, KYOEISHA CHEMICAL CO., LTD.
    Inventor: Toyoshi Shimada
  • Patent number: 8053588
    Abstract: Provided is an organosilane compound expressed by any one of the following general formulae (1) to (7): (wherein: Ar represents a phenylene group or the like; R1 represents a hydrogen atom or the like; R2 to R8 each represent a methyl group or the like; n represents an integer in a range from 0 to 2; m represents an integer of 1 or 2; L represents a single bond or the like; X represents a hydrogen atom or the like; and Y represents a hydrogen atom or the like).
    Type: Grant
    Filed: March 4, 2008
    Date of Patent: November 8, 2011
    Assignees: Kabushiki Kaisha Toyota Chuo Kenkyusho, Toyoshi Shimada
    Inventors: Norihiro Mizoshita, Yasutomo Goto, Shinji Inagaki, Toyoshi Shimada
  • Publication number: 20100022800
    Abstract: A polymer having bis(diphenylphosphino)binaphthyl groups that can be used as a catalyst for an addition reaction, especially an asymmetric 1,4-addition reaction, or a reduction reaction, especially an asymmetric reduction reaction, and that can be easily recovered and recycled. The polymer having the bis(diphenylphosphino)binaphthyl groups is one resulting from repetition of a racemic or optically active 2,2?-bis(diphenylphosphino)-1,1?-binaphthyl compound substituted at 5-position thereof with an unsaturated terminal of one (meth)acryloyl group of a compound having multiple (meth)acryloyl groups, that another 2,2?-bis(diphenylphosphino)-1,1?-binaphthyl compound of a next unit is substituted at 5?-position thereof with an unsaturated terminal of another (meth)acryloyl group of the compound having multiple (meth)acryloyl groups so as to have a molecular weight of 1500 to 10000. The reduction catalyst comprises this polymer and a transition metal.
    Type: Application
    Filed: March 12, 2007
    Publication date: January 28, 2010
    Applicant: KYOEISHA CHEMICAL CO., LTD.
    Inventors: Toyoshi Shimada, Naomi Takenaka, Gakuto Goshima, Hiroyuki Hosoi
  • Patent number: 7608673
    Abstract: Provided is an organosilane compound expressed by the following general formula (1): where: Ar represents a divalent aromatic organic group, such as a phenylene group; R1 represents a hydrogen atom or the like; R2 to R6, which may be the same or different from each other, each represent a hydrogen atom or the like; and X represents a reactive substituent, such as a halogen atom.
    Type: Grant
    Filed: March 4, 2008
    Date of Patent: October 27, 2009
    Assignees: Kabushiki Kaisha Toyota Chuo Kenkyusho, Toyoshi Shimada
    Inventors: Norihiro Mizoshita, Yasutomo Goto, Shinji Inagaki, Toyoshi Shimada
  • Publication number: 20090054649
    Abstract: Provided is a bridged organosilane, which has a large complex organic group, and which is useful in the synthesis of a mesoporous silica and a light-emitting material, and a production method of the bridged organosilane. The bridged organosilane is expressed by the following general formula (1): [in the formula (1), q represents an integer in a range from 2 to 4, X1— represents a substituent selected from the group consisting of substituents expressed by the following general formulae (2) to (5): (in the formulae (2) to (5), R1 represents alkyl group having 1 to 5 carbon atoms, R2 represents an allyl group, and n represents an integer in a range from 0 to 3, and m represents an integer in a range from 0 to 6), and A1 represents an organic group expressed by, for example, the following general formula (6): (in the formula (6), Y1< represents a substituent expressed by, for example, O?C<)].
    Type: Application
    Filed: September 21, 2006
    Publication date: February 26, 2009
    Applicants: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO, TOYOSHI SHIMADA
    Inventors: Toyoshi Shimada, Yasutomo Goto, Shinji Inagaki, Norihiro Mizoshita, Masamichi Ikai
  • Publication number: 20080227941
    Abstract: Provided is an organosilane compound expressed by the following general formula (1): where: Ar represents a divalent aromatic organic group, such as a phenylene group; R1 represents a hydrogen atom or the like; R2 to R6, which may be the same or different from each other, each represent a hydrogen atom or the like; and X represents a reactive substituent, such as a halogen atom.
    Type: Application
    Filed: March 4, 2008
    Publication date: September 18, 2008
    Applicants: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO, TOYOSHI SHIMADA
    Inventors: Norihiro Mizoshita, Yasutomo Goto, Shinji Inagaki, Toyoshi Shimada
  • Publication number: 20080227939
    Abstract: Provided is an organosilane compound expressed by any one of the following general formulae (1) to (7): (wherein: Ar represents a phenylene group or the like; R1 represents a hydrogen atom or the like; R2 to R8 each represent a methyl group or the like; n represents an integer in a range from 0 to 2; m represents an integer of 1 or 2; L represents a single bond or the like; X represents a hydrogen atom or the like; and Y represents a hydrogen atom or the like).
    Type: Application
    Filed: March 4, 2008
    Publication date: September 18, 2008
    Applicants: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO, TOYOSHI SHIMADA
    Inventors: Norihiro Mizoshita, Yasutomo Goto, Shinji Inagaki, Toyoshi Shimada