Patents by Inventor Tracy C. Hetrick

Tracy C. Hetrick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vacuum trap
    Patent number: 9847213
    Abstract: A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.
    Type: Grant
    Filed: May 28, 2015
    Date of Patent: December 19, 2017
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Joseph K. Comeau, David R. Crawford, Robert E. Desrosiers, Tracy C. Hetrick, Mousa H. Ishaq
  • VACUUM TRAP
    Publication number: 20150262795
    Abstract: A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.
    Type: Application
    Filed: May 28, 2015
    Publication date: September 17, 2015
    Inventors: Joseph K. Comeau, David R. Crawford, Robert E. Desrosiers, Tracy C. Hetrick, Mousa H. Ishaq
  • Vacuum trap
    Patent number: 9057388
    Abstract: A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.
    Type: Grant
    Filed: March 21, 2012
    Date of Patent: June 16, 2015
    Assignee: International Business Machines Corporation
    Inventors: Joseph K. Comeau, David Crawford, Robert E. Desrosiers, Tracy C. Hetrick, Mousa H. Ishaq
  • VACUUM TRAP
    Publication number: 20130248112
    Abstract: A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.
    Type: Application
    Filed: March 21, 2012
    Publication date: September 26, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Joseph K. Comeau, David Crawford, Robert E. Desrosiers, Tracy C. Hetrick, Mousa H. Ishaq