Abstract: A method of polishing selected ceramics and metals is provided wherein the selected ceramic or metal material is rubbed against a solid surface in the presence of a nonabrasive liquid medium which only attacks the selected ceramic or metal material under friction. Examples of materials for the tribochemical polishing process includes ceramics such as silicon, silicon nitride, silicon carbide, silicon oxide, titanium carbide and aluminum nitride and metals such as tungsten. Both ceramic and metal surfaces can be polished, as in a damascene structure of an integrated circuit.