Abstract: A method for arranging a substrate processing tool on a pedestal within a semiconductor fabrication room includes supporting a plurality of pedestal plates on a pedestal frame including a plurality of stanchions. The method further includes determining dimensions of the pedestal plates, determining locations of installation features of the pedestal plates in accordance with components of the substrate processing tool, machining the installation features in the pedestal plates based on the determined locations, marking at least one of the pedestal plates with at least one alignment feature, and installing the pedestal frame on a subfloor of the semiconductor fabrication room. The stanchions of the pedestal frame are positioned such that a weight distribution of the pedestal frame on the subfloor is different from a weight distribution of the substrate processing tool.

Abstract: An apparatus is provided. The apparatus comprises a processing chamber. A substrate support is within the processing chamber, wherein the substrate support is in thermal contact with a substrate. A cooling system cools the substrate support. The cooling system comprises a first refrigeration system. The first refrigeration system comprises a first refrigerant inlet for receiving the first refrigerant from a first refrigerant source outside of the refrigeration system, wherein the first refrigerant is at a first pressure, a first throttle, wherein the first throttle allows a controlled expansion of the first refrigerant, wherein the expansion of the first refrigerant cools the first refrigerant, a first heat transfer system, for absorbing heat and transferring heat to the cooled first refrigerant, and a first refrigerant return for directing the first refrigerant from the first refrigeration system at a second pressure away from the first refrigeration system.