Patents by Inventor Travis Sunderland

Travis Sunderland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230331923
    Abstract: A composition is disclosed, which comprises (A) an organohydrogensiloxane having cyclic siloxane moieties including silicon-bonded hydrogen atoms. The composition further comprises (B) a polyether compound having an aliphatically unsaturated group. Finally, the composition comprises (C) a hydrosilylation catalyst. A silicone polyether surfactant prepared by reacting components (A) and (B) in the presence of component (C) is also disclosed. In addition, an isocyanate-reactive component comprising a polyol and the silicone polyether surfactant is disclosed. A composition comprising the isocyanate-reactive component, an isocyanate component comprising a polyisocyanate, and a catalyst is further disclosed. Finally, a method of preparing an article comprising a polyurethane and/or polyisocyanurate foam, and an article formed from the composition and/or the method, are disclosed.
    Type: Application
    Filed: June 24, 2021
    Publication date: October 19, 2023
    Inventors: Fang ZHANG, Nanguo LIU, Scott BOELTER, Travis SUNDERLAND, Weston TULLOCH, Simon TOTH, Zhenbin NIU, Sachit GOYAL, Adebola OGUNNIYI, Yang CHENG
  • Publication number: 20230151157
    Abstract: A composition and method can be used in the preparation of various siloxanes. The composition and method employ a fluorinated triarylborane Lewis acid, a hydrocarbonoxy-functional organosilicon compound, and a silyl hydride. The fluorinated triarylborane Lewis acid catalyzes reaction of a hydrocarbonoxy moiety (from the organosilicon compound) and a silicon-bonded hydrogen atom (from the silyl hydride) to form a siloxane bond.
    Type: Application
    Filed: June 16, 2021
    Publication date: May 18, 2023
    Inventors: Marc-Andre Courtemanche, Anne-Catherine Bédard, Heather Spinney, David Wilson, Arjun Raghuraman, Sukrit Mukhopadhyay, Travis Sunderland
  • Publication number: 20230151156
    Abstract: A polyfunctional organohydrogensiloxane is prepared using a fluorinated triarylborane Lewis acid as catalyst. The polyfunctional organohydrogensiloxane may be formulated into release coating compositions. Alternatively, the polyfunctional organohydrogensiloxane may be further functionalized with a curable group to form a clustered functional organosiloxane. The clustered functional organosiloxane may be formulated into thermal radical cure adhesive compositions.
    Type: Application
    Filed: June 16, 2021
    Publication date: May 18, 2023
    Inventors: Marc-Andre Courtemanche, Anne-Catherine Bedard, Heather Spinney, David Wilson, Arjun Raghuraman, Sukrit Mukhopadhyay, Travis Sunderland
  • Publication number: 20220363837
    Abstract: A reaction composition contains (a) an allyl polyether having the following formula: CH2=CHCH2O-Aa-B where, (i) subscript a is 2 to 170; (ii) A is selected from: —CH2CH2O—; —CH2CH(CH3)O—; —CH(CH3)CH2O—, CH2CH(CH2CH3)O—; —CH(CH2CH3)CH2O, —CH2CF(CF3)O—, —CF(CF3)CF2O— and —CF2CF(CF3)O—; and (iii) B is selected from —H, —CH3, —CH2CH3, —CH2CH2CH3, —CH2CH2CH2CH3, —C(O)CH3, and —CF2CF2CF3; (b) A silyl hydride functional siloxanc comprising the following siloxane units [R2HSiO1/2]m[R2SiO2/2]d[R2SiO3/2]t[SiO4/2]q wherein d+t+q is one or more and wherein: (i) R is selected from hydrocarbyl groups liaing from one to 8 carbon atoms; (ii) subscript m is 2 or more; (iii) subscript d is zero to 20; (iv) subscript t is zero to 2; (v) subscript q is zero to 2; and (c) a platinum-based hydrosilylation catalyst; where there are at least 4 molar equivalents of silyl hydride functionalities relative to allyl functionalities in the reaction composition.
    Type: Application
    Filed: December 1, 2020
    Publication date: November 17, 2022
    Inventors: Travis Sunderland, Ryan Baumgartner, Thomas D. Bekemeier, Nanguo Liu, Eric Joffre, John Kennan, Lenin Petroff, Brian Deeth, Mike Ferritto, Alix Schmidt
  • Patent number: 11279847
    Abstract: A method of preparing a composition for forming a release coating is disclosed. The method comprises preparing a reaction product comprising a polyorganohydrogensiloxane compound having cyclic SiH-functional branching groups interconnected by linear polydiorganosiloxane segments (the “branched cyclic polyorganohydrogensiloxane compound”), by combining together (A) a hydroxyl terminated polydiorganosiloxane and (B) a cyclic polyorganohydrogensiloxane, in the presence of (C) a boron containing Lewis acid and a solvent. A release coating composition including the reaction product comprising the branched cyclic polyorganohydrogensiloxane is also disclosed. The reaction product may be combined with or prepared in the presence of a polyorganohydrogensiloxane diluent and stripped of solvent to prepare the composition as a blend of the branched cyclic polyorganohydrogensiloxane and the polyorganohydrogensiloxane diluent for use in solventless-curable compositions.
    Type: Grant
    Filed: December 2, 2020
    Date of Patent: March 22, 2022
    Assignee: DOW SILICONES CORPORATION
    Inventors: Zhenbin Niu, Nanguo Liu, Travis Sunderland, David Rich, Pierre Chevalier, Sze-Sze Ng, Alex Knott
  • Publication number: 20210403330
    Abstract: The present disclosure includes a composition for forming a silicon-containing film on a substrate, comprising: a silicon precursor and a nitrogen precursor. The silicon-containing film is an elemental silicon film, a silicon carbon film, a silicon nitrogen film, or a silicon oxygen film. The substrate is a semiconductor material. The silicon precursor comprises trichlorodisilane. The trichlorodisilane is 1,1,1-trichlorodisilane.
    Type: Application
    Filed: September 13, 2021
    Publication date: December 30, 2021
    Applicant: Jiangsu Nata Opto-Electronic Materials Co. Ltd.
    Inventors: Byung K. Hwang, Travis Sunderland, Xiaobing Zhou
  • Publication number: 20210371700
    Abstract: A method of preparing a composition for forming a release coating is disclosed. The method comprises preparing a reaction product comprising a polyorganohydrogensiloxane compound having cyclic SiH-functional branching groups interconnected by linear polydiorganosiloxane segments (the “branched cyclic polyorganohydrogensiloxane compound”), by combining together (A) a hydroxyl terminated polydiorganosiloxane and (B) a cyclic polyorganohydrogensiloxane, in the presence of (C) a boron containing Lewis acid and a solvent. A release coating composition including the reaction product comprising the branched cyclic polyorganohydrogensiloxane is also disclosed. The reaction product may be combined with or prepared in the presence of a polyorganohydrogensiloxane diluent and stripped of solvent to prepare the composition as a blend of the branched cyclic polyorganohydrogensiloxane and the polyorganohydrogensiloxane diluent for use in solventless-curable compositions.
    Type: Application
    Filed: December 2, 2020
    Publication date: December 2, 2021
    Inventors: Zhenbin NIU, Nanguo LIU, Travis SUNDERLAND, David RICH, Pierre CHEVALIER, Sze-Sze NG, Alex KNOTT
  • Patent number: 11142462
    Abstract: Disclosed is a Silicon Precursor Compound for deposition, the Silicon Precursor Compound comprising trichlorodisilane; a composition for film forming, the composition comprising the Silicon Precursor Compound and at least one of an inert gas, molecular hydrogen, a carbon precursor, nitrogen precursor, and oxygen precursor; a method of forming a silicon-containing film on a substrate using the Silicon Precursor Compound, and the silicon-containing film formed thereby.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: October 12, 2021
    Assignee: JIANGSU NATA OPTO-ELECTRONIC MATERIALS CO. LTD.
    Inventors: Byung K Hwang, Travis Sunderland, Xiaobing Zhou
  • Publication number: 20190218103
    Abstract: Disclosed is a Silicon Precursor Compound for deposition, the Silicon Precursor Compound comprising trichlorodisilane; a composition for film forming, the composition comprising the Silicon Precursor Compound and at least one of an inert gas, molecular hydrogen, a carbon precursor, nitrogen precursor, and oxygen precursor; a method of forming a silicon-containing film on a substrate using the Silicon Precursor Compound, and the silicon-containing film formed thereby.
    Type: Application
    Filed: September 21, 2017
    Publication date: July 18, 2019
    Inventors: Byung K Hwang, Travis Sunderland, Xiaobing Zhou