Patents by Inventor Travis W. Acra

Travis W. Acra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aqueous solution and process for removing substances from substrates
    Patent number: 10073352
    Abstract: The disclosure is directed solutions and processes to remove substances from substrates. In some cases, the substances can include photoresist on semiconductor wafers. The solution can include a quaternary ammonium hydroxide an amine, and optionally a corrosion inhibitor and/or a sugar alcohol. One or more sides of the substrate can be contacted with the solution to remove one or more substances from the substrate.
    Type: Grant
    Filed: April 12, 2016
    Date of Patent: September 11, 2018
    Assignee: VERSUM MATERIALS US, LLC
    Inventors: Richard Dalton Peters, Travis W. Acra, Kimberly Dona Pollard
  • AQUEOUS SOLUTION AND PROCESS FOR REMOVING SUBSTANCES FROM SUBSTRATES
    Publication number: 20170293228
    Abstract: The disclosure is directed solutions and processes to remove substances from substrates. In some cases, the substances can include photoresist on semiconductor wafers. The solution can include a quaternary ammonium hydroxide an amine, and optionally a corrosion inhibitor and/or a sugar alcohol. One or more sides of the substrate can be contacted with the solution to remove one or more substances from the substrate.
    Type: Application
    Filed: April 12, 2016
    Publication date: October 12, 2017
    Applicant: Dynaloy, LLC
    Inventors: Richard Dalton Peters, Travis W. Acra, Kimberly Dona Pollard
  • Aqueous solution and process for removing substances from substrates
    Patent number: 9291910
    Abstract: The disclosure is directed solutions and processes to remove substances from substrates. In some cases, the substances can include photoresist on semiconductor wafers. The solution can include hydrogen peroxide in an amount that is no greater than 15% by weight of the total weight of the solution. The solution can also include a quaternary ammonium hydroxide and water. Further, the solution can include an amine, a co-solvent, or both. One or more sides of the substrate can be contacted with the solution to remove one or more substances from the solution.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: March 22, 2016
    Assignee: Dynaloy, LLC
    Inventors: Richard Dalton Peters, Travis W. Acra, Yuanmei Cao, Nichelle Maria Gilbert, Michael Tod Phenis, Kimberly Dona Pollard, Joshua Cummins, Meng Guo, Donald James Pfettscher
  • AQUEOUS SOLUTION AND PROCESS FOR REMOVING SUBSTANCES FROM SUBSTRATES
    Publication number: 20150094249
    Abstract: The disclosure is directed solutions and processes to remove substances from substrates. In some cases, the substances can include photoresist on semiconductor wafers. The solution can include hydrogen peroxide in an amount that is no greater than 15% by weight of the total weight of the solution. The solution can also include a quaternary ammonium hydroxide and water. Further, the solution can include an amine, a co-solvent, or both. One or more sides of the substrate can be contacted with the solution to remove one or more substances from the solution.
    Type: Application
    Filed: September 27, 2013
    Publication date: April 2, 2015
    Applicant: Dynaloy, LLC
    Inventors: Richard Dalton Peters, Travis W. Acra, Yuanmei Cao, Nichelle Maria Gilbert, Michael Tod Phenis, Kimberly Dona Pollard, Joshua Cummins, Meng Guo, Donald James Pfettscher