Abstract: A method of manufacturing a semiconductor device is provided. The method includes forming a package leadframe including a die pad, a first ridge formed at a first outer edge of the die pad, a second ridge formed at a second outer edge of the die pad opposite of the first outer edge and separate from the first ridge, and a plurality of leads surrounding the die pad. A semiconductor die is attached to the die pad by way of a die attach material. The semiconductor die is located on the die pad between the first ridge and the second ridge. An encapsulant encapsulates the semiconductor die and at least a portion of the package leadframe.

Abstract: A semiconductor device substrate is provided. The substrate includes an embedded trace substrate (ETS) portion. The ETS portion includes a first conductive layer embedded in the ETS portion at a first major surface. A portion of the first conductive layer is patterned to form a signal line. A non-conductive layer is disposed between the first conductive layer and a second conductive layer second embedded in the ETS portion. A third conductive layer is formed over the first major surface of the ETS portion. The third conductive layer is configured to form a stripline with the signal line of the first conductive layer.

Abstract: A semiconductor device substrate is provided. The substrate includes an embedded trace substrate (ETS) portion. The ETS portion includes a first conductive layer embedded in the ETS portion at a first major surface. A portion of the first conductive layer is patterned to form a signal line. A non-conductive layer is disposed between the first conductive layer and a second conductive layer second embedded in the ETS portion. A third conductive layer is formed over the first major surface of the ETS portion. The third conductive layer is configured to form a stripline with the signal line of the first conductive layer.

Abstract: A semiconductor device substrate is provided. The substrate includes an embedded trace substrate (ETS) portion. The ETS portion includes a first conductive layer embedded in the ETS portion at a first major surface. A portion of the first conductive layer is patterned to form a signal line. A non-conductive layer is disposed between the first conductive layer and a second conductive layer second embedded in the ETS portion. A third conductive layer is formed over the first major surface of the ETS portion. The third conductive layer is configured to form a stripline with the signal line of the first conductive layer.

Abstract: Embodiments are provided herein for a substrate having one or more embedded traces and a method for fabricating one or more embedded traces. The method includes: forming a bump on a first major surface of a substrate, the bump having a height measured from the first major surface to a top surface of the bump; forming a trace comprising: a lower trace portion that directly contacts the first major surface, a sidewall trace portion that directly contacts at least one sidewall of the bump, and an upper trace portion that directly contacts the top surface of the bump; depositing a blanket dielectric layer over the trace; and etching away a top portion of the blanket dielectric layer to expose a top surface of the upper trace portion.

Abstract: Embodiments are provided herein for a substrate having one or more embedded traces and a method for fabricating one or more embedded traces. The method includes: forming a bump on a first major surface of a substrate, the bump having a height measured from the first major surface to a top surface of the bump; forming a trace comprising: a lower trace portion that directly contacts the first major surface, a sidewall trace portion that directly contacts at least one sidewall of the bump, and an upper trace portion that directly contacts the top surface of the bump; depositing a blanket dielectric layer over the trace; and etching away a top portion of the blanket dielectric layer to expose a top surface of the upper trace portion.

Abstract: Embodiments of a semiconductor packaged device and method of making thereof are provided, the device including a substrate; a first flip chip die mounted to a first major surface of the substrate; a second flip chip die mounted to the first major surface of the substrate, the second flip chip die laterally adjacent to the first flip chip die on the first major surface; and a wire bond formed between a first bond pad on the first flip chip die and a second bond pad on the second flip chip die.

Abstract: Embodiments of a microelectronic packaged device and methods of making are provided, where the microelectronic packaged device includes a system package comprising a first die and a second die, wherein the first die and the second die are laterally positioned to one another, and the first die and the second die are laterally separated from one another by mold compound; and a conductive trace formed between a first conductive surface on an exposed surface of the first die and a second conductive surface on an exposed surface of the second die, wherein the conductive trace is laser sintered directly on the first conductive surface, on a portion of the exposed surface of the first die, on a portion of a top surface of the mold compound, on a portion of the exposed surface of the second die, and on the second conductive surface.

Abstract: Embodiments of a semiconductor packaged device and method of making thereof are provided, the device including a substrate; a first flip chip die mounted to a first major surface of the substrate; a second flip chip die mounted to the first major surface of the substrate, the second flip chip die laterally adjacent to the first flip chip die on the first major surface; and a wire bond formed between a first bond pad on the first flip chip die and a second bond pad on the second flip chip die.

Abstract: A method for bonding a wire to a substrate includes forming a wire ball at a working tip of a capillary and contacting the wire ball to a substrate via the capillary. The method also includes driving a protrusion at the working tip of the capillary into contact with a region of the substrate surrounding the wire ball. A capillary for wire bonding includes a working face, an annular chamfer section, and a cylindrical bore offsetting the annular chamfer section from the working face. A capillary for wire bonding includes a capillary body comprising a working tip having a working face. The capillary body defines an axial passage extending from the working face along a longitudinal axis of the capillary. The axial passage includes a cylindrical bore extending internally from the working face, and a first annular chamfer having a major diameter defined by the cylindrical bore.

Abstract: A method for bonding a wire to a substrate includes forming a wire ball at a working tip of a capillary and contacting the wire ball to a substrate via the capillary. The method also includes driving a protrusion at the working tip of the capillary into contact with a region of the substrate surrounding the wire ball. A capillary for wire bonding includes a working face, an annular chamfer section, and a cylindrical bore offsetting the annular chamfer section from the working face. A capillary for wire bonding includes a capillary body comprising a working tip having a working face. The capillary body defines an axial passage extending from the working face along a longitudinal axis of the capillary. The axial passage includes a cylindrical bore extending internally from the working face, and a first annular chamfer having a major diameter defined by the cylindrical bore.

Abstract: A method of making a semiconductor device includes forming a wafer having a substrate and an interconnect structure over the substrate. The wafer also includes a plurality of die areas and a street located between a first die area of the plurality and a second die area of the plurality. A separation structure that includes metal is located in the interconnect structure. At least a portion of the separation structure is located in a saw kerf of the street. The separation structure is arranged to provide a predefined separation path for separating the first die area during a singulation process.

Abstract: Embodiments of the present invention relate generally to interconnect systems. One embodiment relates to an interconnect system having a first substrate, and a standoff that extends from said first substrate. The interconnect system further includes a cap, intended for subsequent reflow attachment, that covers a first end of the standoff and does not cover the sides of the standoff. The interconnect system further includes a nonwettable surface layer on the sides of the standoff such that the cap is prevented from substantially wetting the sides of the standoff when the cap is in a fluid state. The interconnect system may further include a second substrate attached to the cap where substantially all of the cap is located at the first end of the standoff. Another embodiment of the present inventions relates to a method of fabricating the interconnect system.