Abstract: A method of making a doped titanium oxide coating in a float glass manufacturing process and the coated glass article made thereby wherein the dopant is a niobium or tantalum compound. The doped titanium oxide coating preferably exhibits an electrical conductivity>1×10?3 S/cm.

Abstract: A method of making a doped titanium oxide coating in a float glass manufacturing process and the coated glass article made thereby wherein the dopant is a niobium or tantalum compound. The doped titanium oxide coating preferably exhibits an electrical conductivity>1×10?3 S/cm.

Abstract: A process for the production of an optoelectronic device, such as a photovoltaic cell or a light emitting diode is disclosed. The process comprises providing a substrate having a conductive coating on at least one surface, the conductive coating having an initial roughness and at least one or more spikes, and applying a functional component to the coated surface of the substrate. The surface of the substrate having the conductive coating has been subjected to a polishing step using at least one brush to reduce the height of the spikes inherent to the conductive coating and to give the conductive coating a final roughness. By reducing the spikes there is less potential for the optoelectronic device to suffer from electrical shunts which reduce the efficiency of the device.

Abstract: A process for the production of an optoelectronic device, such as a photovoltaic cell or a light emitting diode is disclosed. The process comprises providing a substrate having a conductive coating on at least one surface, the conductive coating having an initial roughness and at least one or more spikes, and applying a functional component to the coated surface of the substrate. The surface of the substrate having the conductive coating has been subjected to a polishing step using at least one brush to reduce the height of the spikes inherent to the conductive coating and to give the conductive coating a final roughness. By reducing the spikes there is less potential for the optoelectronic device to suffer from electrical shunts which reduce the efficiency of the device.

Abstract: Anti reflective silica coatings are deposited on the glass ribbon produced during a float glass or a rolled glass production process using a flame pyrolysis deposition process which is preferably a combustion chemical vapour deposition process. The temperature of the ribbon is greater than 200° C. The process may be carried out in the gap between the float bath or rollers and the annealing lehr. The durability of the coating may be increased by sintering. The equipment preferably comprises an extraction unit positioned adjacent to each burner head. In a further embodiment additional oxygen is introduced to the vapour deposition process in order produce a coating having a lower effective refractive index.

Abstract: Coated Glazing comprising a pane of glass having an innermost surface and an outermost surface, and a coating layer (e.g. a titania coating and an underlying fluorine-doped tin oxide coating) on the outermost surface of the pane. The glazing has an emissivity of 0.7 or less and its outermost coated surface is both hydrophilic and photoactive (after any necessary initial activation period) with a water droplet contact angle of 30° or less, the glazing thereby having the capability of reducing or preventing the tendency for condensation to form on its outermost surface and the facility for maintaining the water droplet contact angle at or below 30°. Also disclosed is a method of reducing or preventing the tendency for condensation to form on the outermost surface of a glazing.