Patents by Inventor Tsai Wei Tseng

Tsai Wei Tseng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11789435
    Abstract: Provided is a flow rate control device capable of diagnosing whether an abnormality has occurred while continuing to supply a predetermined flow rate. The flow rate control device calculates an inflow/outflow rate of a fluid into a volume on the basis of a downstream pressure that is the pressure in the volume; estimates a valve flow rate that is a flow rate of the fluid that flows out of the volume through the downstream valve on the basis of the resistance flow rate and the inflow/outflow flow rate; controls the downstream valve so that the difference between the set flow rate and the valve flow rate decreases; calculates a diagnostic parameter on the basis of the resistance flow rate or the inflow/outflow flow rate in a pressure change state in which the upstream side pressure increases or decreases; and diagnoses an abnormality based on the diagnostic parameter.
    Type: Grant
    Filed: April 1, 2019
    Date of Patent: October 17, 2023
    Assignee: HORIBA STEC, Co., Ltd.
    Inventors: Kotaro Takijiri, Kentaro Nagai, Tsai Wei Tseng
  • Publication number: 20210173388
    Abstract: Provided is a flow rate control device capable of diagnosing whether an abnormality has occurred while continuing to supply a predetermined flow rate. The flow rate control device calculates an inflow/outflow rate of a fluid into a volume on the basis of a downstream pressure that is the pressure in the volume; estimates a valve flow rate that is a flow rate of the fluid that flows out of the volume through the downstream valve on the basis of the resistance flow rate and the inflow/outflow flow rate; controls the downstream valve so that the difference between the set flow rate and the valve flow rate decreases; calculates a diagnostic parameter on the basis of the resistance flow rate or the inflow/outflow flow rate in a pressure change state in which the upstream side pressure increases or decreases; and diagnoses an abnormality based on the diagnostic parameter.
    Type: Application
    Filed: April 1, 2019
    Publication date: June 10, 2021
    Applicant: HORIBA STEC, Co., Ltd.
    Inventors: Kotaro TAKIJIRI, Kentaro NAGAI, Tsai Wei TSENG
  • Patent number: 10754361
    Abstract: In order to provide a flow rate control apparatus that estimates a flow rate actually flowing at a control point without a large amount of noise, there are provided a fluid resistor that is provided on a flow path, a downstream-side valve that is provided on a downstream side of the fluid resistor, a resistance flow rate measurement mechanism that measures a resistance flow rate that flows through the fluid resistor, and flows into a volumetric space located on the flow path between this fluid resistor and the downstream-side valve, a subject flow rate estimation part that estimates a valve flow rate based on the flow rate characteristics stored in the flow rate characteristics storage part, and a flow rate control unit that controls the downstream-side valve based on a set flow rate, and on the valve flow rate estimated by the subject flow rate estimation part.
    Type: Grant
    Filed: March 8, 2019
    Date of Patent: August 25, 2020
    Assignee: HORIBA STEC, Co., Ltd.
    Inventors: Koutaro Takijiri, Kentaro Nagai, Yuko Imasato, Tsai Wei Tseng, Kazuhiro Matsuura
  • Patent number: 10705546
    Abstract: In order to provide a flow rate control apparatus capable of reducing noise while reducing delay, the flow rate control apparatus includes: a fluid resistor provided in a flow path; a downstream valve provided downstream of the fluid resistor; and a downstream pressure sensor provided between the fluid resistor and the downstream valve. The apparatus calculates a resistor flow rate through the fluid resistor; the time change amount of the downstream pressure; on the basis of the resistor flow rate, the difference between the resistor flow rate and the time change amount of the downstream side pressure, and a weighting factor, calculates a weighted average to estimate a valve flow rate through the downstream valve; and, on the basis of the deviation between a set flow rate and the valve flow rate, controls the downstream side valve, in which the weighting factor is configured to be changeable.
    Type: Grant
    Filed: July 24, 2019
    Date of Patent: July 7, 2020
    Assignee: HORIBA STEC, Co., Ltd.
    Inventors: Tsai Wei Tseng, Tomohiro Yoshida, Kentaro Nagai
  • Publication number: 20200033896
    Abstract: In order to provide a flow rate control apparatus capable of reducing noise while reducing delay, the flow rate control apparatus includes: a fluid resistor provided in a flow path; a downstream valve provided downstream of the fluid resistor; and a downstream pressure sensor provided between the fluid resistor and the downstream valve. The apparatus calculates a resistor flow rate through the fluid resistor; the time change amount of the downstream pressure; on the basis of the resistor flow rate, the difference between the resistor flow rate and the time change amount of the downstream side pressure, and a weighting factor, calculates a weighted average to estimate a valve flow rate through the downstream valve; and, on the basis of the deviation between a set flow rate and the valve flow rate, controls the downstream side valve, in which the weighting factor is configured to be changeable.
    Type: Application
    Filed: July 24, 2019
    Publication date: January 30, 2020
    Inventors: Tsai Wei Tseng, Tomohiro Yoshida, Kentaro Nagai
  • Publication number: 20190278305
    Abstract: In order to provide a flow rate control apparatus that estimates a flow rate actually flowing at a control point without a large amount of noise, there are provided a fluid resistor that is provided on a flow path, a downstream-side valve that is provided on a downstream side of the fluid resistor, a resistance flow rate measurement mechanism that measures a resistance flow rate that flows through the fluid resistor, and flows into a volumetric space located on the flow path between this fluid resistor and the downstream-side valve, a subject flow rate estimation part that estimates a valve flow rate based on the flow rate characteristics stored in the flow rate characteristics storage part, and a flow rate control unit that controls the downstream-side valve based on a set flow rate, and on the valve flow rate estimated by the subject flow rate estimation part.
    Type: Application
    Filed: March 8, 2019
    Publication date: September 12, 2019
    Inventors: Koutaro Takijiri, Kentaro Nagai, Yuko Imasato, Tsai Wei Tseng, Kazuhiro Matsuura