Abstract: In a method for biosensor analysis, a sample is tested in multiple stages using a biosensor and a test chip thereof to enable easy and convenient handling of the biosensor and accurate analyte measurement with the biosensor. The test chip of the biosensor has specially designed biochemical reaction zone, in which immobilized enzymes and high-molecular bonding agent are applied, so that even a very small liquid sample may be quickly introduced into and absorbed at the biochemical reaction zone to biochemically react with the enzymes on the test chip. With the multi-stage testing method and electronic circuits of the biosensor for logic determination, the biosensor may have increased accuracy.

Abstract: An electronic pipette real-time responsive to manual operation includes a pressing unit, a signal generator, a controller, a power unit and a drawing/draining unit. The signal generator senses a displacement stroke of the pressing unit by user and generates a displacement signal to the controller. The controller performs calculation on the displacement signal to generate a control signal for sending to the power unit. The power unit drives the drawing/draining unit according to the control signal. The amount and speed of the drawing/draining can be shown on a display of the controller.

Abstract: A multifunctional portable medical measurement device and the display method thereof are proposed. The multifunctional portable medical measurement device has a first medical measurement unit, a second medical measurement unit, a key unit, a display unit, and a microprocessor. The microprocessor selects either a first measured value or a second measured value for output to the display unit according to the operation of the key unit. When the portable medical measurement device operates in the second measurement mode, a digital display for displaying only a numeral is used to display the second measured value of the second medical measurement unit. When the portable medical measurement device operates in the first measurement mode, a plurality of digital displays for displaying a numeral is combined to display the first measured value of the first medical measurement unit.

Abstract: A portable medical measurement device and method are used for biomedical measurements. The medical measurement device comprises a medical measurement unit for analyzing the reaction of a measured target, a signal receiving unit for receiving a measurement signal, a lookup table for storing reference signals and corresponding parameters, and a microprocessor. When making medical measurement, a measured value of the target is analyzed. Next, a measurement signal is received. The lookup table is then used to find out the corresponding parameter of the measurement signal. Finally, the reaction result of the measured value is calculated out by using the corresponding parameter.

Abstract: A method of detecting a crack in a body of a quartz window provides for having a source of a laser beam and a light receiver; applying a reflective coating onto an exterior surface of the quartz window; directing the laser beam from the source into the quartz window so that, in the course of successive reflections of the beam from an exterior surface of the quartz window, the beam undergoes a plurality of predetermined strokes within the body of the quartz window thus probing the body, making the conclusion of the absence of a crack in the body of the quartz window by receiving a reflected beam by the light receiver, which is installed so as to catch the beam having unobtrusively passed through the body of the quartz window, or arriving at the conclusion of the presence of a crack in the body of the quartz window if a reflected beam is not received by the light receiver.

Abstract: A method of detecting a crack in a body of a quartz window provides for having a source of a laser beam and a light receiver; applying a reflective coating onto an exterior surface of the quartz window; directing the laser beam from the source into the quartz window so that, in the course of successive reflections of the beam from an exterior surface of the quartz window, the beam undergoes a plurality of predetermined strokes within the body of the quartz window thus probing the body, making the conclusion of the absence of a crack in the body of the quartz window by receiving a reflected beam by the light receiver, which is installed so as to catch the beam having unobtrusively passed through the body of the quartz window, or arriving at the conclusion of the presence of a crack in the body of the quartz window if a reflected beam is not received by the light receiver.

Abstract: A method for detecting abnormal conditions in an etching chamber for semiconductors. A plasma intensity control standard or calibration curve is first obtained for the optimal etching of semiconductors in a particular application, in which the plasma intensity profile for optimal etching characteristics is plotted against elapsed etching time in seconds. Subsequent semiconductors are etched according to the optimum plasma intensity generated from the control or calibration curve to facilitate optimum integrated circuit quality, wafer throughput and processing efficiency.

Abstract: A method for detecting end-point in a plasma etching process by monitoring plasma impedance changes on a time scale is disclosed. In the method, a plasma etching process is first conducted in a process chamber, while changes in a parameter of plasma impedance in the chamber occurring during the etching process is recorded in a curve on a time scale. An end-point of the plasma etching process is then defined for the etching of a specific material layer at a point where the direction of a slope of the curve changes.

Abstract: A method for detecting end-point in a plasma etching process by monitoring plasma impedance changes on a time scale is disclosed. In the method, a plasma etching process is first conducted in a process chamber, while changes in a parameter of plasma impedance in the chamber occurring during the etching process is recorded in a curve on a time scale. An end-point of the plasma etching process is then defined for the etching of a specific material layer at a point where the direction of a slope of the curve changes.