Patents by Inventor Tse-An Yeh

Tse-An Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12078921
    Abstract: A phase-shift reticle for a photolithography process in semiconductor fabrication is provided. The reticle includes a substrate, a reflective structure, a pattern defining layer and a phase shifter. The reflective structure is disposed over the substrate. The pattern defining layer includes a first material and is deposited over the reflective structure. The pattern defining layer comprises a pattern trench. The phase shifter includes a second material and disposed in the pattern trench. A transmittance of the second material is different from a transmittance of the first material.
    Type: Grant
    Filed: November 18, 2021
    Date of Patent: September 3, 2024
    Assignee: ENTEGRIS, INC.
    Inventors: Tse-An Yeh, Jun-Fei Zheng, Montray Leavy, Chun Kuang Chen
  • Publication number: 20220350242
    Abstract: The present disclosure provides a module for creating a metal-containing film, including a reactor chamber; an inlet for providing an organo-metallic precursor to the reactor chamber; and an inlet for providing a reactive gaseous species to react with the organo-metallic precursor to form a metal-containing film. The reactive gaseous species includes an element having three to five valence electrons and one or more radicals selected from hydrogen, C1-C3 alkyl, and C1-C3 alkoxyl. The present disclosure further relates to a method of creating the metal-containing film and a semiconductor structure associated therewith.
    Type: Application
    Filed: April 22, 2022
    Publication date: November 3, 2022
    Inventors: Tse-An YEH, Montray LEAVY, Chun Kuang CHEN
  • Publication number: 20220163881
    Abstract: A phase-shift reticle for a photolithography process in semiconductor fabrication is provided. The reticle includes a substrate, a reflective structure, a pattern defining layer and a phase shifter. The reflective structure is disposed over the substrate. The pattern defining layer includes a first material and is deposited over the reflective structure. The pattern defining layer comprises a pattern trench. The phase shifter includes a second material and disposed in the pattern trench. A transmittance of the second material is different from a transmittance of the first material.
    Type: Application
    Filed: November 18, 2021
    Publication date: May 26, 2022
    Inventors: Tse-An Yeh, Jun-Fei Zheng, Montray Leavy, Chun Kuang Chen