Patents by Inventor Tse-Wei Chiu

Tse-Wei Chiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240128313
    Abstract: A method includes providing a substrate, forming a patterned hard mask layer over the substrate, etching the patterned hard mask layer to form a hole that penetrates the patterned hard mask layer, forming a barrier portion in the hole, removing the patterned hard mask layer, and forming a gate structure over the substrate. Formation of the gate structure includes forming a dielectric body portion on the substrate. The barrier portion that is thicker than the dielectric body portion adjoins one end of the dielectric body portion. The dielectric body portion and the barrier portion are collectively referred to as a gate dielectric layer. Formation of the gate structure further includes forming a gate electrode on the gate dielectric layer and forming gate spacers on opposite sidewalls of the gate electrode. During formation of the gate spacers, a portion of the barrier portion is removed to form a recessed corner.
    Type: Application
    Filed: October 17, 2022
    Publication date: April 18, 2024
    Applicant: Vanguard International Semiconductor Corporation
    Inventors: Tse-Hsiao LIU, Chih-Wei LIN, Po-Hao CHIU, Pi-Kuang CHUANG, Ching-Yi HSU
  • Patent number: 10582616
    Abstract: Disclosed are a uniformly emitting linear LED light source assembly and a method thereof. The linear LED light source assembly comprises a first light strip, at least one second light strip and at least one connecting board which are all provided with a plurality of LEDs closely arranged at equal intervals, wherein the equal interval is less than 3.5 mm to realize uniform illumination. The connecting board connects the first light strip and the second light strip. The LED closest to the first light strip on the connecting board and the LED closest to the connecting board on the first light strip are formed at the same pitch as the equal interval. In addition, the LED closest to the second light bar on the connecting board and the LED closest to the connecting board on the second light bar are formed at the same pitch as the equal interval.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: March 3, 2020
    Assignee: EXCELLENCE OPTOELECTRONICS INC.
    Inventors: Yen-Cheng Chen, Tse-Wei Chiu, Cheng-Tai Jao