Abstract: A method for forming an isolation structure includes following operations. A trench is formed in a semiconductor substrate. A first insulating layer covering a bottom and sidewalls of the trench is formed. A charge-trapping layer is formed on the first insulating layer. The trench is filled with a second insulating layer. The charge-trapping layer include a material different from those of the first insulating layer and the second insulating layer.

Abstract: A display with a rotatable camera structure has a display region and includes a bezel with a lens and a rear cover connected to the bezel, and the rear cover has an opening. The bezel is disposed around the display region. The rotatable camera structure is between the bezel and the rear cover. The rotatable camera structure includes a dome holder, a camera and a dome cover. The dome holder with an opening is configured on the bezel and covers the lens. The camera is in the dome holder. The dome cover covers the opening of the dome holder, and the dome cover is connected to the camera through the opening of the dome holder. The dome cover has an angle adjustment structure exposed from the opening of the rear cover to adjust the filming angle of the camera for users.

Abstract: A display with a rotatable camera structure has a display region and includes a bezel with a lens and a rear cover connected to the bezel, and the rear cover has an opening. The bezel is disposed around the display region. The rotatable camera structure is between the bezel and the rear cover. The rotatable camera structure includes a dome holder, a camera and a dome cover. The dome holder with an opening is configured on the bezel and covers the lens. The camera is in the dome holder. The dome cover covers the opening of the dome holder, and the dome cover is connected to the camera through the opening of the dome holder. The dome cover has an angle adjustment structure exposed from the opening of the rear cover to adjust the filming angle of the camera for users.