Abstract: A computer-implemented method and system for automating control of a furnace area within a semiconductor fabrication facility are provided. In one example, the method includes processing a current batch using process equipment, removing the current batch from the process equipment, and loading a next batch into the process equipment. The current batch may then be tested to determine if the current batch was properly processed. If the current batch fails the testing, the next batch may be removed from the process equipment and corrections may be made to the process equipment before reloading the next batch. If the current batch passes the testing, the next batch may be set as the new current batch and the new current batch may be processed.