Patents by Inventor Tseng-Yung Wang

Tseng-Yung Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photolithographic parameter feedback system and control method thereof
    Publication number: 20050154484
    Abstract: A photolithographic parameter feedback system is described. The photolithographic parameter feedback system includes a database containing substrate history information of a lot having at least one measurement data after exposure of a pre-layer of substrates of a predetermined lot and an exposure tool history information having at least one measurement data after exposure of a predetermined layer of substrates of a pre-lot, and an exposure tool exposing the substrates of the predetermined lot, wherein at least one exposure parameter thereof is updated by feedback of the substrate history information of the lot and the exposure tool history information.
    Type: Application
    Filed: September 27, 2004
    Publication date: July 14, 2005
    Applicant: ProMOS Technologies Inc.
    Inventors: Yung-Yao Lee, Tseng-Yung Wang