Patents by Inventor Tseng You Syau

Tseng You Syau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of retaining the integrity of a photoresist pattern
    Patent number: 6183940
    Abstract: A method of retaining the integrity of a photoresist pattern is provided where the patterned photoresist is treated prior to etching the principle layer. The pre-etch treatment encompasses a plasma treatment. In some embodiments employing an anti-reflective coating (ARC) layer, an isolation/protective layer is used to isolate the ARC from the photoresist. In some embodiments, the pre-etch treatment, advantageously provides for patterning the isolation/protection layer.
    Type: Grant
    Filed: March 17, 1998
    Date of Patent: February 6, 2001
    Assignee: Integrated Device Technology, Inc.
    Inventors: Chen-Yu Wang, Tseng You Syau, Ching-Kai Lin