Patents by Inventor Tsubasa WATANABE
Tsubasa WATANABE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240394237Abstract: Example implementations as described herein are directed to generate a fault tree with a design document and minimized rules or database. The fault tree generation system may utilize assembly data and ladder programs as input and generates a fault tree by connecting an upper part of the fault tree generated from an assembly tree structure in the assembly data and a lower part of a fault tree from control logic in the ladder program. The fault tree is generated by connecting the lower part of the tree of the fault tree from the logic.Type: ApplicationFiled: May 23, 2023Publication date: November 28, 2024Inventor: Tsubasa WATANABE
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Patent number: 11894249Abstract: A control device controls an operation of a processing apparatus for performing a processing in a processing container that accommodates a substrate. The control device includes: a temperature acquisition unit configured to acquire a temperature inside the processing container; a storage unit configured to store relationship information indicating a relationship between the temperature inside the processing container and an etching rate, and film thickness information including a cumulative film thickness of a deposited film inside the processing container; a rate calculator configured to calculate an etching rate of the deposited film based on the temperature acquired by the temperature acquisition unit and the relationship information stored in the storage unit; and a time calculator configured to calculate an etching time for removing the deposited film based on the etching rate calculated by the rate calculator and the film thickness information stored in the storage unit.Type: GrantFiled: September 24, 2020Date of Patent: February 6, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Masami Oikawa, Tsubasa Watanabe, Tomoya Hasegawa
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Publication number: 20230307265Abstract: According to one embodiment, a substrate processing apparatus includes a processing tank configured to store a chemical solution for processing a substrate by immersion in a chemical solution. The substrate is held by a holding member during the processing. A lid is configured to open and close an upper end portion of the processing tank. The lid has a first bubble dispensing pipe formed or integrated therein. The first bubble dispensing pipe is configured to dispense a gas into the processing tank. A bottom surface side of the lid on a processing tank side may come into direct contact with the chemical solution in some examples. The first bubble dispensing pipe may dispense an inert gas into the chemical solution to improve process stability or the like.Type: ApplicationFiled: August 29, 2022Publication date: September 28, 2023Inventors: Takaumi MORITA, Hiroshi FUJITA, Tatsuhiko KOIDE, Naomi YANAI, Tsubasa WATANABE
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Publication number: 20230280515Abstract: An optical apparatus includes an angle filter disposed on an optical path in the middle of focusing or in the middle of divergence by a focusing optical element. The angle filter includes a dielectric multilayer film in which dielectric layers having a first refractive index and dielectric layers having a second refractive index lower than the first refractive index are alternately stacked.Type: ApplicationFiled: June 16, 2021Publication date: September 7, 2023Applicant: HAMAMATSU PHOTONICS K.K.Inventors: Tsubasa WATANABE, Hiroto SAKAI, Yasushi OHBAYASHI
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Publication number: 20230258951Abstract: An optical apparatus includes an optical system for outputting parallel light, and an angle filter disposed on an optical path of the parallel light output from the optical system. The angle filter includes a dielectric multilayer film in which dielectric layers having a first refractive index n1 and dielectric layers having a second refractive index n2 lower than the first refractive index n1 are alternately stacked.Type: ApplicationFiled: June 16, 2021Publication date: August 17, 2023Applicant: HAMAMATSU PHOTONICS K.K.Inventors: Tsubasa WATANABE, Hiroto SAKAI, Yasushi OHBAYASHI
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Patent number: 11550172Abstract: A reflective spatial light modulator includes an electro-optic crystal having an input surface to which input light is input and a rear surface opposing the input surface, a light input/output unit being disposed on the input surface of the electro-optic crystal and having a first electrode through which the input light is transmitted, a light reflection unit including a substrate including a plurality of second electrodes and an adhesive layer for fixing the substrate to the rear surface and being disposed on the rear surface of the electro-optic crystal, and a drive circuit applying an electric field between the first electrode and the plurality of second electrodes.Type: GrantFiled: December 5, 2017Date of Patent: January 10, 2023Assignee: HAMAMATSU PHOTONICS K.K.Inventors: Kuniharu Takizawa, Hiroshi Tanaka, Haruyoshi Toyoda, Yasushi Ohbayashi, Hiroto Sakai, Tsubasa Watanabe
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Patent number: 11391970Abstract: A reflective spatial light modulator includes an electro-optic crystal having an input surface to which input light is input and a rear surface opposing the input surface, a light input/output unit being disposed on the input surface of the electro-optic crystal and having a first electrode through which the input light is transmitted, a light reflection unit including a substrate including a plurality of second electrodes and being disposed on the rear surface side of the electro-optic crystal, and a drive circuit applying an electric field between the first electrode and the plurality of second electrodes. The light input/output unit includes a first charge injection curbing layer formed on the input surface, and the light reflection unit includes a second charge injection curbing layer formed on the rear surface.Type: GrantFiled: December 5, 2017Date of Patent: July 19, 2022Assignee: HAMAMATSU PHOTONICS K.K.Inventors: Kuniharu Takizawa, Hiroshi Tanaka, Haruyoshi Toyoda, Yasushi Ohbayashi, Hiroto Sakai, Tsubasa Watanabe
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Patent number: 11143535Abstract: Provided is a thermal-type flowmeter which can prevent a reduction of flow rate accuracy and reliability, and an increase of cost of the thermal-type flowmeter compared to the related art, and can add a function of an electrostatic scattering mechanism. The thermal-type flowmeter of the present invention includes a sub-passage into which part of a measurement target gas flowing in a main passage is taken, a flow rate detection element of a flow measurement unit which is disposed in the sub-passage, a circuit package which supports the flow rate detection element, and a substrate to which the circuit package is fixed. The flow rate detection element includes a detection surface to detect a flow rate of the measurement target gas. The detection surface is disposed to face the circuit substrate.Type: GrantFiled: July 17, 2018Date of Patent: October 12, 2021Assignee: Hitachi Automotive Systems, Ltd.Inventors: Akira Uenodan, Takayuki Yogo, Tsubasa Watanabe, Takahiro Miki, Shinobu Tashiro, Hiroaki Hoshika
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Publication number: 20210310739Abstract: A cleaning method introduces a cleaning gas containing hydrogen fluoride into a reaction tube included in a heat treatment apparatus and having a furnace portion at one end in a state where an inside of the reaction tube with the furnace port being closed by a lid is maintained at a temperature at which water exists as a liquid film and the furnace port is locally heated, thereby removing a deposit from the reaction tube.Type: ApplicationFiled: March 30, 2021Publication date: October 7, 2021Inventors: Tomoya HASEGAWA, Tsubasa WATANABE
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Patent number: 11112286Abstract: A thermal flowmeter includes a plurality of measuring units for stabilizing air flowing in a sub-passage, and improves noise performance or a pulsation characteristic of a flow rate sensor. The thermal flowmeter includes a flange fixed to an attachment part of a main passage, a sub-passage takes in a part of measured gas flowing in the main passage, a flow rate measuring unit measures a flow rate of the measured gas in the sub-passage, a circuit component controls the flow rate measuring unit, and the flow rate measuring unit and an electronic component are mounted on a circuit substrate. The sub-passage is formed in a substrate of the circuit substrate, the sub-passage on a surface side of the circuit substrate and a second space on a rear surface side are separated by the circuit substrate, and a pressure measuring unit and the circuit component are arranged in the second space.Type: GrantFiled: September 27, 2017Date of Patent: September 7, 2021Assignee: HITACHI AUTOMOTIVE SYSTEMS, LTD.Inventors: Akira Uenodan, Masashi Fukaya, Tomoaki Saito, Shinobu Tashiro, Tsubasa Watanabe
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Patent number: 11079262Abstract: To obtain a physical quantity detection apparatus that can reduce the outer shape of a housing in size. A physical quantity detection apparatus 300 detects a plurality of physical quantities of gas 30 to be measured flowing in a main passage 124. The physical quantity detection apparatus 300 has a housing 302 disposed in the main passage 124, a circuit substrate 400 insert molded in the housing 302, and a plurality of detection sensors 452, 453, 454, 455, and 456 each mounted on each of one face and the other face of the circuit substrate 400.Type: GrantFiled: October 28, 2015Date of Patent: August 3, 2021Assignee: HITACHI AUTOMOTIVE SYSTEMS, LTD.Inventors: Tsubasa Watanabe, Tsutomu Kono, Hiroaki Hoshika, Takahiro Miki, Takayuki Yogo
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Patent number: 11060962Abstract: Provided is a flow analysis method capable of predicting a flow state of a composite resin material by taking into account a change in filler dispersion degree of the composite resin material. In a flow analysis method for a composite resin material having a filler and a resin, in a certain process of identifying a region in which the composite resin material flows and analyzing a flow, an exothermic reaction speed of the composite resin material in the region is computed using a filler dispersion degree in the composite resin material, a temperature and the filler dispersion degree of the composite resin material in the region is computed using the computed exothermic reaction speed, and an exothermic reaction speed in a process subsequent to a process is computed using the computed filler dispersion degree.Type: GrantFiled: April 18, 2016Date of Patent: July 13, 2021Assignee: HITACHI, LTD.Inventors: Tsutomu Kono, Ryotaro Shimada, Tsubasa Watanabe, Hiroki Nakatsuchi
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Publication number: 20210191165Abstract: A light modulator includes a perovskite-type electro-optic crystal having an input surface to which input light is input and a rear surface opposing the input surface, a first optical element being disposed on the input surface of the electro-optic crystal and having a first electrode through which the input light is transmitted, a second optical element being disposed on the rear surface of the electro-optic crystal and having a second electrode through which the input light is transmitted, and a drive circuit applying an electric field between the first electrode and the second electrode.Type: ApplicationFiled: December 5, 2017Publication date: June 24, 2021Applicant: HAMAMATSU PHOTONICS K.K.Inventors: Kuniharu TAKIZAWA, Hiroshi TANAKA, Haruyoshi TOYODA, Yasushi OHBAYASHI, Hiroto SAKAI, Tsubasa WATANABE
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Publication number: 20210180182Abstract: There is provision of a method of cleaning an exhaust pipe of a film forming apparatus for removing a component adhering to the exhaust pipe which is generated from a source gas for forming film supplied from a gas supply part to a processing chamber of the film forming apparatus. The method includes a step of supplying a cleaning gas from the gas supply part to the exhaust pipe via the processing chamber while the film forming apparatus is operating but a film forming process is not performed in the processing chamber, in order to remove the component by causing the component to vaporize upon reacting with the cleaning gas. The cleaning gas to be supplied is capable of causing the component adhering to the exhaust pipe to change into an evaporable substance by chemical reaction in an atmosphere inside the exhaust pipe.Type: ApplicationFiled: March 2, 2021Publication date: June 17, 2021Inventors: Takahito UMEHARA, Masato KOAKUTSU, Tsubasa WATANABE
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Publication number: 20210148743Abstract: Provided is a thermal-type flowmeter which can prevent a reduction of flow rate accuracy and reliability, and an increase of cost of the thermal-type flowmeter compared to the related art, and can add a function of an electrostatic scattering mechanism. The thermal-type flowmeter of the present invention includes a sub-passage into which part of a measurement target gas flowing in a main passage is taken, a flow rate detection element of a flow measurement unit which is disposed in the sub-passage, a circuit package which supports the flow rate detection element, and a substrate to which the circuit package is fixed. The flow rate detection element includes a detection surface to detect a flow rate of the measurement target gas. The detection surface is disposed to face the circuit substrate.Type: ApplicationFiled: July 17, 2018Publication date: May 20, 2021Inventors: Akira UENODAN, Takayuki YOGO, Tsubasa WATANABE, Takahiro MIKI, Shinobu TASHIRO, Hiroaki HOSHIKA
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Patent number: 10975466Abstract: There is provision of a method of cleaning an exhaust pipe of a film forming apparatus for removing a component adhering to the exhaust pipe which is generated from a source gas for forming film supplied from a gas supply part to a processing chamber of the film forming apparatus. The method includes a step of supplying a cleaning gas directly, from a cleaning gas supply part disposed near a joint between the processing chamber and the exhaust pipe, to the exhaust pipe without passing through the processing chamber, in order to remove the component by causing the component to vaporize upon reacting with the cleaning gas. The cleaning gas to be supplied is capable of causing the component adhering to the exhaust pipe to change into an evaporable substance by chemical reaction in an atmosphere inside the exhaust pipe.Type: GrantFiled: September 4, 2018Date of Patent: April 13, 2021Assignee: Tokyo Electron LimitedInventors: Takahito Umehara, Masato Koakutsu, Tsubasa Watanabe
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Publication number: 20210104421Abstract: A control device controls an operation of a processing apparatus for performing a processing in a processing container that accommodates a substrate. The control device includes: a temperature acquisition unit configured to acquire a temperature inside the processing container; a storage unit configured to store relationship information indicating a relationship between the temperature inside the processing container and an etching rate, and film thickness information including a cumulative film thickness of a deposited film inside the processing container; a rate calculator configured to calculate an etching rate of the deposited film based on the temperature acquired by the temperature acquisition unit and the relationship information stored in the storage unit; and a time calculator configured to calculate an etching time for removing the deposited film based on the etching rate calculated by the rate calculator and the film thickness information stored in the storage unit.Type: ApplicationFiled: September 24, 2020Publication date: April 8, 2021Inventors: Masami OIKAWA, Tsubasa WATANABE, Tomoya HASEGAWA
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Patent number: 10876872Abstract: A physical quantity detection device includes: a housing; a circuit board; a resin material which covers the circuit board; a cover which forms a circuit chamber in which the circuit board is disposed and a flow path through which a gas to be measured passes together with the housing; and a conductor which is disposed to be exposed to the flow path, in which the conductor and the circuit board are electrically connected to each other.Type: GrantFiled: March 24, 2017Date of Patent: December 29, 2020Assignee: HITACHI AUTOMOTIVE SYSTEMS, LTD.Inventors: Tsubasa Watanabe, Hiroaki Hoshika, Takayuki Yogo
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Publication number: 20200326564Abstract: A reflective spatial light modulator includes an electro-optic crystal having an input surface to which input light is input and a rear surface opposing the input surface, a light input/output unit being disposed on the input surface of the electro-optic crystal and having a first electrode through which the input light is transmitted, a light reflection unit including a substrate including a plurality of second electrodes and being disposed on the rear surface side of the electro-optic crystal, and a drive circuit applying an electric field between the first electrode and the plurality of second electrodes. The light input/output unit includes a first charge injection curbing layer formed on the input surface, and the light reflection unit includes a second charge injection curbing layer formed on the rear surface.Type: ApplicationFiled: December 5, 2017Publication date: October 15, 2020Applicant: HAMAMATSU PHOTONICS K.K.Inventors: Kuniharu TAKIZAWA, Hiroshi TANAKA, Haruyoshi TOYODA, Yasushi OHBAYASHI, Hiroto SAKAI, Tsubasa WATANABE
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Publication number: 20200292856Abstract: A reflective spatial light modulator includes an electro-optic crystal having an input surface to which input light is input and a rear surface opposing the input surface, a light input/output unit being disposed on the input surface of the electro-optic crystal and having a first electrode through which the input light is transmitted, a light reflection unit including a substrate including a plurality of second electrodes and an adhesive layer for fixing the substrate to the rear surface and being disposed on the rear surface of the electro-optic crystal, and a drive circuit applying an electric field between the first electrode and the plurality of second electrodes.Type: ApplicationFiled: December 5, 2017Publication date: September 17, 2020Applicant: HAMAMATSU PHOTONICS K.K.Inventors: Kuniharu TAKIZAWA, Hiroshi TANAKA, Haruyoshi TOYODA, Yasushi OHBAYASHI, Hiroto SAKAI, Tsubasa WATANABE