Patents by Inventor Tsuei Li-Ren

Tsuei Li-Ren has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7449094
    Abstract: A method of forming a phosphor layer on a shadow mask of a plasma display panel (PDP) is described. The shadow mask is bonded with a deposition mask such that predetermined apertures on the former are aligned with the openings on the latter and the other apertures blocked by the latter. The two masks are loaded into an electrophoretic cell, where a kind of phosphor is attracted by the shadow mask to pass through the openings on the deposition mask and deposit on the internal walls of the exposed apertures of the shadow mask. The phosphor layer is then dried to remove the solvent. By repeating the above steps with different kinds of phosphor, deposition masks and electrophoretic cells, phosphor layers of three different colors can be formed on the shadow mask for fabricating a full-color PDP.
    Type: Grant
    Filed: December 7, 2004
    Date of Patent: November 11, 2008
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventor: Tsuei Li-Ren
  • Publication number: 20050266151
    Abstract: A method of forming a phosphor layer on a shadow mask of a PDP is described. The shadow mask is bonded with a deposition mask such that predetermined apertures on the former are aligned with the openings on the latter and the other apertures blocked by the latter. The two masks are loaded into an electrophoretic cell, where a kind of phosphor is attracted by the shadow mask to pass through the openings on the deposition mask and deposit on the internal walls of the exposed apertures of the shadow mask. The phosphor layer is then dried to remove the solvent. By repeating the above steps with different kinds of phosphor, deposition masks and electrophoretic cells, phosphor layers of three different colors can be formed on the shadow mask for fabricating a full-color PDP.
    Type: Application
    Filed: December 7, 2004
    Publication date: December 1, 2005
    Inventor: Tsuei Li-Ren