Patents by Inventor Tsukasa KISHIUME

Tsukasa KISHIUME has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • TRANSISTOR, ELECTRONIC DEVICE, AND METHOD FOR MANUFACTURING TRANSISTOR
    Publication number: 20220384657
    Abstract: What is provided is a transistor including a gate electrode, a gate insulating film, a semiconductor film, a source electrode, and a drain electrode, in which the gate insulating film is a laminated film in which a SiOx film and a SiCyNz film are alternately formed, the total number of films constituting the laminated film is 3 or more and 18 or less, and the thickness of each film constituting the laminated film is 25 nm or more and 150 nm or less.
    Type: Application
    Filed: August 9, 2022
    Publication date: December 1, 2022
    Applicants: NIKON CORPORATION, TORAY ENGINEERING CO., LTD.
    Inventors: Makoto NAKAZUMI, Tsukasa KISHIUME, Masaki MORI, Takayoshi FUJIMOTO
  • Method of manufacturing compound film
    Patent number: 9719164
    Abstract: An amount of nitrogen in a compound film is controlled. A method of manufacturing compound film comprising forming films laminated on a substrate placed at a film forming chamber is provided. According to the method of manufacturing compound film, a first compound layer including one or more elements selected from metal elements and semimetal elements and oxygen element and a second compound layer including one or more elements and nitrogen element are laminated alternately. The first compound layer is formed by a Filtered Arc Ion Plating method and the second compound layer is formed by a sputtering method.
    Type: Grant
    Filed: October 29, 2015
    Date of Patent: August 1, 2017
    Assignee: NIKON CORPORATION
    Inventors: Tsukasa Kishiume, Koichiro Iwahori
  • Functional film
    Patent number: 9352073
    Abstract: A functional film that is applied to a surface of a medical apparatus or a biomaterial includes a film of Ti-doped tetrahedral amorphous carbon (ta-C:Ti film).
    Type: Grant
    Filed: September 17, 2015
    Date of Patent: May 31, 2016
    Assignee: NIKO CORPORATION
    Inventors: Yusuke Taki, Tsukasa Kishiume
  • METHOD OF MANUFACTURING COMPOUND FILM
    Publication number: 20160060747
    Abstract: An amount of nitrogen in a compound film is controlled. A method of manufacturing compound film comprising forming films laminated on a substrate placed at a film forming chamber is provided. According to the method of manufacturing compound film, a first compound layer including one or more elements selected from metal elements and semimetal elements and oxygen element and a second compound layer including one or more elements and nitrogen element are laminated alternately. The first compound layer is formed by a Filtered Arc Ion Plating method and the second compound layer is formed by a sputtering method.
    Type: Application
    Filed: October 29, 2015
    Publication date: March 3, 2016
    Applicant: NIKON CORPORATION
    Inventors: Tsukasa KISHIUME, Koichiro IWAHORI
  • FUNCTIONAL FILM
    Publication number: 20160000978
    Abstract: A functional film that is applied to a surface of a medical apparatus or a biomaterial includes a film of Ti-doped tetrahedral amorphous carbon (ta-C:Ti film).
    Type: Application
    Filed: September 17, 2015
    Publication date: January 7, 2016
    Inventors: Yusuke TAKI, Tsukasa KISHIUME
  • FUNCTIONAL FILM, LIQUID IMMERSION MEMBER, METHOD OF MANUFACTURING LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
    Publication number: 20150241784
    Abstract: A mesh member including a base material having a mesh portion and a film of Ti-doped tetrahedral amorphous carbon coated on the mesh portion. An atomic ratio of Ti to C in a composition of the film (ta-C:Ti film) is equal to or greater than 0.03 and equal to or less than 0.09. The atomic ratio of Ti to C is equal to a number of Ti atoms occupying the film divided by a sum of a number of carbon atoms having an sp3 hybrid orbital and a number of carbon atoms having an sp2 hybrid orbital occupying the film.
    Type: Application
    Filed: May 8, 2015
    Publication date: August 27, 2015
    Inventors: Tsukasa KISHIUME, Yusuke TAKI
  • Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
    Patent number: 9057955
    Abstract: A functional film which is applied to a surface of a base material includes a film of Ti-doped tetrahedral amorphous carbon (ta-C:Ti film).
    Type: Grant
    Filed: January 21, 2014
    Date of Patent: June 16, 2015
    Assignee: NIKON CORPORATION
    Inventors: Tsukasa Kishiume, Yusuke Taki
  • FUNCTIONAL FILM, LIQUID IMMERSION MEMBER, METHOD OF MANUFACTURING LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
    Publication number: 20140227644
    Abstract: A functional film which is applied to a surface of a base material includes a film of Ti-doped tetrahedral amorphous carbon (ta-C:Ti film).
    Type: Application
    Filed: January 21, 2014
    Publication date: August 14, 2014
    Applicant: Nikon Corporation
    Inventors: Tsukasa KISHIUME, Yusuke TAKI