Patents by Inventor Tsukasa KITAHARA

Tsukasa KITAHARA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240025612
    Abstract: A laminate according to an aspect of the present disclosure is a laminate including a substrate layer, a sealant layer, and an adhesive layer disposed between the substrate layer and the sealant layer, the adhesive layer being in contact with the sealant layer, in which the substrate layer is formed from an unstretched film containing a polyethylene having a density of 0.940 g/cm3 or more as a main component, the sealant layer is formed from an unstretched film containing a polyethylene as a main component, and a content of polyethylene occupying the laminate is 90% by mass or more.
    Type: Application
    Filed: December 14, 2021
    Publication date: January 25, 2024
    Applicant: TOPPAN INC.
    Inventors: Jin SATO, Shinya OCHIAI, Tsukasa KITAHARA
  • Publication number: 20230087185
    Abstract: A gas barrier laminate according to an aspect of the present disclosure has a structure having a base material layer including a polyolefin, an undercoat layer, an inorganic oxide layer, a gas barrier adhesive layer, and a resin layer including a polyolefin laminated therein in this order.
    Type: Application
    Filed: February 4, 2021
    Publication date: March 23, 2023
    Applicant: TOPPAN INC.
    Inventors: Tsukasa KITAHARA, Ryota TANAKA, Ryo TAKEI, Yuki EJIMA
  • Patent number: 10571619
    Abstract: A first quantum dot protective film comprises a first barrier film including a silica deposition layer, and a first diffusion layer. An O/Si ratio of the silica deposition layer is 1.7 or more and 2.0 or less on an atomic ratio basis, and a refractive index of the silica deposition layer is 1.5 or more and 1.7 or less; and a reflectance of the first quantum dot protective film is 10% or more and 20% or less at each of wavelengths of 450 nm, 540 nm and 620 nm, and a transmittance of the first quantum dot protective film is 80% or more and 87% or less at each of wavelengths of 450 nm, 540 nm and 620 nm.
    Type: Grant
    Filed: July 16, 2015
    Date of Patent: February 25, 2020
    Assignee: TOPPAN PRINTING CO., LTD.
    Inventors: Tsukasa Kitahara, Osamu Tokinoya, Takeshi Nishikawa
  • Publication number: 20160327719
    Abstract: A first quantum dot protective film comprises a first barrier film including a silica deposition layer, and a first diffusion layer. An O/Si ratio of the silica deposition layer is 1.7 or more and 2.0 or less on an atomic ratio basis, and a refractive index of the silica deposition layer is 1.5 or more and 1.7 or less; and a reflectance of the first quantum dot protective film is 10% or more and 20% or less and a transmittance the first quantum dot protective film is 80% or more and 95% or less, at all wavelengths of 450 nm, 540 am, and 620 nm.
    Type: Application
    Filed: July 16, 2015
    Publication date: November 10, 2016
    Applicant: TOPPAN PRINTING CO., LTD.
    Inventors: Tsukasa KITAHARA, Osamu TOKINOYA, Takeshi NISHIKAWA
  • Publication number: 20160327690
    Abstract: A protective film for wavelength conversion sheet for protecting a fluorescent substance in a wavelength conversion sheet, the protective film for wavelength conversion sheet having a structure in which two or more barrier films, each comprising a substrate and one or more barrier layers provided on at least one surface of the substrate, are laminated.
    Type: Application
    Filed: July 16, 2015
    Publication date: November 10, 2016
    Applicant: TOPPAN PRINTING CO., LTD.
    Inventors: Osamu TOKINOYA, Tsukasa KITAHARA, Takeshi NISHIKAWA