Abstract: This invention provides a thin film deposition process making it possible to form a thin film having a desired composition with good reproducibility and high efficiency; a thin film deposition device therefore; a FTIR gas analyzer used in the thin film deposition process; and a mixed gas supplying device used in the thin film deposition process. The thin film deposition process comprises the steps of mixing a plurality of organic metal gases in a gas mixing chamber and supplying the mixed gas into a reaction chamber to deposit a thin film on a substrate positioned in the reaction chamber, wherein the mixture ratio between/among the organic metal gases supplied into the gas mixing chamber is measured with a FTIR gas analyzer fitted to either the gas mixing chamber or the reaction chamber and then on the basis of results of the measurement, the flow rates of the organic metal gases are individually adjusted.

Abstract: A system for providing an exchange market for trading assigned quotas of permissible pollutants and monitoring the pollutants through a global computer network is provided. A standardized source for providing formulas or algorithm data to establish a relationship between pollutant emissions and an assigned quota to enable a usage rate relative to a predetermined index value can be provided by a regulatory body connected to the global computer network. Individual users can provide monitoring units for measuring the actual pollutant emissions and outputting a corresponding signal. An operation control unit can store the algorithm data or formulas and the pollutant emission signal and calculate a real time usage rate. This usage rate can be monitored to determine compliance and provide a real time usage rate over a number of different users forming a particular district or division.

Abstract: This invention provides a thin film deposition process making it possible to form a thin film having a desired composition with good reproducibility and high efficiency; a thin film deposition device therefor; a FTIR gas analyzer used in the thin film deposition process; and a mixed gas supplying device used in the thin film deposition process. The thin film deposition process comprises the steps of mixing a plurality of organic metal gases in a gas mixing chamber and supplying the mixed gas into a reaction chamber to deposit a thin film on a substrate positioned in the reaction chamber, wherein the mixture ratio between/among the organic metal gases supplied into the gas mixing chamber is measured with a FTIR gas analyzer fitted to either the gas mixing chamber or the reaction chamber and then on the basis of results of the measurement, the flow rates of the organic metal gases are individually adjusted.

Abstract: A solid object carrying a catalyzer thereon is placed in a closed reaction chamber into which test gases are supplied and is heated up to a temperature of 1000.degree. C. Adsorbates are formed on the surface of the solid object under the test gas flow in the closed reaction chamber. Infrared radiations radiated from the adsorbates are emitted through an infrared-transmissive window hermetically formed on a wall of the closed reaction chamber, and are analyzed by an infrared radiation spectrometer and observed by a microscope. The infrared-transmissive window is cooled down by a cooling device attached thereto so that the temperature of the window does not exceed a certain level, e.g., 200.degree. C. Thus, the adsorbates formed on the solid object can be detected and analyzed under conditions where the test gas is actually flowing and the temperature of the solid object is elevated up to a high level.

Abstract: An infrared spectrometer disperses a radiation ray from a catalyst which has been exposed to a gas for evaluation to adsorb adsorbates thereon, and outputs spectral data in accordance with a wavenumber of the radiation ray to a computer storing reference data. The computer normalizes the spectral data and the reference data, and then, it calculates a product of the normalized spectral data and the reference data. Thereafter, a function of the product is differentiated with respect to the wavenumber to obtain a differential function. Accordingly, a specified wavenumber for which the differential function is zero is determined, so that the common peak of the spectral data and the reference data at the specified wavenumber is accurately determined.

Abstract: A sample gas is introduced into a sample cell housed in a cell block. A self-operated temperature-controlling type heater is disposed within the hollow place of the cell block and said sample cell is indirectly heated by the heat from said heater.