Patents by Inventor Tsuku Umezawa

Tsuku Umezawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5448173
    Abstract: With a view to enabling errors in the space potential to be automatically corrected by detecting a floating potential in each of a plurality of probes and to remove the errors in measurement based on the corrected space potential to thereby realize the accurate measurement of the space potential, there is provided a triple-probe plasma measuring apparatus, which comprises: a circuit for measuring electron temperature and electron density of a plasma with use of triple probes; a circuit for detecting and holding a floating potential difference; a differential voltage adding circuit; a fixed voltage source; and a change-over switch, the apparatus being capable of determining a difference in the floating potentials at the position of said probes, and superimposing the potential difference determined on the fixed voltage.
    Type: Grant
    Filed: October 27, 1992
    Date of Patent: September 5, 1995
    Assignees: Nihon Kosyuha Kabushiki Kaisha, Nichimen Kabushiki Kaisha
    Inventors: Kibatsu Shinohara, Tsuku Umezawa
  • Patent number: 5365147
    Abstract: A plasma stabilizing apparatus having circuits for measuring electron temperature and electron density of a plasma using triple probes, a plasma gas pressure control circuit, and a plasma excitation power control circuit, for automatically stabilizing the plasma.
    Type: Grant
    Filed: July 27, 1992
    Date of Patent: November 15, 1994
    Assignees: Nichimen Kabushiki Kaisha, Nihon Kosyuha Kabushiki Kaisha
    Inventors: Kibatsu Shinohara, Kozo Obara, Tsuku Umezawa
  • Patent number: 5359282
    Abstract: A plasma diagnosing apparatus for performing plasma diagnosis witch probes having a high degree of cleanliness by removing contamination caused by reactive plasma, etc., while quantitatively detecting a degree of the contamination of the probes. The disclosed apparatus avoids the disadvantages of conventional apparatuses, in which the voltage-current characteristics of the probes are deteriorated by growth of the contaminant film formed on the probes, making it difficult to measure the parameters of the plasma conditions.
    Type: Grant
    Filed: July 15, 1992
    Date of Patent: October 25, 1994
    Assignees: Nichimen Kabushiki Kaisha, Nihon Kosyuha Kabushiki Kaisha
    Inventors: Shinriki Teii, Kibatsu Shinohara, Kozo Obara, Tsuku Umezawa