Patents by Inventor Tsun-Yu YANG
Tsun-Yu YANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12242790Abstract: A method includes conducting an electromigration (EM) check process on a schematic design, conducting a mitigating process to mitigate one or more electromigration violations identified during conducting the EM check process, and generating a layout design of the schematic design after at least one iteration of a design process including the EM check process and the mitigating process. The EM check process includes selecting at least some circuits in the schematic design as selected circuits for electromigration check, and checking electromigration compliance in the selected circuits. The mitigating process includes one of modifying some circuit layout of the selected circuits, modifying the schematic design, or modifying both the schematic design and some circuit layout of the selected circuits.Type: GrantFiled: January 27, 2022Date of Patent: March 4, 2025Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Hsien Yu Tseng, Tsun-Yu Yang
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Patent number: 12204839Abstract: A method is disclosed herein. The method includes: providing, by an electronic design automation (EDA), a trigger signal to an application programming interface (API); providing, by the API, first parameters associated with parameterized cells in a netlist of an integrated circuit (IC); adjusting, by the API, the first parameters to generate second parameters associated with the parameterized cells in the netlist of the IC; updating, by the API, the netlist of the IC according to the second parameters; and performing, by the EDA, a simulation according to the netlist.Type: GrantFiled: April 12, 2022Date of Patent: January 21, 2025Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tsun-Yu Yang, Ren-Hong Fu, Chin-Cheng Kuo, Jui-Feng Kuan
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Publication number: 20240394456Abstract: A method is disclosed herein. The method includes: providing, by an electronic design automation (EDA), a trigger signal to an application programming interface (API); providing, by the API, first parameters associated with parameterized cells in a netlist of an integrated circuit (IC); adjusting, by the API, the first parameters to generate second parameters associated with the parameterized cells in the netlist of the IC; updating, by the API, the netlist of the IC according to the second parameters; and performing, by the EDA, a simulation according to the netlist.Type: ApplicationFiled: July 31, 2024Publication date: November 28, 2024Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tsun-Yu YANG, Ren-Hong FU, Chin-Cheng KUO, Jui-Feng KUAN
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Publication number: 20220245319Abstract: A method is disclosed herein. The method includes: providing, by an electronic design automation (EDA), a trigger signal to an application programming interface (API); providing, by the API, first parameters associated with parameterized cells in a netlist of an integrated circuit (IC); adjusting, by the API, the first parameters to generate second parameters associated with the parameterized cells in the netlist of the IC; updating, by the API, the netlist of the IC according to the second parameters; and performing, by the EDA, a simulation according to the netlist.Type: ApplicationFiled: April 12, 2022Publication date: August 4, 2022Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tsun-Yu YANG, Ren-Hong FU, Chin-Cheng KUO, Jui-Feng KUAN
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Publication number: 20220237360Abstract: A method is disclosed herein. The method includes: connecting a first number of elements in an integrated circuit (IC); parameterizing, by a processor, the first number into first parameters; generating, by the processor, second parameters of the IC based on the first parameters; and adjusting the IC based on the second parameters.Type: ApplicationFiled: April 12, 2022Publication date: July 28, 2022Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tsun-Yu YANG, Ren-Hong FU, Chin-Cheng KUO, Jui-Feng KUAN
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Publication number: 20220147692Abstract: A method includes conducting an electromigration (EM) check process on a schematic design, conducting a mitigating process to mitigate one or more electromigration violations identified during conducting the EM check process, and generating a layout design of the schematic design after at least one iteration of a design process including the EM check process and the mitigating process. The EM check process includes selecting at least some circuits in the schematic design as selected circuits for electromigration check, and checking electromigration compliance in the selected circuits. The mitigating process includes one of modifying some circuit layout of the selected circuits, modifying the schematic design, or modifying both the schematic design and some circuit layout of the selected circuits.Type: ApplicationFiled: January 27, 2022Publication date: May 12, 2022Inventors: Hsien YU TSENG, Tsun-Yu YANG
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Patent number: 11314914Abstract: A method is disclosed herein. The method includes: adjusting first parameters associated with parameterized cells in a netlist of an integrated circuit (IC) to generate second parameters associated with the parameterized cells in the netlist of the IC; updating the netlist of the IC according to the second parameters; and performing a simulation according to the netlist.Type: GrantFiled: November 22, 2019Date of Patent: April 26, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tsun-Yu Yang, Ren-Hong Fu, Chin-Cheng Kuo, Jui-Feng Kuan
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Patent number: 11256847Abstract: A method includes conducting an electromigration (EM) check process on a schematic design, conducting a mitigating process to mitigate one or more electromigration violations identified during conducting the EM check process, and generating a layout design of the schematic design after at least one iteration of a design process including the EM check process and the mitigating process. The EM check process includes selecting at least some circuits in the schematic design as selected circuits for electromigration check, and checking electromigration compliance in the selected circuits. The mitigating process includes one of modifying some circuit layout of the selected circuits, modifying the schematic design, or modifying both the schematic design and some circuit layout of the selected circuits.Type: GrantFiled: September 10, 2019Date of Patent: February 22, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Hsien Yu Tseng, Tsun-Yu Yang
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Publication number: 20200175219Abstract: A method is disclosed herein. The method includes: adjusting first parameters associated with parameterized cells in a netlist of an integrated circuit (IC) to generate second parameters associated with the parameterized cells in the netlist of the IC; updating the netlist of the IC according to the second parameters; and performing a simulation according to the netlist.Type: ApplicationFiled: November 22, 2019Publication date: June 4, 2020Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tsun-Yu YANG, Ren-Hong FU, Chin-Cheng KUO, Jui-Feng KUAN
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Publication number: 20200134132Abstract: A method includes conducting an electromigration (EM) check process on a schematic design, conducting a mitigating process to mitigate one or more electromigration violations identified during conducting the EM check process, and generating a layout design of the schematic design after at least one iteration of a design process including the EM check process and the mitigating process. The EM check process includes selecting at least some circuits in the schematic design as selected circuits for electromigration check, and checking electromigration compliance in the selected circuits. The mitigating process includes one of modifying some circuit layout of the selected circuits, modifying the schematic design, or modifying both the schematic design and some circuit layout of the selected circuits.Type: ApplicationFiled: September 10, 2019Publication date: April 30, 2020Inventors: Hsien YU TSENG, Tsun-Yu YANG
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Patent number: 10509883Abstract: A layout-generation method for an IC is provided. The layout-generation method includes accessing data of a schematic design of the IC; generating a hypergraph from the schematic design; transforming a plurality of constraints into a plurality of weighted edges in the hypergraph; continuing partitioning the hypergraph by the weighted edges until a plurality of multilevel groups are obtained to generate a layout; and verifying the layout to fabricate the IC.Type: GrantFiled: January 24, 2017Date of Patent: December 17, 2019Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tsun-Yu Yang, Wei-Yi Hu, Jui-Feng Kuan, Hsien-Hsin Sean Lee, Po-Cheng Pan, Hung-Wen Huang, Hung-Ming Chen, Abhishek Patyal
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Patent number: 9996643Abstract: A method of modeling an integrated circuit comprises generating a schematic of an integrated circuit comprising a first circuit component. The schematic comprises a first representation of the first circuit component. The method also comprises replacing the first representation with a second representation of the first circuit component. The second representation includes resistive capacitance information (RC) for the first circuit component. The RC information is based on first RC data included in a process design kit (PDK) file and second RC data included in a macro device file. The second RC data is based on a relationship between the first circuit component and a second circuit component. The method further comprises selectively coloring the second representation of the first circuit component in the schematic based on the RC information. The coloring of the second representation is indicative of whether the integrated circuit is in compliance with a design specification.Type: GrantFiled: November 17, 2014Date of Patent: June 12, 2018Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chin-Sheng Chen, Tsun-Yu Yang, Wei-Yi Hu, Jui-Feng Kuan, Ching-Shun Yang
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Publication number: 20180150585Abstract: A layout-generation method for an IC is provided. The layout-generation method includes accessing data of a schematic design of the IC; generating a hypergraph from the schematic design; transforming a plurality of constraints into a plurality of weighted edges in the hypergraph; continuing partitioning the hypergraph by the weighted edges until a plurality of multilevel groups are obtained to generate a layout; and verifying the layout to fabricate the IC.Type: ApplicationFiled: January 24, 2017Publication date: May 31, 2018Inventors: Tsun-Yu YANG, Wei-Yi HU, Jui-Feng KUAN, Hsien-Hsin Sean LEE, Po-Cheng PAN, Hung-Wen HUANG, Hung-Ming CHEN, Abhishek PATYAL
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Patent number: 9348965Abstract: A method for circuit design includes a parasitic aware library embedded with one or more parameterized cells. The parasitic aware library is used to insert nets representing some but not all parasitic effects of a circuit into a circuit schematic enabling a single circuit schematic to be used for simulation of the circuit, parasitic verification of the circuit and LVS (Layout Versus Schematic) check. Only the single circuit schematic is required for the circuit design process and to form a mask set. Critical paths of the single circuit schematic are identified and parasitic effects are extracted and inserted into the schematic, enabling a pre-estimation of parasitic verification to be carried out and the LVS check to be carried out using a circuit schematic with some parasitic effects prior to the post-layout simulation in which all parasitic components of the layout are included.Type: GrantFiled: November 17, 2014Date of Patent: May 24, 2016Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chin-Sheng Chen, Tsun-Yu Yang, Wei-Yi Hu, Tao Wen Chung, Jui-Feng Kuan, Yi-Kan Cheng
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Publication number: 20160140271Abstract: A method of modeling an integrated circuit comprises generating a schematic of an integrated circuit comprising a first circuit component. The schematic comprises a first representation of the first circuit component. The method also comprises replacing the first representation with a second representation of the first circuit component. The second representation includes resistive capacitance information (RC) for the first circuit component. The RC information is based on first RC data included in a process design kit (PDK) file and second RC data included in a macro device file. The second RC data is based on a relationship between the first circuit component and a second circuit component. The method further comprises selectively coloring the second representation of the first circuit component in the schematic based on the RC information. The coloring of the second representation is indicative of whether the integrated circuit is in compliance with a design specification.Type: ApplicationFiled: November 17, 2014Publication date: May 19, 2016Inventors: Chin-Sheng CHEN, Tsun-Yu YANG, Wei-Yi HU, Jui-Feng KUAN, Ching-Shun YANG
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Patent number: 9122833Abstract: A method of designing a fin field effect transistor (FinFET)-based circuit includes designing, using a processor, a first circuit schematic design based on a performance specification, the first circuit schematic design is free of artificial elements, wherein the artificial elements are used to simulate electrical performance of the FinFET-based circuit. The method further includes modifying, using the processor, at least one device within the first circuit schematic design to form a second circuit schematic design taking the artificial elements into consideration. The method further includes performing a pre-layout simulation using the second circuit schematic and taking the artificial elements into consideration. The method further includes generating a layout, wherein the layout does not take the artificial elements into consideration, and performing a post-layout simulation, wherein the post-layout simulation does not take the artificial elements into consideration.Type: GrantFiled: November 21, 2013Date of Patent: September 1, 2015Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chin-Sheng Chen, Tsun-Yu Yang, Wei-Yi Hu, Jui-Feng Kuan, Ching-Shun Yang, Yi-Kan Cheng
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Publication number: 20150143314Abstract: A method of designing a fin field effect transistor (FinFET)-based circuit includes designing, using a processor, a first circuit schematic design based on a performance specification, the first circuit schematic design is free of artificial elements, wherein the artificial elements are used to simulate electrical performance of the FinFET-based circuit. The method further includes modifying, using the processor, at least one device within the first circuit schematic design to form a second circuit schematic design taking the artificial elements into consideration. The method further includes performing a pre-layout simulation using the second circuit schematic and taking the artificial elements into consideration.Type: ApplicationFiled: November 21, 2013Publication date: May 21, 2015Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chin-Sheng CHEN, Tsun-Yu YANG, Wei-Yi HU, Jui-Feng KUAN, Ching-Shun YANG, Yi-Kan CHENG
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Publication number: 20150074629Abstract: A method for circuit design includes a parasitic aware library embedded with one or more parameterized cells. The parasitic aware library is used to insert nets representing some but not all parasitic effects of a circuit into a circuit schematic enabling a single circuit schematic to be used for simulation of the circuit, parasitic verification of the circuit and LVS (Layout Versus Schematic) check. Only the single circuit schematic is required for the circuit design process and to form a mask set. Critical paths of the single circuit schematic are identified and parasitic effects are extracted and inserted into the schematic, enabling a pre-estimation of parasitic verification to be carried out and the LVS check to be carried out using a circuit schematic with some parasitic effects prior to the post-layout simulation in which all parasitic components of the layout are included.Type: ApplicationFiled: November 17, 2014Publication date: March 12, 2015Inventors: Chin-Sheng CHEN, Tsun-Yu YANG, Wei -Yi HU, Tao Wen CHUNG, Jui-Feng KUAN, Yi-Kan CHENG
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Patent number: 8893066Abstract: A method for circuit design includes a parasitic aware library embedded with one or more parameterized cells. The parasitic aware library is used to insert nets representing some but not all parasitic effects of a circuit into a circuit schematic enabling a single circuit schematic to be used for simulation of the circuit, parasitic verification of the circuit and LVS (Layout Versus Schematic) check. Only the single circuit schematic is required for the circuit design process and to form a mask set. Critical paths of the single circuit schematic are identified and parasitic effects are extracted and inserted into the schematic, enabling a pre-estimation of parasitic verification to be carried out and the LVS check to be carried out using a circuit schematic with some parasitic effects prior to the post-layout simulation in which all parasitic components of the layout are included.Type: GrantFiled: December 27, 2012Date of Patent: November 18, 2014Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chin-Sheng Chen, Tsun-Yu Yang, Wei-Yi Hu, Tao Wen Chung, Jui-Feng Kuan, Yi-Kan Cheng
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Patent number: 8856701Abstract: The present disclosure relates to an apparatus and method to generate a device library, along with layout versus schematic (LVS) and parasitic extraction set-up files for connecting with official tools of a design window supported by a process design kit (PDK). The device library comprises passive devices which can be utilized at any point in an end-to-end design flow from pre-layout verification to post-layout verification of an integrated circuit design. The device library allows for a single schematic view for pre-layout verification but also post-layout verification, thus allowing for pole or pin comparison, and prevents double-counting of parasitic effects from passive design elements by directly instantiating a device from the device library for a verification step. An LVS and parasitic extraction graphical user interface (GUI) allows for incorporation of the generated device library into a pre-existing PDK without any modification to the PDK. Other devices and methods are also disclosed.Type: GrantFiled: March 12, 2013Date of Patent: October 7, 2014Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chin-Sheng Chen, Tsun-Yu Yang, Wei-Yi Hu, Tao Wen Chung, Hui Yu Lee, Jui-Feng Kuan, Yi-Kan Cheng