Patents by Inventor Tsunehiro Chonan

Tsunehiro Chonan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for using positive-working resist materials to form negative resist pattern on substrate
    Patent number: 4444869
    Abstract: An improved positive-working resist material capable of forming on a substrate either a positive resist pattern or a negative resist pattern. The positive-working resist material comprises a positive-working resist resin having incorporated therein one or more photochromic compounds, such as spiropyrans, triphenylmethane dyes, anils and the like. A positive or negative resist pattern having a remarkably improved definition can be obtained. The use of such a positive-working resist material in the formation of a negative resist pattern on the substrate is also disclosed.
    Type: Grant
    Filed: November 25, 1981
    Date of Patent: April 24, 1984
    Assignee: Fujitsu Limited
    Inventors: Tsunehiro Chonan, Akira Morishige