Patents by Inventor Tsunehiro Nish

Tsunehiro Nish has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive resist compositions and patterning process
    Publication number: 20080118863
    Abstract: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units. When processed by ArF lithography, the composition is improved in resolution and forms a contact hole pattern with a satisfactory mask fidelity, sphericity and rectangularity.
    Type: Application
    Filed: November 19, 2007
    Publication date: May 22, 2008
    Inventors: Shigeo Tanaka, Akihiro Seki, Katsuya Takemura, Tsunehiro Nish