Patents by Inventor Tsunehisa Takahashi

Tsunehisa Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7357879
    Abstract: There is provided an etching solution comprised of a cupric chloride solution and a high-concentration triazole type compound added to the cupric chloride solution and capable of forming an etching-inhibiting coating. In a process of forming a circuit pattern by etching with the etching solution, an etching-inhibiting coating is selected formed on parts of a copper foil laid under the edge of an etching resist to effectively inhibit horizontal side-etching of the copper foil from the edge of the etching resist. Also, nonuniform irregularities formed on the side wall of the circuit pattern by the etching improves the adhesion between the circuit pattern and an insulating resin layer covering the circuit pattern.
    Type: Grant
    Filed: March 1, 2005
    Date of Patent: April 15, 2008
    Assignee: Ibiden Co., Ltd.
    Inventors: Tsunehisa Takahashi, Shigeki Sawa, Kazuhiko Matsui
  • Publication number: 20060199394
    Abstract: There is provided an etching solution comprised of a cupric chloride solution and a high-concentration triazole type compound added to the cupric chloride solution and capable of forming an etching-inhibiting coating. In a process of forming a circuit pattern by etching with the etching solution, an etching-inhibiting coating is selected formed on parts of a copper foil laid under the edge of an etching resist to effectively inhibit horizontal side-etching of the copper foil from the edge of the etching resist. Also, nonuniform irregularities formed on the side wall of the circuit pattern by the etching improves the adhesion between the circuit pattern and an insulating resin layer covering the circuit pattern.
    Type: Application
    Filed: March 1, 2005
    Publication date: September 7, 2006
    Inventors: Tsunehisa Takahashi, Shigeki Sawa, Kazuhiko Matsui
  • Patent number: 6229101
    Abstract: A substrate for mounting an electronic part and a method for producing the same, which allows a conductive pin to be inserted and secured in a through hole without exerting any damage thereto. The substrate for mounting an electronic part is formed of a through hole piercing an insulating substrate and a conductive pin with its head inserted into the through hole. The head of the conductive pin is provided with a plurality of projections to its side wall, each projecting radially in 4 or more directions. Those projections form a plurality of pairs, each of which is extending in an opposite direction from an axial center of the head. Those projection pairs include a primary projection pair having a largest length and a secondary projection pair having a second largest length. The length of the primary projection pair is equal to or more than an inside diameter of the through hole. The length of the secondary projection pair is less than the inside diameter of the through hole.
    Type: Grant
    Filed: June 10, 1999
    Date of Patent: May 8, 2001
    Assignee: Ibiden Co. Ltd.
    Inventors: Masataka Sekiya, Tsunehisa Takahashi, Akihiro Demura, Takuji Asai
  • Patent number: 6011222
    Abstract: A substrate for mounting an electronic part and a method for producing the same, which allows a conductive pin to be inserted and secured in a through hole without exerting any damage thereto. The substrate for mounting an electronic part is formed of a through hole piercing an insulating substrate and a conductive pin with its head inserted into the through hole. The head of the conductive pin is provided with a plurality of projections to its side wall, each projecting radially in 4 or more directions. Those projections form a plurality of pairs, each of which is extending in an opposite direction from an axial center of the head. Those projection pairs include a primary projection pair having a largest length and a secondary projection pair having a second largest length. The length of the primary projection pair is equal to or more than an inside diameter of the through hole.
    Type: Grant
    Filed: December 13, 1996
    Date of Patent: January 4, 2000
    Assignee: IBIDEN Co., Ltd.
    Inventors: Masataka Sekiya, Tsunehisa Takahashi, Akihiro Demura, Takuji Asai
  • Patent number: 4319930
    Abstract: In a multi-stage washing system comprising a plurality of washing tanks, fresh liquid is applied over a treated material at a front position in the zone of a furthermost tank, whereas in the tanks excluding a nearest tank, washing liquid is pumped from the individual washing tanks in an amount of more than that of the applied fresh liquid and applied over the treated material at a front position in the zones of individual adjacent washing tanks placed after said individual washing tanks in an amount of the applied fresh liquid and a rear position in the zones of said individual washing tanks in the remaining amount.
    Type: Grant
    Filed: March 28, 1980
    Date of Patent: March 16, 1982
    Assignee: Daiwa Can Company, Limited
    Inventors: Shunji Yano, Tsunehisa Takahashi