Abstract: Provided is a method for manufacturing a microbicide having high microbicidal performance for eradicating microbes. This method for manufacturing a microbicide comprises: a step for preparing an inorganic aqueous solution containing an inorganic component having seawater as a raw material thereof, an ozone mixing step for mixing ozone into the inorganic aqueous solution, and a stirring step for stirring the inorganic aqueous solution mixed with ozone and passing through a bubble generation nozzle; wherein, the temperature of the inorganic aqueous solution in the ozone mixing step and the stirring step is 0° C. to 30° C., and when the amount of inorganic aqueous solution treated in the ozone mixing step and the stirring step is defined as X liters and the treatment rate of the ozone mixing step and the stirring step is defined as Y liters/minute, then the microbicide is manufactured by alternately repeating the ozone mixing step and the stirring step for A·X/Y minutes (where A is 30 or more).

Abstract: Provided is a method for manufacturing a microbicide having high microbicidal performance for eradicating microbes. This method for manufacturing a microbicide comprises: a step for preparing an inorganic aqueous solution containing an inorganic component having seawater as a raw material thereof, an ozone mixing step for mixing ozone into the inorganic aqueous solution, and a stirring step for stirring the inorganic aqueous solution mixed with ozone and passing through a bubble generation nozzle; wherein, the temperature of the inorganic aqueous solution in the ozone mixing step and the stirring step is 0° C. to 30° C., and when the amount of inorganic aqueous solution treated in the ozone mixing step and the stirring step is defined as X liters and the treatment rate of the ozone mixing step and the stirring step is defined as Y liters/minute, then the microbicide is manufactured by alternately repeating the ozone mixing step and the stirring step for A·X/Y minutes (where A is 30 or more).

Abstract: The problem to be addressed by the present invention is to provide a cleaning apparatus capable of obtaining a cleaning liquid having a high degree of cleanliness. A cleaning apparatus 10 includes a dissolution tank 20 for dissolving a gas in a liquid, a transfer pump 30 for sending the liquid together with the gas into the dissolution tank 20, and a feed nozzle 40 for feeding the liquid stored in the dissolution tank 20 to a workpiece W. The transfer pump 30 is a positive displacement pump. Portions of the dissolution tank 20, the transfer pump 30, and the feed nozzle 40 that come into contact with the liquid are made of a fluororesin.

Abstract: The problem to be addressed by the present invention is to provide a cleaning apparatus capable of obtaining a cleaning liquid having a high degree of cleanliness. A cleaning apparatus 10 includes a dissolution tank 20 for dissolving a gas in a liquid, a transfer pump 30 for sending the liquid together with the gas into the dissolution tank 20, and a feed nozzle 40 for feeding the liquid stored in the dissolution tank 20 to a workpiece W. The transfer pump 30 is a positive displacement pump. Portions of the dissolution tank 20, the transfer pump 30, and the feed nozzle 40 that come into contact with the liquid are made of a fluororesin.

Abstract: Provided is a method for manufacturing a microbicide having high microbicidal performance for eradicating microbes. This method for manufacturing a microbicide comprises: a step for preparing an inorganic aqueous solution containing an inorganic component having seawater as a raw material thereof, an ozone mixing step for mixing ozone into the inorganic aqueous solution, and a stirring step for stirring the inorganic aqueous solution mixed with ozone and passing through a bubble generation nozzle; wherein, the temperature of the inorganic aqueous solution in the ozone mixing step and the stirring step is 0° C. to 30° C., and when the amount of inorganic aqueous solution treated in the ozone mixing step and the stirring step is defined as X liters and the treatment rate of the ozone mixing step and the stirring step is defined as Y liters/minute, then the microbicide is manufactured by alternately repeating the ozone mixing step and the stirring step for A·X/Y minutes (where A is 30 or more).

Abstract: An object of the present invention is to provide a method for manufacturing a semiconductor, including a step of removing a photoresist present on a patterned wafer substrate and having a hardened modified layer, which is difficult to remove, formed on at least part of a top portion easily and effectively under mild conditions, and a method for cleaning a wafer substrate, including the above step. The method for manufacturing a semiconductor of the present invention as a means for resolution is characterized by comprising a step of bringing a patterned wafer substrate, on which a photoresist having a hardened modified layer formed on at least part of a top portion is present, into contact with a carbon dioxide dissolved water containing ozone-containing microbubbles, thereby removing the photoresist. In addition, the method for cleaning a wafer substrate of the present invention is characterized by comprising the above step.

Abstract: A dissolving water making unit and a bubble generating unit are provided. The dissolving water making unit includes a gas dissolving device for dissolving gas in water. The bubble generating unit includes a bubble generating nozzle and a bubble generating cartridge. The dissolving water making unit sucks water from a water source, and sucks gas to make dissolving water from a mixed solution in which the water and the gas are mixed together. The dissolving water is obtained by dissolving the gas in the water. The bubble generating unit generates microbubbles from the dissolving water supplied from the dissolving water making unit.

Abstract: A pet cleaning apparatus comprises a cleaning tub, a saturated solution generator and an air-bubble generating nozzle. The saturated solution generator is connected to the cleaning tub and configured to generate a saturated solution by saturating a pressurized fluid with air. The air-bubble generating nozzle is connected to the cleaning tub and the saturated solution generator and configured to generate a fine air-bubble in the saturated solution.

Abstract: A dissolving water making unit and a bubble generating unit are provided. The dissolving water making unit includes a gas dissolving device for dissolving gas in water. The bubble generating unit includes a bubble generating nozzle and a bubble generating cartridge. The dissolving water making unit sucks water from a water source, and sucks gas to make dissolving water from a mixed solution in which the water and the gas are mixed together. The dissolving water is obtained by dissolving the gas in the water. The bubble generating unit generates microbubbles from the dissolving water supplied from the dissolving water making unit.

Abstract: A pet cleaning apparatus comprises a cleaning tub, a saturated solution generator and an air-bubble generating nozzle. The saturated solution generator is connected to the cleaning tub and configured to generate a saturated solution by saturating a pressurized fluid with air. The air-bubble generating nozzle is connected to the cleaning tub and the saturated solution generator and configured to generate a fine air-bubble in the saturated solution.