Abstract: A homogeneously surface cross-linked water absorbent resin and a method for the production thereof are provided. The water absorbent material is formed of a surface cross-linked water absorbent resin resulting from granular irregularly pulverized shaped surface cross-linking the product of partial neutralization or whole neutralization of a water absorbent resin having acrylic acid or a metal salt thereof as a main component, which water absorbent material shows a metal atom concentration on the surface of the water absorbent material in the range of 0-10% within 0 second of polishing and 2-35% at 10 seconds value of polishing as determined by subjecting the water absorbent material to Ar ion discharge polishing under a voltage of 500 ?. The surface cross-linked water absorbent resin to be used herein can be produced by surface cross-linking a water absorbent resin having a specific particle diameter with a surface cross-linking agent having a water concentration in a specific range.

Abstract: A homogeneously surface cross-linked water absorbent resin and a method for the production thereof are provided. The water absorbent material is formed of a surface cross-linked water absorbent resin resulting from granular irregularly pulverized shaped surface cross-linking the product of partial neutralization or whole neutralization of a water absorbent resin having acrylic acid or a metal salt thereof as a main component, which water absorbent material shows a metal atom concentration on the surface of the water absorbent material in the range of 0-10% within 0 second of polishing and 2-35% at 10 seconds value of polishing as determined by subjecting the water absorbent material to Ar ion discharge polishing under a voltage of 500 ?. The surface cross-linked water absorbent resin to be used herein can be produced by surface cross-linking a water absorbent resin having a specific particle diameter with a surface cross-linking agent having a water concentration in a specific range.

Abstract: Tetrakis(fluoroaryl)borate•magnesium halide (Ar4BMgX) expressed by General Formula (1): where each of R1-R10 represents a hydrogen atom, a fluorine atom, a hydrocarbon group, or an alkoxy group, provided that at least one of R1-R5 represents a fluorine atom and at least one of R6-R10 represents a fluorine atom, X represents a chlorine atom, a bromine atom, or an iodide atom, and n represents 2 or 3, is treated with alkali metal salts of carboxylic acid and/or alkali earth metal salts of carboxylic acid. Then, a tetrakis(fluoroaryl)borate derivative (Ar4BZ) is produced by reacting treated Ar4BMgX with a compound generating monovalent cation seeds (for example, N,N-dimethylaniline•hydrochloride). Consequently, it has become possible to provide a purifying process of separating/removing impurities from Ar4BMgX readily and efficiently, and a process of producing inexpensive Ar4BX efficiently.

Abstract: Tetrakis(fluoroaryl)borate.

Abstract: A mixture of bis- and tris(fluoroaryl)borane compounds expressed by General Formula (1) below is handled in the form of a slurry made with a hydrocarbon solvent: where each of R1, R2, R3, R4 and R5 independently represents a hydrogen atom, a fluorine atom, a hydrocarbon group, or an alkoxy group provided that at least one of R1-R5 represents a fluorine atom, X represents a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom, and wherein n represents 2 for the bis(fluoroaryl)borane compounds and 3 for the tris(fluoroaryl)borane compounds. Then, a hydrocarbon solution of the (fluoroaryl)borane compounds having a concentration of the tris(fluoroaryl)borane compounds in a range between 1 wt % and 1 wt % is prepared by dissolving the slurry into a hydrocarbon solvent in a virtually air-tight vessel.

Abstract: Tetrakis (fluoroaryl)borate.magnesium halide (Ar4BMgX) expressed by General Formula (1): where each of R1-R10 represents a hydrogen atom, a fluorine atom, a hydrocarbon group, or an alkoxy group, provided that at least one of R1-R5 represents a fluorine atom and at least one of R6-R10 represents a fluorine atom, X represents a chlorine atom, a bromine atom, or an iodide atom, and n represents 2 or 3, is treated with alkali metal salts of carboxylic acid and/or alkali earth metal salts of carboxylic acid. Then, a tetrakis(fluoroaryl)borate derivative (Ar4BZ) is produced by reacting treated Ar4BMgX with a compound generating monovalent cation seeds (for example, N,N-dimethylaniline.hydrochloride). Consequently, it has become possible to provide a purifying process of separating/removing impurities from Ar4BMgX readily and efficiently, and a process of producing inexpensive Ar4BX efficiently.

Abstract: Tetrakis(fluoroaryl)borate•magnesium halide (Ar4BMgX) expressed by General Formula (1): 1

Abstract: Tetrakis(fluoroaryl)borate.magnesium halide (Ar4BMgX) expressed by General Formula (1): where each of R1-R10 represents a hydrogen atom, a fluorine atom, a hydrocarbon group, or an alkoxy group, provided that at least one of R1-R5 represents a fluorine atom and at least one of R6-R10 represents a fluorine atom, X represents a chlorine atom, a bromine atom, or an iodide atom, and n represents 2 or 3, is treated with alkali metal salts of carboxylic acid and/or alkali earth metal salts of carboxylic acid. Then, a tetrakis(fluoroaryl)borate derivative (Ar4BZ) is produced by reacting treated Ar4BMgX with a compound generating monovalent cation seeds (for example, N,N-dimethylaniline.hydrochloride). Consequently, it has become possible to provide a purifying process of separating/removing impurities from Ar4BMgX readily and efficiently, and a process of producing inexpensive Ar4BX efficiently.

Abstract: These amino group-containing mono- or dithiols are represented by formula (I). In order to prepare them, ethylene sulfide is reacted with at least one compound of formula (II), the average number of moles of ethylene sulfide added corresponding to the total m+n, and possibly the compound of formula (I) as obtained is further reacted with ethylene sulfide in order to increase the value of m+n. R1 stands for a straight or branched alkyl or alkenyl group having 10 to 30 carbon atoms; R2 stands for a straight or branched alkyl or alkenyl group having 10 to 30 carbon atoms, or a —(CH2—CH2—S)n—H group; m and n, which are identical or different, each represent 0 or an integer in the range of 1 to 10 and satisfy 1.

Abstract: A (fluoroaryl)borane compound expressed by General Formula (1): ##STR1## where each of R.sub.1 -R.sub.5 represents a hydrogen atom, a fluorine atom, a hydrocarbon group, or an alkoxy group, provided that at least one of R.sub.1 -R.sub.5 represents a fluorine atom, X represents a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom, and n represents 2 or 3, is stabilized by letting inorganic metal salts having a fluorine atom coexist with the (fluoroaryl)borane compound in a hydrocarbon solution. After the hydrocarbon solution is concentrated in the presence of the inorganic metal salts, the inorganic metal salts are removed and the fluoroaryl)borane compound is crystallized.

Abstract: A fluoroaryl magnesium derivative is produced by reacting aryl fluoride, hydrocarbon halide, and magnesium with one another in an ether solvent or a mixed solvent of the ether solvent and a hydrocarbon solvent. Also, a (fluoroaryl)borane compound is produced by mixing both a solution prepared by dissolving the fluoroaryl magnesium derivative into the ether solvent and another solvent prepared by dissolving the boron halide in the ether solvent with a hydrocarbon solvent having a higher boiling point than the ether solvent, so that the fluoroaryl magnesium derivative and boron halide react with each other while the ether solvent is being distilled out.

Abstract: 4-Methyl-5-[(2-aminoethyl)-thiomethyl]-imidazole can be effectively produced by causing 4-methylimidazole or a salt thereof to react with at least one member selected from the group consisting of (a) a formaldehyde adduct of cysteamine, (b) 2-aminoethanethiol sulfuric acid and formaldehyde or a formaldehyde oligomer, and (c) thiazolidine or a salt thereof, in the presence of a mineral acid, removing a portion of reaction liquid out of the reaction system while maintaining molar concentration of 4-methyl-5-[(2-aminoethyl)-thiomethyl]-imidazole in the reaction system not exceeding 70 mol % based on total mol numbers of 4-methylimidazole and 4-methyl-5-[(2-aminoethyl)-thiomethyl]-imidazole, then separating a liquid containing 4-methyl-5-[(2-aminoethyl)-thiomethyl]-imidazole from the removed portion of reaction liquid, and recycling the remainder into the reaction system.

Abstract: In a method for the production of a dithiodialdehyde represented by the formula II: ##STR1## wherein R.sup.1 and R.sup.2 are independently alkyl group of 1 to 8 carbon atoms, by condensation of an active hydrogen-containing aldehyde represented by the formula I: ##STR2## wherein R.sup.1 and R.sup.2 have the same meanings as defined above, with sulfur monochloride, the improvement which comprises simultaneously supplying said active hydrogen-containing aldehyde and sulfur monochloride to an inactive solvent, or adding said active hydrogen-containing aldehyde to a mixture of said inactive solvent with the sulfur monochloride.

Abstract: A method for the producing 2-[[[5-(dialkylamino)alkyl-2-furanyl]methyl]thio]-ethane amine by the reaction of cysteamine or cysteamine hydrochloride containing free hydrogen chloride with 5-(dialkyl amino)alkyl furfuryl alcohol, which method can be obtained the product in a highly yield by carrying out said reaction at a temperature in the range of 30.degree. to 80.degree. C.