Patents by Inventor Tsuneo Hagiwara

Tsuneo Hagiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11147656
    Abstract: To provide a method for producing an artificial tooth which is excellent in strength, abrasion resistance, hardness, low water absorption, aesthetic property, functionality, and the like within a short time, especially less than 1 hour, smoothly and simply, without requiring skill using a dental photocurable resin composition.
    Type: Grant
    Filed: July 16, 2014
    Date of Patent: October 19, 2021
    Assignee: DWS S.R.L
    Inventors: Tsuneo Hagiwara, Satoshi Iketani
  • Patent number: 11042088
    Abstract: The invention refers to a liquid photocurable resin composition for stereolithography, comprising (i) at least one radical polymerizable compound (A) represented by the following general formula (I): R4O—CO—NH—R2—NH—CO—O—R1—O—CO—NH—R3—NH—CO—OR4 (I), wherein R1 is a linear or branched polytetramethylene glycol residue having an average molecular weight from 200 to 3,000 g/mol; R2 is a diisocyanate compound residue; R3 is a diisocyanate compound residue being the same as or different from R2; and R4 is selected from AcrO—CH2—CH2—, (AcrO—CH2)2CH—, (AcrO—CH2)3C—CH2—, AcrO—CH2—CHCH3—, AcrO—CH2—CHC2H5— and (AcrO—CH2)2C(C2H5)CH2—, preferably from AcrO—CH2—CH2— and (AcrO—CH2)2CH—, more preferably is AcrO—CH2—CH2—; wherein Acr is CH2?C(R)—CO— and R is a hydrogen atom or a methyl group; (ii) at least one radically polymerizable organic compound (B) different from compound (A); and (iii) a photosensitive radical polymerization initiator (C), wherein the content of said radical polymerizable compound (A) varies from 5% t
    Type: Grant
    Filed: January 27, 2017
    Date of Patent: June 22, 2021
    Assignee: DWS S.R.L.
    Inventors: Tsuneo Hagiwara, Satoshi Iketani
  • Patent number: 10588725
    Abstract: The invention concerns a method for producing a three-dimensional object, in particular an artificial tooth, by stereolithography wherein a liquid photocurable resin composition is cured by light. Said photocurable resin composition contains, based on the total weight of the photocurable resin composition, (i) from 90 to 99.9% by weight of a radical polymerizable organic compound (A) selected from radical polymerizable monomers, oligomers, pre-polymers and mixtures thereof; and (ii) from 0.1 to 10% by weight of a photosensitive radical polymerization initiator (B). Said radical polymerizable organic compound (A) comprises, based on the weight of the radical polymerizable organic compound (A), from 0.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: March 17, 2020
    Assignee: DWS S.R.L.
    Inventors: Tsuneo Hagiwara, Satoshi Iketani
  • Patent number: 10336052
    Abstract: A photocurable resin composition for support regions for use in photochemical fabrication by an inkjet method, which has low viscosity and outstanding photocurability, and where the support regions, formed by the photocuring, have good supporting performance and, following the end of the photochemical fabrication, can readily be removed from the main body by dissolving in water and/or by a weak external force such as a water jet. The photocurable resin composition for support regions for use in photochemical 3D fabrication by the inkjet method contains, based on the total mass of photocurable resin composition, from 2 to 20 mass % of N-hydroxyalkyl (meth) acrylamide, from 2 to 20 mass % of (meth) acryloyl morpholine, from 3 to 30 mass % of (meth) acrylate compound having at least one (meth) acryloyloxy group, from 40 to 90 mass % of polyhydroxy compound containing two or more hydroxyl groups, and from 0.1 to 5 mass % of a photo-radical polymerization initiator.
    Type: Grant
    Filed: March 25, 2015
    Date of Patent: July 2, 2019
    Assignee: ISQUARED GmbH
    Inventors: Jan-Michael Stepper, Tsuneo Hagiwara
  • Publication number: 20190011832
    Abstract: The invention refers to a liquid photocurable resin composition for stereolithography, comprising (i) at least one radical polymerizable compound (A) represented by the following general formula (I): R4O—CO—NH—R2—NH—CO—O—R1—O—CO—NH—R3—NH—CO—OR4 (I), wherein R1 is a linear or branched polytetramethylene glycol residue having an average molecular weight from 200 to 3,000 g/mol; R2 is a diisocyanate compound residue; R3 is a diisocyanate compound residue being the same as or different from R2; and R4 is selected from AcrO—CH2—CH2—, (AcrO—CH2)2CH—, (AcrO—CH2)3C—CH2—, AcrO—CH2—CHCH3—, AcrO—CH2—CHC2H5— and (AcrO—CH2)2C(C2H5)CH2—, preferably from AcrO—CH2—CH2— and (AcrO—CH2)2CH—, more preferably is AcrO—CH2—CH2—; wherein Acr is CH2?C(R)—CO— and R is a hydrogen atom or a methyl group; (ii) at least one radically polymerizable organic compound (B) different from compound (A); and (iii) a photosensitive radical polymerization initiator (C), wherein the content of said radical polymerizable compound (A) varies from 5% t
    Type: Application
    Filed: January 27, 2017
    Publication date: January 10, 2019
    Applicant: DWS S.R.L.
    Inventors: Tsuneo HAGIWARA, Satoshi IKETANI
  • Publication number: 20170333167
    Abstract: The invention concerns a method for producing a three-dimensional object, in particular an artificial tooth, by stereolithography wherein a liquid photocurable resin composition is cured by light. Said photocurable resin composition contains, based on the total weight of the photocurable resin composition, (i) from 90 to 99.9% by weight of a radical polymerizable organic compound (A) selected from radical polymerizable monomers, oligomers, pre-polymers and mixtures thereof; and (ii) from 0.1 to 10% by weight of a photosensitive radical polymerization initiator (B). Said radical polymerizable organic compound (A) comprises, based on the weight of the radical polymerizable organic compound (A), from 0.
    Type: Application
    Filed: October 30, 2015
    Publication date: November 23, 2017
    Inventors: Tsuneo HAGIWARA, Satoshi IKETANI
  • Publication number: 20170001382
    Abstract: A photocurable resin composition for support regions for use in photochemical fabrication by an inkjet method, which has low viscosity and outstanding photocurability, and where the support regions, formed by the photocuring, have good supporting performance and, following the end of the photochemical fabrication, can readily be removed from the main body by dissolving in water and/or by a weak external force such as a water jet. The photocurable resin composition for support regions for use in photochemical 3D fabrication by the inkjet method contains, based on the total mass of photocurable resin composition, from 2 to 20 mass % of N-hydroxyalkyl (meth) acrylamide, from 2 to 20 mass % of (meth) acryloyl morpholine, from 3 to 30 mass % of (meth) acrylate compound having at least one (meth) acryloyloxy group, from 40 to 90 mass % of polyhydroxy compound containing two or more hydroxyl groups, and from 0.1 to 5 mass % of a photo-radical polymerization initiator.
    Type: Application
    Filed: March 25, 2015
    Publication date: January 5, 2017
    Inventors: Jan-Michael STEPPER, Tsuneo HAGIWARA
  • Publication number: 20160184189
    Abstract: To provide a method for producing an artificial tooth which is excellent in strength, abrasion resistance, hardness, low water absorption, aesthetic property, functionality, and the like within a short time, especially less than 1 hour, smoothly and simply, without requiring skill using a dental photocurable resin composition.
    Type: Application
    Filed: July 16, 2014
    Publication date: June 30, 2016
    Inventors: Tsuneo Hagiwara, Satoshi Iketani
  • Patent number: 8361376
    Abstract: An optical three-dimensional shaped item excelling in the smoothness of molding end face. There is provided a three-dimensional shaped item composed of, superimposed one upon another, multiple cured resin layers having a given configurational pattern formed by irradiating with actinic energy rays a molding face consisting of an actinic energy ray curable resin composition, wherein at least part of an uneven region of molding end face of the three-dimensional shaped item, the degree of unevenness thereof is reduced to smoothness by segregation of a component contained in the actinic energy ray curable resin composition and/or a substance derived from the component. Also, there is provided an actinic energy ray curable resin composition for the three-dimensional shaped item.
    Type: Grant
    Filed: June 15, 2006
    Date of Patent: January 29, 2013
    Assignee: CMET Inc.
    Inventors: Takashi Ito, Tsuneo Hagiwara
  • Patent number: 8338074
    Abstract: It is intended to provide the following resin composition for stereolithography which is superior in storage stability and aging stability during operation, shows no increase in viscosity upon prolonged storage, has a high light-curing sensitivity and, therefore, makes it possible to produce, upon photo irradiation, an object by stereolithography, which is superior in dimensional accuracy, fabricating accuracy, water resistance, moisture resistance and mechanical properties at a high fabricating speed and a high productivity.
    Type: Grant
    Filed: June 24, 2004
    Date of Patent: December 25, 2012
    Assignees: CMET Inc., San-Apro Ltd.
    Inventors: Takashi Ito, Tsuneo Hagiwara, Hideki Kimura, Masashi Date, Jiro Yamamoto
  • Patent number: 8293810
    Abstract: A resin composition suited for rapid prototyping is provided comprising (I) an actinic energy radiation-curable silicone composition, (II) an actinic energy radiation-sensitive polymerization initiator, and (III) an actinic energy radiation absorber. The resin composition experiences little viscosity buildup and maintains fluidity during long-term storage at elevated temperature, and is effective in rapid prototyping or shaping by stereolithography using any actinic energy radiation.
    Type: Grant
    Filed: August 29, 2005
    Date of Patent: October 23, 2012
    Assignees: Cmet Inc., Shin-Etsu Chemical Co., Ltd.
    Inventors: Takashi Ito, Tsuneo Hagiwara, Toshiyuki Ozai, Takeshi Miyao
  • Patent number: 8293448
    Abstract: Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below: wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond, in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.
    Type: Grant
    Filed: June 15, 2007
    Date of Patent: October 23, 2012
    Assignees: CMET Inc., Ube Industries, Ltd.
    Inventors: Takashi Ito, Tsuneo Hagiwara, Kenji Hirotsu, Tadashi Murakami
  • Publication number: 20100152314
    Abstract: The invention provides a resin composition for stereolithography, which is low in absorption of water and moisture even when the composition is preserved for a long time, which is capable of maintaining high curing sensitivity for long, which is capable of fabricating a three-dimensional object in a shortened molding time, smoothly and in high productivity, the three-dimensional object being excellent in molding accuracy, dimensional accuracy, water resistance, moisture resistance, and mechanical characteristics.
    Type: Application
    Filed: September 29, 2006
    Publication date: June 17, 2010
    Applicant: CMET INC.
    Inventors: Takashi Ito, Tsuneo Hagiwara
  • Publication number: 20100104804
    Abstract: An optical three-dimensional shaped item excelling in the smoothness of molding end face. There is provided a three-dimensional shaped item composed of, superimposed one upon another, multiple cured resin layers having a given configurational pattern formed by irradiating with actinic energy rays a molding face consisting of an actinic energy ray curable resin composition, wherein at at least part of an uneven region of molding end face of the three-dimensional shaped item, the degree of unevenness thereof is reduced to smoothness by segregation of a component contained in the actinic energy ray curable resin composition and/or a substance derived from the component. Also, there is provided an actinic energy ray curable resin composition for the three-dimensional shaped item.
    Type: Application
    Filed: June 15, 2006
    Publication date: April 29, 2010
    Applicant: CMET INC.
    Inventors: Takashi Ito, Tsuneo Hagiwara
  • Publication number: 20090209674
    Abstract: Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below; (wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond) in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.
    Type: Application
    Filed: June 15, 2007
    Publication date: August 20, 2009
    Applicants: CMET INC., UBE INDUSTRIES, LTD.
    Inventors: Takashi Ito, Tsuneo Hagiwara, Kenji Hirotsu, Tadashi Murakami
  • Patent number: 7354643
    Abstract: It is intended to provide an optical three-dimensional object as will be described below which has a high impact resistance and is superior in dimensional accuracy, mechanical properties such as tensile strength, and other properties such as water resistance, moisture resistance and heat resistance, and a method of producing the same.
    Type: Grant
    Filed: June 23, 2004
    Date of Patent: April 8, 2008
    Assignee: CMET Inc.
    Inventors: Takashi Ito, Tsuneo Hagiwara
  • Publication number: 20070060682
    Abstract: It is intended to provide the following resin composition for stereolithography which is superior in storage stability and aging stability during operation, shows no increase in viscosity upon prolonged storage, has a high light-curing sensitivity and, therefore, makes it possible to produce, upon photo irradiation, an object by stereolithography, which is superior in dimensional accuracy, fabricating accuracy, water resistance, moisture resistance and mechanical properties at a high fabricating speed and a high productivity.
    Type: Application
    Filed: June 24, 2004
    Publication date: March 15, 2007
    Inventors: Takashi Ito, Tsuneo Hagiwara, Hideki Kimura, Masashi Date, Jiro Yamamoto
  • Publication number: 20070049652
    Abstract: A resin composition suited for rapid prototyping is provided comprising (I) an actinic energy radiation-curable silicone composition, (II) an actinic energy radiation-sensitive polymerization initiator, and (III) an actinic energy radiation absorber. The resin composition experiences little viscosity buildup and maintains fluidity during long-term storage at elevated temperature, and is effective in rapid prototyping or shaping by stereolithography using any actinic energy radiation.
    Type: Application
    Filed: August 29, 2005
    Publication date: March 1, 2007
    Inventors: Takashi Ito, Tsuneo Hagiwara, Toshiyuki Ozai, Takeshi Miyao
  • Publication number: 20060141276
    Abstract: It is intended to provide an optical three-dimensional object as will be described below which has a high impact resistance and is superior in dimensional accuracy, mechanical properties such as tensile strength, and other properties such as water resistance, moisture resistance and heat resistance, and a method of producing the same.
    Type: Application
    Filed: June 23, 2004
    Publication date: June 29, 2006
    Inventors: Takashi Ito, Tsuneo Hagiwara
  • Patent number: 6432607
    Abstract: A photocurable resin composition capable of producing a three-dimensional object which has excellent dimensional accuracy with a small volume shrinkage factor and excellent heat resistance with a high heat distortion temperature as well as excellent transparency and mechanical properties. This composition comprises at least one imidated acrylic compound (i) represented by the following formula: wherein R1 is an alicyclic group, an aromatic group or an aliphatic group which may be substituted, R2 is a residual group of amino alcohol, R3 is hydrogen atom or methyl group, and n is 1 or 2; (ii) a radical polymerizable compound and/or a cationic polymerizable compound other than the above imidated acrylic compound; and (iii) a photopolymerization initiator. The weight ratio of the imidated acrylic compound to the radical polymerizable compound and/or cationic polymerizable compound is 80:20 to 10:90.
    Type: Grant
    Filed: July 7, 2000
    Date of Patent: August 13, 2002
    Assignees: Teijin Seiki Co., Ltd., Toagosei Co., Ltd.
    Inventors: Yorikazu Tamura, Tsuneo Hagiwara, Makoto Ohtake