Patents by Inventor Tsuneo Hagiwara
Tsuneo Hagiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11147656Abstract: To provide a method for producing an artificial tooth which is excellent in strength, abrasion resistance, hardness, low water absorption, aesthetic property, functionality, and the like within a short time, especially less than 1 hour, smoothly and simply, without requiring skill using a dental photocurable resin composition.Type: GrantFiled: July 16, 2014Date of Patent: October 19, 2021Assignee: DWS S.R.LInventors: Tsuneo Hagiwara, Satoshi Iketani
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Patent number: 11042088Abstract: The invention refers to a liquid photocurable resin composition for stereolithography, comprising (i) at least one radical polymerizable compound (A) represented by the following general formula (I): R4O—CO—NH—R2—NH—CO—O—R1—O—CO—NH—R3—NH—CO—OR4 (I), wherein R1 is a linear or branched polytetramethylene glycol residue having an average molecular weight from 200 to 3,000 g/mol; R2 is a diisocyanate compound residue; R3 is a diisocyanate compound residue being the same as or different from R2; and R4 is selected from AcrO—CH2—CH2—, (AcrO—CH2)2CH—, (AcrO—CH2)3C—CH2—, AcrO—CH2—CHCH3—, AcrO—CH2—CHC2H5— and (AcrO—CH2)2C(C2H5)CH2—, preferably from AcrO—CH2—CH2— and (AcrO—CH2)2CH—, more preferably is AcrO—CH2—CH2—; wherein Acr is CH2?C(R)—CO— and R is a hydrogen atom or a methyl group; (ii) at least one radically polymerizable organic compound (B) different from compound (A); and (iii) a photosensitive radical polymerization initiator (C), wherein the content of said radical polymerizable compound (A) varies from 5% tType: GrantFiled: January 27, 2017Date of Patent: June 22, 2021Assignee: DWS S.R.L.Inventors: Tsuneo Hagiwara, Satoshi Iketani
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Patent number: 10588725Abstract: The invention concerns a method for producing a three-dimensional object, in particular an artificial tooth, by stereolithography wherein a liquid photocurable resin composition is cured by light. Said photocurable resin composition contains, based on the total weight of the photocurable resin composition, (i) from 90 to 99.9% by weight of a radical polymerizable organic compound (A) selected from radical polymerizable monomers, oligomers, pre-polymers and mixtures thereof; and (ii) from 0.1 to 10% by weight of a photosensitive radical polymerization initiator (B). Said radical polymerizable organic compound (A) comprises, based on the weight of the radical polymerizable organic compound (A), from 0.Type: GrantFiled: October 30, 2015Date of Patent: March 17, 2020Assignee: DWS S.R.L.Inventors: Tsuneo Hagiwara, Satoshi Iketani
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Patent number: 10336052Abstract: A photocurable resin composition for support regions for use in photochemical fabrication by an inkjet method, which has low viscosity and outstanding photocurability, and where the support regions, formed by the photocuring, have good supporting performance and, following the end of the photochemical fabrication, can readily be removed from the main body by dissolving in water and/or by a weak external force such as a water jet. The photocurable resin composition for support regions for use in photochemical 3D fabrication by the inkjet method contains, based on the total mass of photocurable resin composition, from 2 to 20 mass % of N-hydroxyalkyl (meth) acrylamide, from 2 to 20 mass % of (meth) acryloyl morpholine, from 3 to 30 mass % of (meth) acrylate compound having at least one (meth) acryloyloxy group, from 40 to 90 mass % of polyhydroxy compound containing two or more hydroxyl groups, and from 0.1 to 5 mass % of a photo-radical polymerization initiator.Type: GrantFiled: March 25, 2015Date of Patent: July 2, 2019Assignee: ISQUARED GmbHInventors: Jan-Michael Stepper, Tsuneo Hagiwara
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Publication number: 20190011832Abstract: The invention refers to a liquid photocurable resin composition for stereolithography, comprising (i) at least one radical polymerizable compound (A) represented by the following general formula (I): R4O—CO—NH—R2—NH—CO—O—R1—O—CO—NH—R3—NH—CO—OR4 (I), wherein R1 is a linear or branched polytetramethylene glycol residue having an average molecular weight from 200 to 3,000 g/mol; R2 is a diisocyanate compound residue; R3 is a diisocyanate compound residue being the same as or different from R2; and R4 is selected from AcrO—CH2—CH2—, (AcrO—CH2)2CH—, (AcrO—CH2)3C—CH2—, AcrO—CH2—CHCH3—, AcrO—CH2—CHC2H5— and (AcrO—CH2)2C(C2H5)CH2—, preferably from AcrO—CH2—CH2— and (AcrO—CH2)2CH—, more preferably is AcrO—CH2—CH2—; wherein Acr is CH2?C(R)—CO— and R is a hydrogen atom or a methyl group; (ii) at least one radically polymerizable organic compound (B) different from compound (A); and (iii) a photosensitive radical polymerization initiator (C), wherein the content of said radical polymerizable compound (A) varies from 5% tType: ApplicationFiled: January 27, 2017Publication date: January 10, 2019Applicant: DWS S.R.L.Inventors: Tsuneo HAGIWARA, Satoshi IKETANI
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Publication number: 20170333167Abstract: The invention concerns a method for producing a three-dimensional object, in particular an artificial tooth, by stereolithography wherein a liquid photocurable resin composition is cured by light. Said photocurable resin composition contains, based on the total weight of the photocurable resin composition, (i) from 90 to 99.9% by weight of a radical polymerizable organic compound (A) selected from radical polymerizable monomers, oligomers, pre-polymers and mixtures thereof; and (ii) from 0.1 to 10% by weight of a photosensitive radical polymerization initiator (B). Said radical polymerizable organic compound (A) comprises, based on the weight of the radical polymerizable organic compound (A), from 0.Type: ApplicationFiled: October 30, 2015Publication date: November 23, 2017Inventors: Tsuneo HAGIWARA, Satoshi IKETANI
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Publication number: 20170001382Abstract: A photocurable resin composition for support regions for use in photochemical fabrication by an inkjet method, which has low viscosity and outstanding photocurability, and where the support regions, formed by the photocuring, have good supporting performance and, following the end of the photochemical fabrication, can readily be removed from the main body by dissolving in water and/or by a weak external force such as a water jet. The photocurable resin composition for support regions for use in photochemical 3D fabrication by the inkjet method contains, based on the total mass of photocurable resin composition, from 2 to 20 mass % of N-hydroxyalkyl (meth) acrylamide, from 2 to 20 mass % of (meth) acryloyl morpholine, from 3 to 30 mass % of (meth) acrylate compound having at least one (meth) acryloyloxy group, from 40 to 90 mass % of polyhydroxy compound containing two or more hydroxyl groups, and from 0.1 to 5 mass % of a photo-radical polymerization initiator.Type: ApplicationFiled: March 25, 2015Publication date: January 5, 2017Inventors: Jan-Michael STEPPER, Tsuneo HAGIWARA
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Publication number: 20160184189Abstract: To provide a method for producing an artificial tooth which is excellent in strength, abrasion resistance, hardness, low water absorption, aesthetic property, functionality, and the like within a short time, especially less than 1 hour, smoothly and simply, without requiring skill using a dental photocurable resin composition.Type: ApplicationFiled: July 16, 2014Publication date: June 30, 2016Inventors: Tsuneo Hagiwara, Satoshi Iketani
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Patent number: 8361376Abstract: An optical three-dimensional shaped item excelling in the smoothness of molding end face. There is provided a three-dimensional shaped item composed of, superimposed one upon another, multiple cured resin layers having a given configurational pattern formed by irradiating with actinic energy rays a molding face consisting of an actinic energy ray curable resin composition, wherein at least part of an uneven region of molding end face of the three-dimensional shaped item, the degree of unevenness thereof is reduced to smoothness by segregation of a component contained in the actinic energy ray curable resin composition and/or a substance derived from the component. Also, there is provided an actinic energy ray curable resin composition for the three-dimensional shaped item.Type: GrantFiled: June 15, 2006Date of Patent: January 29, 2013Assignee: CMET Inc.Inventors: Takashi Ito, Tsuneo Hagiwara
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Patent number: 8338074Abstract: It is intended to provide the following resin composition for stereolithography which is superior in storage stability and aging stability during operation, shows no increase in viscosity upon prolonged storage, has a high light-curing sensitivity and, therefore, makes it possible to produce, upon photo irradiation, an object by stereolithography, which is superior in dimensional accuracy, fabricating accuracy, water resistance, moisture resistance and mechanical properties at a high fabricating speed and a high productivity.Type: GrantFiled: June 24, 2004Date of Patent: December 25, 2012Assignees: CMET Inc., San-Apro Ltd.Inventors: Takashi Ito, Tsuneo Hagiwara, Hideki Kimura, Masashi Date, Jiro Yamamoto
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Patent number: 8293810Abstract: A resin composition suited for rapid prototyping is provided comprising (I) an actinic energy radiation-curable silicone composition, (II) an actinic energy radiation-sensitive polymerization initiator, and (III) an actinic energy radiation absorber. The resin composition experiences little viscosity buildup and maintains fluidity during long-term storage at elevated temperature, and is effective in rapid prototyping or shaping by stereolithography using any actinic energy radiation.Type: GrantFiled: August 29, 2005Date of Patent: October 23, 2012Assignees: Cmet Inc., Shin-Etsu Chemical Co., Ltd.Inventors: Takashi Ito, Tsuneo Hagiwara, Toshiyuki Ozai, Takeshi Miyao
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Patent number: 8293448Abstract: Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below: wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond, in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.Type: GrantFiled: June 15, 2007Date of Patent: October 23, 2012Assignees: CMET Inc., Ube Industries, Ltd.Inventors: Takashi Ito, Tsuneo Hagiwara, Kenji Hirotsu, Tadashi Murakami
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Publication number: 20100152314Abstract: The invention provides a resin composition for stereolithography, which is low in absorption of water and moisture even when the composition is preserved for a long time, which is capable of maintaining high curing sensitivity for long, which is capable of fabricating a three-dimensional object in a shortened molding time, smoothly and in high productivity, the three-dimensional object being excellent in molding accuracy, dimensional accuracy, water resistance, moisture resistance, and mechanical characteristics.Type: ApplicationFiled: September 29, 2006Publication date: June 17, 2010Applicant: CMET INC.Inventors: Takashi Ito, Tsuneo Hagiwara
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Publication number: 20100104804Abstract: An optical three-dimensional shaped item excelling in the smoothness of molding end face. There is provided a three-dimensional shaped item composed of, superimposed one upon another, multiple cured resin layers having a given configurational pattern formed by irradiating with actinic energy rays a molding face consisting of an actinic energy ray curable resin composition, wherein at at least part of an uneven region of molding end face of the three-dimensional shaped item, the degree of unevenness thereof is reduced to smoothness by segregation of a component contained in the actinic energy ray curable resin composition and/or a substance derived from the component. Also, there is provided an actinic energy ray curable resin composition for the three-dimensional shaped item.Type: ApplicationFiled: June 15, 2006Publication date: April 29, 2010Applicant: CMET INC.Inventors: Takashi Ito, Tsuneo Hagiwara
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Publication number: 20090209674Abstract: Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below; (wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond) in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.Type: ApplicationFiled: June 15, 2007Publication date: August 20, 2009Applicants: CMET INC., UBE INDUSTRIES, LTD.Inventors: Takashi Ito, Tsuneo Hagiwara, Kenji Hirotsu, Tadashi Murakami
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Patent number: 7354643Abstract: It is intended to provide an optical three-dimensional object as will be described below which has a high impact resistance and is superior in dimensional accuracy, mechanical properties such as tensile strength, and other properties such as water resistance, moisture resistance and heat resistance, and a method of producing the same.Type: GrantFiled: June 23, 2004Date of Patent: April 8, 2008Assignee: CMET Inc.Inventors: Takashi Ito, Tsuneo Hagiwara
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Publication number: 20070060682Abstract: It is intended to provide the following resin composition for stereolithography which is superior in storage stability and aging stability during operation, shows no increase in viscosity upon prolonged storage, has a high light-curing sensitivity and, therefore, makes it possible to produce, upon photo irradiation, an object by stereolithography, which is superior in dimensional accuracy, fabricating accuracy, water resistance, moisture resistance and mechanical properties at a high fabricating speed and a high productivity.Type: ApplicationFiled: June 24, 2004Publication date: March 15, 2007Inventors: Takashi Ito, Tsuneo Hagiwara, Hideki Kimura, Masashi Date, Jiro Yamamoto
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Publication number: 20070049652Abstract: A resin composition suited for rapid prototyping is provided comprising (I) an actinic energy radiation-curable silicone composition, (II) an actinic energy radiation-sensitive polymerization initiator, and (III) an actinic energy radiation absorber. The resin composition experiences little viscosity buildup and maintains fluidity during long-term storage at elevated temperature, and is effective in rapid prototyping or shaping by stereolithography using any actinic energy radiation.Type: ApplicationFiled: August 29, 2005Publication date: March 1, 2007Inventors: Takashi Ito, Tsuneo Hagiwara, Toshiyuki Ozai, Takeshi Miyao
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Publication number: 20060141276Abstract: It is intended to provide an optical three-dimensional object as will be described below which has a high impact resistance and is superior in dimensional accuracy, mechanical properties such as tensile strength, and other properties such as water resistance, moisture resistance and heat resistance, and a method of producing the same.Type: ApplicationFiled: June 23, 2004Publication date: June 29, 2006Inventors: Takashi Ito, Tsuneo Hagiwara
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Patent number: 6432607Abstract: A photocurable resin composition capable of producing a three-dimensional object which has excellent dimensional accuracy with a small volume shrinkage factor and excellent heat resistance with a high heat distortion temperature as well as excellent transparency and mechanical properties. This composition comprises at least one imidated acrylic compound (i) represented by the following formula: wherein R1 is an alicyclic group, an aromatic group or an aliphatic group which may be substituted, R2 is a residual group of amino alcohol, R3 is hydrogen atom or methyl group, and n is 1 or 2; (ii) a radical polymerizable compound and/or a cationic polymerizable compound other than the above imidated acrylic compound; and (iii) a photopolymerization initiator. The weight ratio of the imidated acrylic compound to the radical polymerizable compound and/or cationic polymerizable compound is 80:20 to 10:90.Type: GrantFiled: July 7, 2000Date of Patent: August 13, 2002Assignees: Teijin Seiki Co., Ltd., Toagosei Co., Ltd.Inventors: Yorikazu Tamura, Tsuneo Hagiwara, Makoto Ohtake