Patents by Inventor Tsuneo Sasamoto

Tsuneo Sasamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Solid state imaging device and method of manufacturing the same
    Patent number: 7714401
    Abstract: A solid state imaging device comprises: a photoelectric converting portion provided on a semiconductor substrate; a charge transfer path, formed in an adjacent position to the photoelectric converting portion, that receives a signal charge generated in the photoelectric converting portion and transfers the signal charge in a predetermined direction; and a gate electrode that transfers the signal charge from the photoelectric converting portion to the charge transfer path, wherein the gate electrode comprises polysilicon having a different conductive type from that of a semiconductor region forming a charge storing portion of the charge transfer path.
    Type: Grant
    Filed: December 7, 2007
    Date of Patent: May 11, 2010
    Assignee: Fujifilm Corporation
    Inventors: Masanori Nagase, Jiro Matsuda, Tsuneo Sasamoto, Toshiaki Hayakawa
  • SOLID STATE IMAGING DEVICE AND METHOD OF MANUFACTURING THE SAME
    Publication number: 20080173905
    Abstract: A solid state imaging device comprises: a photoelectric converting portion provided on a semiconductor substrate; a charge transfer path, formed in an adjacent position to the photoelectric converting portion, that receives a signal charge generated in the photoelectric converting portion and transfers the signal charge in a predetermined direction; and a gate electrode that transfers the signal charge from the photoelectric converting portion to the charge transfer path, wherein the gate electrode comprises polysilicon having a different conductive type from that of a semiconductor region forming a charge storing portion of the charge transfer path.
    Type: Application
    Filed: December 7, 2007
    Publication date: July 24, 2008
    Inventors: Masanori NAGASE, Jiro Matsuda, Tsuneo Sasamoto, Toshiaki Hayakawa
  • Color filter manufacturing method
    Patent number: 7312005
    Abstract: A method of manufacturing a color filter comprises: applying a color filter material of a negative type onto a surface; an exposing treatment to the color filter material; a developing treatment for the exposed color filter material; a light irradiating step of irradiating a light on the developed color filter material; and a heating treatment, in this order, so as to form the color filter.
    Type: Grant
    Filed: March 13, 2006
    Date of Patent: December 25, 2007
    Assignee: Fujilfilm Corporation
    Inventor: Tsuneo Sasamoto
  • Color filter manufacturing method
    Publication number: 20060210892
    Abstract: A method of manufacturing a color filter comprises: applying a color filter material of a negative type onto a surface; an exposing treatment to the color filter material; a developing treatment for the exposed color filter material; a light irradiating step of irradiating a light on the developed color filter material; and a heating treatment, in this order, so as to form the color filter.
    Type: Application
    Filed: March 13, 2006
    Publication date: September 21, 2006
    Inventor: Tsuneo Sasamoto