Patents by Inventor Tsuneo Yamashita

Tsuneo Yamashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220153929
    Abstract: A surface-treating agent containing a fluoropolyether group-containing silane compound (A) and a fluoropolyether group-containing silane compound (B) represented by formula (1) or (2) below: RF1?—XA—RSi???(1) RSi?—XA—RF2—XA—RSi???(2) wherein RF1, XA, RSi, RF2, ?, ? and ? are as defined herein.
    Type: Application
    Filed: February 1, 2022
    Publication date: May 19, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo YAMASHITA, Takeshi MAEHIRA, Hisashi MITSUHASHI
  • Publication number: 20220119592
    Abstract: A surface-treating agent including a component (A) which is at least one fluoropolyether group-containing compound of formula (1A) or (2A) shown below; a component (B) which is at least one fluoropolyether group-containing compound of the following formula (1B) or (2B) shown below; and a component (C) which is one or more fluorine-containing oils: Rf1A?1—XA—RA?1??(1A) RA?1—XA—Rf2A—XA—RA?1??(2A) Rf1B?2—XB—RB?2??(1B) RB?2—XB—Rf2B—XB—RB?2??(2B) wherein formulas (1A), (2A), (1B and (2B) are as defined herein.
    Type: Application
    Filed: January 3, 2022
    Publication date: April 21, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo YAMASHITA, Takeshi MAEHIRA, Kenichi KATSUKAWA, Hisashi MITSUHASHI
  • Publication number: 20220017694
    Abstract: A fluoropolyether group-containing compound of the following formula (1) or (2): RF1—X—RSi??(1) RSi—X—RF2—X—RSi??(2) wherein RF1, RSi and RF2 are as defined herein.
    Type: Application
    Filed: September 24, 2021
    Publication date: January 20, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo YAMASHITA, Hisashi Mitsuhashi, Takeshi Maehira, Yoshimi Motonari
  • Publication number: 20220010062
    Abstract: A fluoropolyether group-containing compound of formula (1) or (2) below: RF1—X—RSi??(1) RSi—X—RF2—X—RSi??(2) wherein RF1, RSi and RF2 are as defined herein.
    Type: Application
    Filed: September 23, 2021
    Publication date: January 13, 2022
    Applicant: Daikin Industries, Ltd.
    Inventors: Tsuneo Yamashita, Hisashi Mitsuhashi, Kenichi Katsukawa, Takeshi Maehira, Yoshimi Motonari
  • Publication number: 20220010063
    Abstract: A fluoropolyether group-containing compound of formula (1) or (2): wherein RF1, RX1, RX2 and RSi are as defined herein.
    Type: Application
    Filed: September 27, 2021
    Publication date: January 13, 2022
    Applicant: Daikin Industries, Ltd.
    Inventors: Tsuneo Yamashita, Hisashi Mitsuhashi, Takeshi Maehira, Yoshimi Motonari
  • Publication number: 20220010064
    Abstract: A fluoropolyether group-containing compound of the following formula (1): wherein RF1 and RSi are as defined herein.
    Type: Application
    Filed: September 28, 2021
    Publication date: January 13, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo YAMASHITA, Hisashi MITSUHASHI, Takeshi MAEHIRA, Yoshimi MOTONARI
  • Publication number: 20220002587
    Abstract: A fluoropolyether group-containing compound represented by formula (1) or (2) below: wherein RSi is represented by formula (Si), and the symbols are as defined in the description —X1—SiRa1p1Rb1q1Rc1r1??(S1).
    Type: Application
    Filed: September 20, 2021
    Publication date: January 6, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo YAMASHITA, Hisashi Mitsuhashi, Kenichi Katsukawa, Takeshi Maehira, Yoshimi Motonari
  • Patent number: 11142653
    Abstract: The present invention provides a method for producing an antifouling film having excellent antifouling properties and rubbing resistance. The method for producing an antifouling film of the present invention includes Process (1) of applying a resin to a surface of a substrate; Process (2) of pushing the substrate to a die with the resin in between to form an uneven structure on a surface of the resin; and Process (3) of curing the resin including the uneven structure on the surface thereof to form a polymer layer. The resin contains an antifouling agent that contains a compound containing a perfluoro(poly)ether group. The die includes a surface having undergone release treatment using a release agent containing a compound that contains a perfluoro(poly)ether group, a hydrolyzable group, and a Si atom.
    Type: Grant
    Filed: July 3, 2017
    Date of Patent: October 12, 2021
    Assignees: SHARP KABUSHIKI KAISHA, DAIKIN INDUSTRIES, LTD.
    Inventors: Hidekazu Hayashi, Tokio Taguchi, Kenichiro Nakamatsu, Yasuhiro Shibai, Ken Atsumo, Tsuneo Yamashita, Saya Nii, Eiji Sakamoto, Kakeru Hanabusa, Hisashi Mitsuhashi, Takayuki Araki
  • Patent number: 11142617
    Abstract: The present invention provides a method for producing an antifouling film capable of long-term continuous production of an antifouling film having excellent antifouling properties. The method for producing an antifouling film of the present invention includes Process (1) of applying a resin to a surface of a substrate; Process (2) of applying a second release agent to a surface of a die coated with a first release agent; Process (3) of pushing the substrate to the surface of the die coated with the second release agent with the resin in between to form an uneven structure on a surface of the resin; and Process (4) of curing the resin including the uneven structure on the surface thereof to form a polymer layer. The resin contains an antifouling agent that contains a predetermined compound. The first release agent contains a predetermined compound. The second release agent contains a predetermined compound.
    Type: Grant
    Filed: July 3, 2017
    Date of Patent: October 12, 2021
    Assignees: SHARP KABUSHIKI KAISHA, DAIKIN INDUSTRIES, LTD.
    Inventors: Hidekazu Hayashi, Tokio Taguchi, Kenichiro Nakamatsu, Yasuhiro Shibai, Ken Atsumo, Tsuneo Yamashita, Eiji Sakamoto, Saya Nii, Takayuki Araki
  • Patent number: 11135761
    Abstract: The invention provides a method for producing a transfer target which is less likely to separate from a substrate or adhere to a mold even when transfer is repeated. The production method includes the steps of: (1) applying a composition containing a fluoropolyether to a release layer of a mold having an uneven pattern on a surface thereof; (2) pressing the mold to a transfer target and transferring the uneven pattern; and (3) releasing the mold from the transfer target, thereby providing the transfer target having a transferred pattern.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: October 5, 2021
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo Yamashita, Eiji Sakamoto, Kakeru Hanabusa, Saya Nil, Takayuki Araki
  • Publication number: 20210284798
    Abstract: A polyether group-containing compound of the formula (I). In each of the compound of the formula (I), one or two R— are represented by (Rf—Xf1-PE-Xf2)?—X1—, and one or two R— are represented by RSi—. The symbols are as defined in the description.
    Type: Application
    Filed: May 26, 2021
    Publication date: September 16, 2021
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo YAMASHITA, Takashi Nomura, Kaori Ozawa, Hisashi Mitsuhashi
  • Patent number: 11118085
    Abstract: The invention aims to provide a substrate whose water-repellency is less likely to be deteriorated even after long-term use in an ultraviolet-exposure environment. The substrate of the invention includes a surface-treating layer, and exhibits a static contact angle with water of 100 degrees or greater after a 400-hour accelerated weathering test performed under the following conditions: <conditions of accelerated weathering test> preparing a UVB-313 lamp exhibiting an irradiance of 0.63 W/m2 at a wavelength of 310 nm; placing the surface-treating layer of the substrate apart from the lamp by 5 cm; and after every 24-hour irradiation, wiping the surface-treating layer with a cloth impregnated with water and with a cloth impregnated with ethanol, followed by drying.
    Type: Grant
    Filed: September 22, 2017
    Date of Patent: September 14, 2021
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Masatoshi Nose, Tsuneo Yamashita, Kaori Ozawa, Hisashi Mitsuhashi
  • Publication number: 20210277258
    Abstract: A surface-treating agent including a perfluoro(poly)ether group-containing silane compound and a perfluoro(poly)ether group-containing compound. The perfluoro(poly)ether group-containing compound contains a radical capturing group or a UV absorbing group in the molecule.
    Type: Application
    Filed: January 11, 2018
    Publication date: September 9, 2021
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Hisashi MITSUHASHI, Masatoshi NOSE, Kaori OZAWA, Tsuneo YAMASHITA
  • Publication number: 20210206995
    Abstract: A compound represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; the repeating units are present in any order; and the sum of m11 to m16 is an integer of 10 or greater, R1 being other than those containing a urethane bond.
    Type: Application
    Filed: March 23, 2021
    Publication date: July 8, 2021
    Applicant: Daikin Industries, Ltd.
    Inventors: Tsuneo Yamashita, Masatoshi Nose, Hisashi Mitsuhashi, Saya Nii, Eiji Sakamoto, Kaori Ozawa
  • Publication number: 20210189052
    Abstract: A composition including at least one compound having a perfluoropolyether group and a curable site, wherein in a molecular weight distribution curve in gel permeation chromatography measurement, the following formula is satisfied: M2/M1?3.5, wherein M1 is a molecular weight at a main peak, and M2 is a molecular weight at 25% intensity of an intensity of the main peak on a higher molecular weight side than M1. Also disclosed is a curable composition containing the composition and a method for producing the curable composition.
    Type: Application
    Filed: March 30, 2018
    Publication date: June 24, 2021
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo YAMASHITA, Eiji SAKAMOTO, Saya NII, Hirotoshi SAKASHITA
  • Patent number: 11008466
    Abstract: A curable composition including a compound having a perfluoropolyether group and a curable moiety, and a curable resin and/or a curable monomer, wherein an organic solvent having no radical reactive group is not substantially contained. The curable composition is capable of forming a surface-treating layer that is in a lower clouded state.
    Type: Grant
    Filed: July 7, 2017
    Date of Patent: May 18, 2021
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo Yamashita, Eiji Sakamoto, Saya Nii, Makoto Hanazawa
  • Patent number: 10988633
    Abstract: The invention aims to provide a novel compound to be suitably used for antifouling agents. The compound of the invention is represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; and the repeating units are present in any order.
    Type: Grant
    Filed: September 22, 2017
    Date of Patent: April 27, 2021
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo Yamashita, Masatoshi Nose, Hisashi Mitsuhashi, Saya Nii, Eiji Sakamoto, Kaori Ozawa
  • Patent number: 10781335
    Abstract: A functional film includes layer (A) containing a resin and layer (B) containing a compound containing a perfluoropolyether group. Layer (B) has a microrelief pattern structure on a surface remote from layer (A). In elemental analysis by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (1): D1<2×X1, wherein X1 is a thickness (nm) of layer (B); and D1 is a depth (nm) at which fluorine atoms exhibit a concentration of 1 atom % or lower. In carbon 1s spectrum measurement by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (2): D2<2×X1, wherein X1 is the thickness (nm) of layer (B); and D2 is a depth (nm) at which no peak is detected within a bond energy range of 290 to 300 eV.
    Type: Grant
    Filed: October 24, 2017
    Date of Patent: September 22, 2020
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo Yamashita, Eiji Sakamoto, Saya Nii, Atsushi Sakakura
  • Patent number: 10731048
    Abstract: A functional film includes layer (A) containing a resin and layer (B) containing a compound containing a perfluoropolyether group. Layer (B) has a microrelief pattern structure on a surface remote from layer (A). In elemental analysis by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (1): D1<2×X1, wherein X1 is a thickness (nm) of layer (B); and D1 is a depth (nm) at which fluorine atoms exhibit a concentration of 1 atom % or lower. In carbon 1s spectrum measurement by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (2): D2<2×X1, wherein X1 is the thickness (nm) of layer (B); and D2 is a depth (nm) at which no peak is detected within a bond energy range of 290 to 300 eV.
    Type: Grant
    Filed: October 24, 2017
    Date of Patent: August 4, 2020
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo Yamashita, Eiji Sakamoto, Saya Nii, Atsushi Sakakura
  • Publication number: 20200024241
    Abstract: The invention aims to provide a novel compound to be suitably used for antifouling agents. The compound of the invention is represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; and the repeating units are present in any order.
    Type: Application
    Filed: September 22, 2017
    Publication date: January 23, 2020
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo YAMASHITA, Masatoshi NOSE, Hisashi MITSUHASHI, Saya NII, Eiji SAKAMOTO, Kaori OZAWA