Patents by Inventor Tsuneo Yamashita
Tsuneo Yamashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220153929Abstract: A surface-treating agent containing a fluoropolyether group-containing silane compound (A) and a fluoropolyether group-containing silane compound (B) represented by formula (1) or (2) below: RF1?—XA—RSi???(1) RSi?—XA—RF2—XA—RSi???(2) wherein RF1, XA, RSi, RF2, ?, ? and ? are as defined herein.Type: ApplicationFiled: February 1, 2022Publication date: May 19, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo YAMASHITA, Takeshi MAEHIRA, Hisashi MITSUHASHI
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Publication number: 20220119592Abstract: A surface-treating agent including a component (A) which is at least one fluoropolyether group-containing compound of formula (1A) or (2A) shown below; a component (B) which is at least one fluoropolyether group-containing compound of the following formula (1B) or (2B) shown below; and a component (C) which is one or more fluorine-containing oils: Rf1A?1—XA—RA?1??(1A) RA?1—XA—Rf2A—XA—RA?1??(2A) Rf1B?2—XB—RB?2??(1B) RB?2—XB—Rf2B—XB—RB?2??(2B) wherein formulas (1A), (2A), (1B and (2B) are as defined herein.Type: ApplicationFiled: January 3, 2022Publication date: April 21, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo YAMASHITA, Takeshi MAEHIRA, Kenichi KATSUKAWA, Hisashi MITSUHASHI
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Publication number: 20220017694Abstract: A fluoropolyether group-containing compound of the following formula (1) or (2): RF1—X—RSi??(1) RSi—X—RF2—X—RSi??(2) wherein RF1, RSi and RF2 are as defined herein.Type: ApplicationFiled: September 24, 2021Publication date: January 20, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo YAMASHITA, Hisashi Mitsuhashi, Takeshi Maehira, Yoshimi Motonari
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Publication number: 20220010062Abstract: A fluoropolyether group-containing compound of formula (1) or (2) below: RF1—X—RSi??(1) RSi—X—RF2—X—RSi??(2) wherein RF1, RSi and RF2 are as defined herein.Type: ApplicationFiled: September 23, 2021Publication date: January 13, 2022Applicant: Daikin Industries, Ltd.Inventors: Tsuneo Yamashita, Hisashi Mitsuhashi, Kenichi Katsukawa, Takeshi Maehira, Yoshimi Motonari
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Publication number: 20220010063Abstract: A fluoropolyether group-containing compound of formula (1) or (2): wherein RF1, RX1, RX2 and RSi are as defined herein.Type: ApplicationFiled: September 27, 2021Publication date: January 13, 2022Applicant: Daikin Industries, Ltd.Inventors: Tsuneo Yamashita, Hisashi Mitsuhashi, Takeshi Maehira, Yoshimi Motonari
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Publication number: 20220010064Abstract: A fluoropolyether group-containing compound of the following formula (1): wherein RF1 and RSi are as defined herein.Type: ApplicationFiled: September 28, 2021Publication date: January 13, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo YAMASHITA, Hisashi MITSUHASHI, Takeshi MAEHIRA, Yoshimi MOTONARI
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Publication number: 20220002587Abstract: A fluoropolyether group-containing compound represented by formula (1) or (2) below: wherein RSi is represented by formula (Si), and the symbols are as defined in the description —X1—SiRa1p1Rb1q1Rc1r1??(S1).Type: ApplicationFiled: September 20, 2021Publication date: January 6, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo YAMASHITA, Hisashi Mitsuhashi, Kenichi Katsukawa, Takeshi Maehira, Yoshimi Motonari
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Patent number: 11142653Abstract: The present invention provides a method for producing an antifouling film having excellent antifouling properties and rubbing resistance. The method for producing an antifouling film of the present invention includes Process (1) of applying a resin to a surface of a substrate; Process (2) of pushing the substrate to a die with the resin in between to form an uneven structure on a surface of the resin; and Process (3) of curing the resin including the uneven structure on the surface thereof to form a polymer layer. The resin contains an antifouling agent that contains a compound containing a perfluoro(poly)ether group. The die includes a surface having undergone release treatment using a release agent containing a compound that contains a perfluoro(poly)ether group, a hydrolyzable group, and a Si atom.Type: GrantFiled: July 3, 2017Date of Patent: October 12, 2021Assignees: SHARP KABUSHIKI KAISHA, DAIKIN INDUSTRIES, LTD.Inventors: Hidekazu Hayashi, Tokio Taguchi, Kenichiro Nakamatsu, Yasuhiro Shibai, Ken Atsumo, Tsuneo Yamashita, Saya Nii, Eiji Sakamoto, Kakeru Hanabusa, Hisashi Mitsuhashi, Takayuki Araki
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Patent number: 11142617Abstract: The present invention provides a method for producing an antifouling film capable of long-term continuous production of an antifouling film having excellent antifouling properties. The method for producing an antifouling film of the present invention includes Process (1) of applying a resin to a surface of a substrate; Process (2) of applying a second release agent to a surface of a die coated with a first release agent; Process (3) of pushing the substrate to the surface of the die coated with the second release agent with the resin in between to form an uneven structure on a surface of the resin; and Process (4) of curing the resin including the uneven structure on the surface thereof to form a polymer layer. The resin contains an antifouling agent that contains a predetermined compound. The first release agent contains a predetermined compound. The second release agent contains a predetermined compound.Type: GrantFiled: July 3, 2017Date of Patent: October 12, 2021Assignees: SHARP KABUSHIKI KAISHA, DAIKIN INDUSTRIES, LTD.Inventors: Hidekazu Hayashi, Tokio Taguchi, Kenichiro Nakamatsu, Yasuhiro Shibai, Ken Atsumo, Tsuneo Yamashita, Eiji Sakamoto, Saya Nii, Takayuki Araki
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Patent number: 11135761Abstract: The invention provides a method for producing a transfer target which is less likely to separate from a substrate or adhere to a mold even when transfer is repeated. The production method includes the steps of: (1) applying a composition containing a fluoropolyether to a release layer of a mold having an uneven pattern on a surface thereof; (2) pressing the mold to a transfer target and transferring the uneven pattern; and (3) releasing the mold from the transfer target, thereby providing the transfer target having a transferred pattern.Type: GrantFiled: June 14, 2017Date of Patent: October 5, 2021Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo Yamashita, Eiji Sakamoto, Kakeru Hanabusa, Saya Nil, Takayuki Araki
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Publication number: 20210284798Abstract: A polyether group-containing compound of the formula (I). In each of the compound of the formula (I), one or two R— are represented by (Rf—Xf1-PE-Xf2)?—X1—, and one or two R— are represented by RSi—. The symbols are as defined in the description.Type: ApplicationFiled: May 26, 2021Publication date: September 16, 2021Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo YAMASHITA, Takashi Nomura, Kaori Ozawa, Hisashi Mitsuhashi
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Patent number: 11118085Abstract: The invention aims to provide a substrate whose water-repellency is less likely to be deteriorated even after long-term use in an ultraviolet-exposure environment. The substrate of the invention includes a surface-treating layer, and exhibits a static contact angle with water of 100 degrees or greater after a 400-hour accelerated weathering test performed under the following conditions: <conditions of accelerated weathering test> preparing a UVB-313 lamp exhibiting an irradiance of 0.63 W/m2 at a wavelength of 310 nm; placing the surface-treating layer of the substrate apart from the lamp by 5 cm; and after every 24-hour irradiation, wiping the surface-treating layer with a cloth impregnated with water and with a cloth impregnated with ethanol, followed by drying.Type: GrantFiled: September 22, 2017Date of Patent: September 14, 2021Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Masatoshi Nose, Tsuneo Yamashita, Kaori Ozawa, Hisashi Mitsuhashi
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Publication number: 20210277258Abstract: A surface-treating agent including a perfluoro(poly)ether group-containing silane compound and a perfluoro(poly)ether group-containing compound. The perfluoro(poly)ether group-containing compound contains a radical capturing group or a UV absorbing group in the molecule.Type: ApplicationFiled: January 11, 2018Publication date: September 9, 2021Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Hisashi MITSUHASHI, Masatoshi NOSE, Kaori OZAWA, Tsuneo YAMASHITA
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Publication number: 20210206995Abstract: A compound represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; the repeating units are present in any order; and the sum of m11 to m16 is an integer of 10 or greater, R1 being other than those containing a urethane bond.Type: ApplicationFiled: March 23, 2021Publication date: July 8, 2021Applicant: Daikin Industries, Ltd.Inventors: Tsuneo Yamashita, Masatoshi Nose, Hisashi Mitsuhashi, Saya Nii, Eiji Sakamoto, Kaori Ozawa
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Publication number: 20210189052Abstract: A composition including at least one compound having a perfluoropolyether group and a curable site, wherein in a molecular weight distribution curve in gel permeation chromatography measurement, the following formula is satisfied: M2/M1?3.5, wherein M1 is a molecular weight at a main peak, and M2 is a molecular weight at 25% intensity of an intensity of the main peak on a higher molecular weight side than M1. Also disclosed is a curable composition containing the composition and a method for producing the curable composition.Type: ApplicationFiled: March 30, 2018Publication date: June 24, 2021Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo YAMASHITA, Eiji SAKAMOTO, Saya NII, Hirotoshi SAKASHITA
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Patent number: 11008466Abstract: A curable composition including a compound having a perfluoropolyether group and a curable moiety, and a curable resin and/or a curable monomer, wherein an organic solvent having no radical reactive group is not substantially contained. The curable composition is capable of forming a surface-treating layer that is in a lower clouded state.Type: GrantFiled: July 7, 2017Date of Patent: May 18, 2021Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo Yamashita, Eiji Sakamoto, Saya Nii, Makoto Hanazawa
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Patent number: 10988633Abstract: The invention aims to provide a novel compound to be suitably used for antifouling agents. The compound of the invention is represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; and the repeating units are present in any order.Type: GrantFiled: September 22, 2017Date of Patent: April 27, 2021Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo Yamashita, Masatoshi Nose, Hisashi Mitsuhashi, Saya Nii, Eiji Sakamoto, Kaori Ozawa
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Patent number: 10781335Abstract: A functional film includes layer (A) containing a resin and layer (B) containing a compound containing a perfluoropolyether group. Layer (B) has a microrelief pattern structure on a surface remote from layer (A). In elemental analysis by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (1): D1<2×X1, wherein X1 is a thickness (nm) of layer (B); and D1 is a depth (nm) at which fluorine atoms exhibit a concentration of 1 atom % or lower. In carbon 1s spectrum measurement by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (2): D2<2×X1, wherein X1 is the thickness (nm) of layer (B); and D2 is a depth (nm) at which no peak is detected within a bond energy range of 290 to 300 eV.Type: GrantFiled: October 24, 2017Date of Patent: September 22, 2020Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo Yamashita, Eiji Sakamoto, Saya Nii, Atsushi Sakakura
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Patent number: 10731048Abstract: A functional film includes layer (A) containing a resin and layer (B) containing a compound containing a perfluoropolyether group. Layer (B) has a microrelief pattern structure on a surface remote from layer (A). In elemental analysis by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (1): D1<2×X1, wherein X1 is a thickness (nm) of layer (B); and D1 is a depth (nm) at which fluorine atoms exhibit a concentration of 1 atom % or lower. In carbon 1s spectrum measurement by X-ray photoelectron spectroscopy from the layer (B) side, the functional film satisfies formula (2): D2<2×X1, wherein X1 is the thickness (nm) of layer (B); and D2 is a depth (nm) at which no peak is detected within a bond energy range of 290 to 300 eV.Type: GrantFiled: October 24, 2017Date of Patent: August 4, 2020Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo Yamashita, Eiji Sakamoto, Saya Nii, Atsushi Sakakura
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Publication number: 20200024241Abstract: The invention aims to provide a novel compound to be suitably used for antifouling agents. The compound of the invention is represented by the following formula (1): wherein R1 is a monovalent organic group containing a polyether chain; X1 and X2 are each individually a monovalent group; and the polyether chain is a chain represented by the following formula: —(OC6F12)m11—(OC5F10)m12—(OC4F8)m13—(OC3X106)m14—(OC2F4)m15—(OCF2)m16—, wherein m11, m12, m13, m14, m15, and m16 are each individually an integer of 0 or 1 or greater; X10s are each individually H, F, or Cl; and the repeating units are present in any order.Type: ApplicationFiled: September 22, 2017Publication date: January 23, 2020Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Tsuneo YAMASHITA, Masatoshi NOSE, Hisashi MITSUHASHI, Saya NII, Eiji SAKAMOTO, Kaori OZAWA